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D-Index & Metrics

Materials Science

D-Index
56
Citations
9283
World Ranking
8387
National Ranking
2059

Andrei Osinsky publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Andrei Osinsky sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 230 publications — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Andrei Osinsky D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Andrei Osinsky sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 56 D-Index — 37th percentile

37% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Andrei Osinsky is a researcher primarily affiliated with Corning in the United States. Their work is concentrated in the fields of Materials Science and Energy, with a notable focus on electronic, optical, and magnetic materials as well as materials chemistry. They have also contributed to renewable energy, sustainability, and electrical and electronic engineering areas.

The major topics of Osinsky's research include Ga2O3 and related materials, ZnO doping and properties, advanced photocatalysis techniques, semiconductor materials and devices, and perovskite materials and applications. Additional interests encompass electronic and structural properties of oxides and magnesium oxide properties and applications.

They have coauthored extensively with several researchers, including Fikadu Alema, Marko J. Tadjer, Alan G. Jacobs, Karl D. Hobart, and Hsiao-Hsuan Wan. Their frequent collaboration with these scientists suggests established working relationships within their research fields.

Osinsky has published research in various scientific journals and conference venues. The publication venues where they frequently contribute include:

  • Applied Physics Letters
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
  • arXiv (Cornell University)
  • APL Materials
  • IEEE Electron Device Letters

Some recent papers authored or coauthored by Osinsky are:

  • "MOCVD growth of high purity Ga2O3 epitaxial films using trimethylgallium precursor," 2020, Applied Physics Letters
  • "Low 114 cm−3 free carrier concentration in epitaxial β-Ga2O3 grown by MOCVD," 2020, APL Materials
  • "Multi-kV Class β-Ga₂O₃ MESFETs With a Lateral Figure of Merit Up to 355 MW/cm²," 2021, IEEE Electron Device Letters
  • "Vertical β-Ga2O3 field plate Schottky barrier diode from metal-organic chemical vapor deposition," 2021, Applied Physics Letters
  • "Ge doping of β-Ga2O3 by MOCVD," 2021, APL Materials

Best Publications

  • Self-heating in high-power AlGaN-GaN HFETs

    R. Gaska;A. Osinsky;J.W. Yang;M.S. Shur

  • Electron transport in AlGaN–GaN heterostructures grown on 6H–SiC substrates

    R. Gaska;J. W. Yang;A. Osinsky;Q. Chen

  • Low noise p-π-n GaN ultraviolet photodetectors

    A. Osinsky;S. Gangopadhyay;R. Gaska;B. Williams

  • MOCVD grown epitaxial β-Ga2O3 thin film with an electron mobility of 176 cm2/V s at room temperature

    Yuewei Zhang;Fikadu Alema;Akhil Mauze;Onur S. Koksaldi

  • High-temperature performance of AlGaN/GaN HFETs on SiC substrates

    R. Gaska;Q. Chen;J. Yang;A. Osinsky

  • MgZnO/AlGaN heterostructure light-emitting diodes

    A. Osinsky;J. W. Dong;M. Z. Kauser;B. Hertog

  • Luminescence properties of defects in ZnO

    M.A. Reshchikov;H. Morkoç;B. Nemeth;J. Nause

  • Visible-blind GaN Schottky barrier detectors grown on Si(111)

    A. Osinsky;S. Gangopadhyay;J. W. Yang;R. Gaska

  • Schottky barrier photodetectors based on AlGaN

    A. Osinsky;S. Gangopadhyay;B. W. Lim;M. Z. Anwar

  • Electron beam induced current measurements of minority carrier diffusion length in gallium nitride

    Leonid Chernyak;Andrei Osinsky;Henryk Temkin;J. W. Yang

  • Electrical Detection of Immobilized Proteins With Ungated AlGaN/GaN High Electron Mobility Transistors.

    Byoung Sam Kang;Fan Ren;Lin Wang;Charles Lofton

  • Cleaved cavity optically pumped InGaN–GaN laser grown on spinel substrates

    M. Asif Khan;C. J. Sun;J. W. Yang;Q. Chen

  • Fast growth rate of epitaxial β-Ga 2 O 3 by close coupled showerhead MOCVD

    Fikadu Alema;Brian Hertog;Andrei Osinsky;Partha Mukhopadhyay

  • High quality GaN–InGaN heterostructures grown on (111) silicon substrates

    J. W. Yang;C. J. Sun;Q. Chen;M. Z. Anwar

  • Very high channel conductivity in low-defect AlN/GaN high electron mobility transistor structures

    A. M. Dabiran;A. M. Wowchak;A. Osinsky;J. Xie

  • Minority carrier transport in GaN and related materials

    Leonid Chernyak;Andrei Osinsky;Alfons Schulte

  • MOCVD growth of high purity Ga2O3 epitaxial films using trimethylgallium precursor

    George Seryogin;Fikadu Alema;Nicholas Valente;Houqiang Fu

  • Low-resistance ohmic contacts to p-type GaN

    Y.-L. Li;E. F. Schubert;J. W. Graff;A. Osinsky

  • Experimental and theoretical study of acceptor activation and transport properties in p-type AlxGa1−xN/GaN superlattices

    I. D. Goepfert;E. F. Schubert;A. Osinsky;P. E. Norris

  • Origin of conductivity and low-frequency noise in reverse-biased GaN p-n junction

    D. V. Kuksenkov;H. Temkin;A. Osinsky;R. Gaska

  • Low-frequency noise and performance of GaN p-n junction photodetectors

    D. V. Kuksenkov;H. Temkin;A. Osinsky;R. Gaska

Frequent Co-Authors

Stephen J. Pearton
Stephen J. Pearton University of Florida
Fan Ren
Fan Ren University of Florida
A. Y. Polyakov
A. Y. Polyakov National University of Science and Technology
David P. Norton
David P. Norton University of Florida
Weimin Chen
Weimin Chen Linköping University
Henryk Temkin
Henryk Temkin Texas Tech University
James S. Speck
James S. Speck University of California, Santa Barbara
Remis Gaska
Remis Gaska UVTON, Inc.
E. F. Schubert
E. F. Schubert Rensselaer Polytechnic Institute
Michael Shur
Michael Shur Rensselaer Polytechnic Institute

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