The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where John W. Freeland sits on this spectrum.
This scientist: 484 publications — 85th percentile
85% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where John W. Freeland sits on this spectrum.
This scientist: 69 D-Index — 65th percentile
65% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
John W. Freeland is affiliated with Argonne National Laboratory in the United States. Their research spans multiple interdisciplinary fields, primarily focused on materials science, physics and astronomy, and engineering. Within these main fields, they have contributed extensively to subfields including materials chemistry, electronic, optical and magnetic materials, condensed matter physics, electrical and electronic engineering, and atomic and molecular physics and optics.
The scientist's work covers a broad range of topics such as advanced condensed matter physics, magnetic and transport properties of perovskites and related materials, electronic and structural properties of oxides, physics of superconductivity and magnetism, magnetic properties of thin films, advancements in battery materials, and multiferroics and related materials.
Among recent publications, notable papers include:
Frequent collaborators include Vladimir A. Stoica, R. Ramesh, Venkatraman Gopalan, Long-Qing Chen, and Lane W. Martin. Their joint work has contributed to advancing understanding within their shared research areas.
The scientist's publication record includes significant contributions to journals and venues such as arXiv (Cornell University) with 16 publications, Physical Review B with 10 publications, Advanced Materials with 8 publications, and both Nature Materials and Nature Communications with 5 publications each.
John W. Freeland was recognized as a Fellow of the American Physical Society (APS) in 2014, citing development and use of novel x-ray techniques to understand chemical, structural, electronic, and magnetic features at oxide interfaces.
June Hyuk Lee;June Hyuk Lee;Lei Fang;Eftihia Vlahos;Xianglin Ke
J. Chakhalian;J. Chakhalian;J. W. Freeland;H.-U. Habermeier;G. Cristiani
J. Chakhalian;J. Chakhalian;J. W. Freeland;G. Srajer;J. Strempfer
Ferhat Katmis;Valeria Lauter;Flavio S. Nogueira;Badih A. Assaf;Badih A. Assaf
James M. Rondinelli;Steven J. May;John W. Freeland
Jin Suntivich;Wesley T. Hong;Yueh Lin Lee;James M. Rondinelli
Hyoungjeen Jeen;Woo Seok Choi;Michael D. Biegalski;Chad M. Folkman
Unknown
Hyoungjeen Jeen;Woo Seok Choi;Michael D. Biegalski;Chad M. Folkman
Chong Bi;Yaohua Liu;T. Newhouse-Illige;M. Xu
Seo Hyoung Chang;Nemanja Danilovic;Kee-Chul Chang;Ram Subbaraman
Jak Chakhalian;John W. Freeland;Andrew J. Millis;Christos Panagopoulos
Yisi Zhu;Justin G. Connell;Sanja Tepavcevic;Peter Zapol
Guochun Yan;Sathiya Mariyappan;Gwenaelle Rousse;Quentin Jacquet
Hyoungjeen Jeen;Woo Seok Choi;John W. Freeland;Hiromichi Ohta
Jonathan R. Petrie;Chandrima Mitra;Hyoungjeen Jeen;Woo Seok Choi
Jian Liu;Mehdi Kargarian;Mikhail Kareev;Ben Gray
Jonathan R. Petrie;Valentino R. Cooper;John W. Freeland;Tricia L. Meyer
Unknown
Zhen Zhang;Derek Schwanz;Badri Narayanan;Michele Kotiuga
J. Chakhalian;J. M. Rondinelli;J. M. Rondinelli;Jian Liu;Jian Liu;B. A. Gray
S. Middey;J. Chakhalian;P. Mahadevan;J.W. Freeland
R. F. Wang;J. Li;W. McConville;C. Nisoli
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