The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Ho Nyung Lee sits on this spectrum.
This scientist: 373 publications — 74th percentile
74% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Ho Nyung Lee sits on this spectrum.
This scientist: 63 D-Index — 53rd percentile
53% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Ho Nyung Lee is a researcher affiliated with Oak Ridge National Laboratory in the United States. Their work spans across fields including Materials Science and Physics and Astronomy, with a notable focus on subfields such as Materials Chemistry, Condensed Matter Physics, Atomic and Molecular Physics and Optics, Electronic, Optical and Magnetic Materials, and Electrical and Electronic Engineering.
Their main research topics cover Advanced Condensed Matter Physics, Electronic and Structural Properties of Oxides, Topological Materials and Phenomena, Magnetic and Transport Properties of Perovskites and Related Materials, ZnO Doping and Properties, Copper-based Nanomaterials and Applications, and the Physics of Superconductivity and Magnetism.
Ho Nyung Lee has published extensively, contributing to key scientific journals and publication venues. Frequent venues include:
Recent papers include:
The scientist has collaborated frequently with a number of researchers including Jong Mok Ok, Sangmoon Yoon, Haoxiang Li, Changhee Sohn, and Panchapakesan Ganesh. These collaborations encompass significant research outputs and cross-disciplinary studies.
Recognition for their work includes being named a Fellow of the American Physical Society in 2016, with a citation highlighting pioneering contributions in atomicscale growth control in pulsed laser deposition and advances towards discovery of functional oxide materials through epitaxial design of thin films and heterostructures.
Ho Nyung Lee;Hans M. Christen;Matthew F. Chisholm;Christopher M. Rouleau
Ho Nyung Lee;Dietrich Hesse;Nikolai Zakharov;Ulrich Gösele
Hyoungjeen Jeen;Woo Seok Choi;Michael D. Biegalski;Chad M. Folkman
Hyoungjeen Jeen;Woo Seok Choi;Michael D. Biegalski;Chad M. Folkman
Woo Seok Choi;Matthew F Chisholm;David J Singh;Taekjib Choi
Hyoungjeen Jeen;Woo Seok Choi;John W. Freeland;Hiromichi Ohta
Stephen Jesse;Ho Nyung Lee;Sergei V. Kalinin
Jonathan R. Petrie;Chandrima Mitra;Hyoungjeen Jeen;Woo Seok Choi
Wenbin Wang;Jun Zhao;Wenbo Wang;Zheng Gai
Wenshuai Zhu;Zili Wu;Guo Shiou Foo;Xiang Gao
Jonathan R. Petrie;Valentino R. Cooper;John W. Freeland;Tricia L. Meyer
Ho Nyung Lee;Serge M. Nakhmanson;Matthew F. Chisholm;Hans M. Christen
Ji Young Jo;Sang Mo Yang;T. H. Kim;Ho Nyung Lee
Matthew F. Chisholm;Weidong Luo;Weidong Luo;Mark P. Oxley;Mark P. Oxley;Sokrates T. Pantelides;Sokrates T. Pantelides
Dae Ho Kim;Ho Nyung Lee;Michael D. Biegalski;Hans M. Christen
Jun Sung Kim;Jun Sung Kim;Sung Seok A Seo;Sung Seok A Seo;Matthew F Chisholm;Reinhard Kremer
Woo Seok Choi;Ji-Hwan Kwon;Hyoungjeen Jeen;Jorge E. Hamann-Borrero
Kelsey A Stoerzinger;Woo Seok Choi;Hyoungjeen Jeen;Ho Nyung Lee
Ho Nyung Lee;Dietrich Hesse
Shinbuhm Lee;Ilia N. Ivanov;Jong K. Keum;Ho Nyung Lee
Jonathan R. Petrie;Hyoungjeen Jeen;Sara C. Barron;Tricia L. Meyer
H. X. Li;T. T. Zhang;Y.-Y. Pai;C. Marvinney
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