World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
48
Citations
16868
World Ranking
3008
National Ranking
88

Johannes Müller publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Johannes Müller sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 101 publications — 4th percentile

4% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Johannes Müller D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Johannes Müller sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 48 D-Index — 56th percentile

56% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Johannes Müller is affiliated with GlobalFoundries in Germany and has an extensive publication record primarily in the fields of Materials Science and Engineering. Their research activity prominently includes Electrical and Electronic Engineering as well as Materials Chemistry, with additional contributions to Radiation, Atomic and Molecular Physics, and Optics, and Surfaces, Coatings and Films.

The scientist's work covers multiple specialized topics, including:

  • Ferroelectric and Negative Capacitance Devices
  • MXene and MAX Phase Materials
  • Semiconductor materials and devices
  • Advanced X-ray Imaging Techniques
  • Electron and X-Ray Spectroscopy Techniques
  • Advanced Electron Microscopy Techniques and Applications
  • 2D Materials and Applications

Frequent publication venues for their research include:

  • IEEE Transactions on Electron Devices
  • Microscopy and Microanalysis
  • IEEE Electron Device Letters
  • arXiv (Cornell University)
  • Zenodo (CERN European Organization for Nuclear Research)

Among the recent papers authored or co-authored by Johannes Müller are:

  • "Ultrathin Ga2O3 Glass: A Large-Scale Passivation and Protection Material for Monolayer WS2" (2020) published in Advanced Materials
  • "Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction" (2020) published in Nanomaterials
  • "Impact of Read Operation on the Performance of HfO2-Based Ferroelectric FETs" (2020) published in IEEE Electron Device Letters
  • "Multi-resolution convolutional neural networks for inverse problems" (2020) published in Scientific Reports
  • "Interplay Between Switching and Retention in HfO2-Based Ferroelectric FETs" (2020) published in IEEE Transactions on Electron Devices

Johannes Müller frequently collaborates with colleagues including Christoph T. Koch, Zdravko Kochovski, Michael J. Bojdys, Benedikt Haas, and Konrad Seidel. Their joint publications contribute significantly to the refinement and understanding of materials characterization and semiconductor device technology.

Best Publications

  • Ferroelectricity in hafnium oxide thin films

    T. S. Böscke;J. Müller;D. Bräuhaus;U. Schröder

  • Ferroelectricity in Simple Binary ZrO2 and HfO2

    Johannes Müller;Tim S. Böscke;Uwe Schröder;Stefan Mueller

  • Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films

    Min Hyuk Park;Young Hwan Lee;Han Joon Kim;Yu Jin Kim

  • Ferroelectricity in yttrium-doped hafnium oxide

    J. Müller;U. Schröder;T. S. Böscke;I. Müller

  • Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications

    J. Müller;T. S. Böscke;D. Bräuhaus;U. Schröder

  • Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories

    J. Muller;T. S. Boscke;S. Muller;E. Yurchuk

  • A FeFET based super-low-power ultra-fast embedded NVM technology for 22nm FDSOI and beyond

    S. Dunkel;M. Trentzsch;R. Richter;P. Moll

  • Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects

    J. Müller;P. Polakowski;S. Mueller;T. Mikolajick

  • Ferroelectricity in undoped hafnium oxide

    Patrick Polakowski;Johannes Müller

  • Impact of different dopants on the switching properties of ferroelectric hafniumoxide

    Uwe Schroeder;Ekaterina Yurchuk;Johannes Müller;Dominik Martin

  • Wake-up effects in Si-doped hafnium oxide ferroelectric thin films

    Dayu Zhou;Jin Xu;Qing Li;Yan Guan

  • Phase transitions in ferroelectric silicon doped hafnium oxide

    T. S. Böscke;St. Teichert;D. Bräuhaus;J. Müller

  • A 28nm HKMG super low power embedded NVM technology based on ferroelectric FETs

    M. Trentzsch;S. Flachowsky;R. Richter;J. Paul

  • Ferroelectricity in hafnium oxide: CMOS compatible ferroelectric field effect transistors

    T. S. Boscke;J. Muller;D. Brauhaus;U. Schroder

  • Ferroelectric ternary content-addressable memory for one-shot learning

    Kai Ni;Xunzhao Yin;Ann Franchesca Laguna;Siddharth Joshi

  • Charge-Trapping Phenomena in HfO 2 -Based FeFET-Type Nonvolatile Memories

    Ekaterina Yurchuk;Johannes Muller;Stefan Muller;Jan Paul

  • Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors

    Halid Mulaosmanovic;Johannes Ocker;Stefan Müller;Uwe Schroeder

  • Ferroelectricity in HfO 2 enables nonvolatile data storage in 28 nm HKMG

    J. Muller;E. Yurchuk;T. Schlosser;J. Paul

  • High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty

    T. Ali;P. Polakowski;S. Riedel;T. Buttner

  • Novel ferroelectric FET based synapse for neuromorphic systems

    H. Mulaosmanovic;J. Ocker;S. Muller;M. Noack

Frequent Co-Authors

Stefan Slesazeck
Stefan Slesazeck Namlab gGmbH
Uwe Schroeder
Uwe Schroeder Namlab gGmbH
Ulrich Böttger
Ulrich Böttger RWTH Aachen University
Xianlin Dong
Xianlin Dong Chinese Academy of Sciences
Stefan Siebert
Stefan Siebert University of Göttingen
Suman Datta
Suman Datta Georgia Institute of Technology
Sergei V. Kalinin
Sergei V. Kalinin University of Tennessee at Knoxville

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