World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
47
Citations
9248
World Ranking
11066
National Ranking
2602

James N Eckstein publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where James N Eckstein sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 256 publications — 48th percentile

48% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

James N Eckstein D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where James N Eckstein sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 47 D-Index — 15th percentile

15% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2005 - Fellow of American Physical Society (APS) Citation For development of layerbylayer growth of oxide films for fundamental studies and for planar tunneling junctions made from oxide superconductors and oxide magnets

Overview

James N Eckstein is affiliated with the University of Illinois at Urbana-Champaign in the United States. Their primary research spans several interconnected fields including Physics and Astronomy and Materials Science, with specific focus areas in Atomic and Molecular Physics, Materials Chemistry, Condensed Matter Physics, Electrical and Electronic Engineering, and Biomedical Engineering.

The scientist's work centers on key topics such as Topological Materials and Phenomena, Graphene research and applications, Physics of Superconductivity and Magnetism, Quantum and electron transport phenomena, Advanced Condensed Matter Physics, Advanced Thermoelectric Materials and Devices, and Photonic and Optical Devices.

James N Eckstein has contributed to multiple peer-reviewed publications, with recent papers including:

  • "Interference, diffraction, and diode effects in superconducting array based on bismuth antimony telluride topological insulator" (2023) published in Communications Physics
  • "Massive Suppression of Proximity Pairing in Topological (Bi₁₋xSbx)₂Te₃ Films on Niobium" (2020) published in Physical Review Letters
  • "Asymmetric ferroelectricity by design in atomic-layer superlattices with broken inversion symmetry" (2021) published in Physical review. B./Physical review. B
  • "Uniform Diffusion of Cooper Pairing Mediated by Hole Carriers in Topological Sb₂Te₃/Nb" (2024) published in ACS Nano
  • "Thermoelectric transport contribution from topological surface states vs 2D-electron gas in 10 nm Bi2Se3" (2022) published in Journal of Applied Physics

Eckstein has collaborated frequently with co-authors such as Soorya Suresh Babu, Yang Bai, Joseph A. Hlevyack, Yao Li, and Meng-Kai Lin.

The scientist's research has been disseminated through notable venues including:

  • Journal of Applied Physics
  • arXiv (Cornell University)
  • Communications Physics
  • Physical review. B./Physical review. B
  • ACS Nano

In recognition of their contributions, James N Eckstein was named a Fellow of the American Physical Society in 2005. The citation for this fellowship acknowledged their development of layer-by-layer growth techniques for oxide films utilized in fundamental studies and the creation of planar tunneling junctions from oxide superconductors and oxide magnets.

Best Publications

  • Unconventional electronic structure evolution with hole doping in Bi2Sr2CaCu2O8+ delta : Angle-resolved photoemission results.

    D. S. Marshall;D. S. Dessau;D. S. Dessau;A. G. Loeser;C. H. Park

  • Electrostatic modification of novel materials

    C. H. Ahn;A. Bhattacharya;M. Di Ventra;J. N. Eckstein

  • Vanishing of phase coherence in underdoped Bi_2Sr_2CaCu_2O_8+d

    J. Corson;R. Mallozzi;J. Orenstein;J. N. Eckstein

  • High-Resolution Two-Photon Spectroscopy with Picosecond Light Pulses

    J. N. Eckstein;A. I. Ferguson;T. W. Hänsch

  • Signature of Superfluid Density in the Single-Particle Excitation Spectrum of Bi2Sr2CaCu2O8+δ

    D. L. Feng;D. H. Lu;K. M. Shen;C. Kim

  • Anomalous temperature dependence of the upper critical magnetic field in Bi-Sr-Cu-O.

    M. S. Osofsky;R. J. Soulen;S. A. Wolf;J. M. Broto

  • LaAlO 3 stoichiometry is key to electron liquid formation at LaAlO 3 /SrTiO 3 interfaces

    M. P. Warusawithana;C. Richter;C. Richter;J. A. Mundy;P. Roy

  • Magnetoelastic coupling and magnetic anisotropy in La0.67Ca0.33MnO3 films

    J. O’Donnell;M. S. Rzchowski;J. N. Eckstein;I. Bozovic

  • Enhanced ordering temperatures in antiferromagnetic manganite superlattices

    S. J. May;P. J. Ryan;J. L. Robertson;J.-W. Kim

  • Molecular beam epitaxial growth of layered Bi-Sr-Ca-Cu-O compounds

    D. G. Schlom;A. F. Marshall;J. T. Sizemore;Z. J. Chen

  • Metal-insulator transition and its relation to magnetic structure in (LaMnO3)2n/(SrMnO3)n superlattices.

    Anand Bhattacharya;S. J. May;S. G. E. Te Velthuis;M. Warusawithana

  • Oxide interfaces: watch out for the lack of oxygen.

    James N. Eckstein

  • Growth of high Tc superconducting thin films using molecular beam epitaxy techniques

    C. Webb;S. L. Weng;James N Eckstein;N. Missert

  • Electronic reconstruction at SrMnO3-LaMnO3 superlattice interfaces

    Şerban Smadici;Peter Abbamonte;Anand Bhattacharya;Xiaofang Zhai

  • Artificial dielectric superlattices with broken inversion symmetry.

    Maitri P. Warusawithana;Eugene V. Colla;James N Eckstein;M. B. Weissman

  • Anisotropic magnetoresistance in tetragonal La1−xCaxMnOδ thin films

    J. N. Eckstein;I. Bozovic;J. O’Donnell;M. Onellion

  • Magnetic-field and temperature dependence of the thermally activated dissipation in thin films of Bi2Sr2CaCu2O8+ delta.

    JT Kucera;TP Orlando;G Virshup;JN Eckstein

  • Atomically layered heteroepitaxial growth of single‐crystal films of superconducting Bi2Sr2Ca2Cu3Ox

    James N Eckstein;I. Bozovic;K. E. Von Dessonneck;D. G. Schlom

  • Magnetoresistance scaling in MBE-grown La0.7Ca0.3MnO3 thin films.

    J. O’Donnell;M. Onellion;M. Rzchowski;James N Eckstein

  • Correlating interfacial octahedral rotations with magnetism in (LaMnO3+δ)N/(SrTiO3)N superlattices

    Xiaofang Zhai;Long Cheng;Yang Liu;Christian M. Schlepütz

  • Colossal magnetoresistance magnetic tunnel junctions grown by molecular-beam epitaxy

    J. O'Donnell;A. E. Andrus;S. Oh;E. V. Colla

Frequent Co-Authors

Jian-Min Zuo
Jian-Min Zuo University of Illinois at Urbana-Champaign
Darrell G. Schlom
Darrell G. Schlom Cornell University
James S. Harris
James S. Harris Stanford University
Tai-Chang Chiang
Tai-Chang Chiang University of Illinois at Urbana-Champaign
Steven J. May
Steven J. May Drexel University
Jianguo Wen
Jianguo Wen Argonne National Laboratory
Shik Shin
Shik Shin University of Tokyo
John Clarke
John Clarke University of California, Berkeley
M. R. Beasley
M. R. Beasley Stanford University
Aharon Kapitulnik
Aharon Kapitulnik Stanford University

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