The chart shows the distribution of publications by all Research.com ranked scientists in the field of Physics in 2026. The highlighted bar marks where J. C. Davis sits on this spectrum.
This scientist: 429 publications — 43rd percentile
43% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,469 publications or more.
The chart shows the D-index (discipline H-index) distribution of Physics scientists ranked by Research.com in 2026. The highlighted bar marks where J. C. Davis sits on this spectrum.
This scientist: 75 D-Index — 9th percentile
9% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 185 D-Index or more.
J. C. Davis is affiliated with the University of Oxford in the United Kingdom and specializes in research at the intersection of physics and materials science. Their work is primarily focused on condensed matter physics and related subfields, including electronic, optical, and magnetic materials, as well as atomic and molecular physics and optics. They have also contributed to studies in inorganic chemistry and materials chemistry.
Their research spans several key topics, notably:
Davis's publication record includes work in multiple esteemed venues. They have notably contributed papers to:
Among the recent research papers associated with or relevant to Davis's domain are:
Davis frequently collaborates with researchers in their field. Prominent frequent coauthors include:
S. H. Pan;J. P. O'Neal;R. L. Badzey;C. Chamon
J. E. Hoffman;E. W. Hudson;E. W. Hudson;K. M. Lang;V. Madhavan
K. M. Lang;V. Madhavan;J. E. Hoffman;E. W. Hudson;E. W. Hudson;E. W. Hudson
S. H. Pan;E. W. Hudson;K. M. Lang;H. Eisaki;H. Eisaki
T. Hanaguri;C. Lupien;Y. Kohsaka;D.-H. Lee;D.-H. Lee
S. H. Pan;J. P. ONeal;R. L. Badzey;C. Chamon
Y. Kohsaka;C. Taylor;K. Fujita;K. Fujita;A. Schmidt
J. E. Hoffman;K. McElroy;D.-H. Lee;D.-H. Lee;K. M Lang;K. M Lang
M. J. Lawler;K. Fujita;K. Fujita;K. Fujita;Jhinhwan Lee;Jhinhwan Lee;Jhinhwan Lee;A. R. Schmidt;A. R. Schmidt
K. McElroy;R. W. Simmonds;J. E. Hoffman;D.-H. Lee;D.-H. Lee;D.-H. Lee
T. M. Chuang;M. P. Allan;M. P. Allan;Jinho Lee;Jinho Lee;Yang Xie
K. McElroy;K. McElroy;Jinho Lee;J. A. Slezak;D.-H. Lee
K. McElroy;K. McElroy;K. McElroy;D.-H. Lee;D.-H. Lee;J. E. Hoffman;K. M. Lang
Jinho Lee;K. Fujita;K. Fujita;K. McElroy;K. McElroy;J. A. Slezak
Y. Kohsaka;C. Taylor;P. Wahl;A. Schmidt
E. W. Hudson;E. W. Hudson;K. M. Lang;V. Madhavan;S. H. Pan;S. H. Pan
T. Valla;A. V. Fedorov;Jinho Lee;J. C. Davis
Daniel F. Agterberg;J.C. Séamus Davis;J.C. Séamus Davis;Stephen D. Edkins;Eduardo Fradkin
Peter O. Sprau;Peter O. Sprau;Andrey Kostin;Andrey Kostin;Andreas Kreisel;Andreas Kreisel;Anna E. Böhmer
J. E. Hoffman;E. W. Hudson;K. M. Lang;V. Madhavan
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