The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Elke Arenholz sits on this spectrum.
This scientist: 507 publications — 87th percentile
87% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Elke Arenholz sits on this spectrum.
This scientist: 73 D-Index — 71st percentile
71% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Elke Arenholz is affiliated with the Lawrence Berkeley National Laboratory in the United States. Their research primarily focuses on materials science and physics, particularly in the study of magnetic and electronic properties of thin films and oxides.
The scientist has contributed to several fields including:
Key subfields of their work encompass:
The main topics covered in their research include:
Frequent publication venues where their work appears include:
Among their recent notable publications are:
Elke Arenholz has collaborated frequently with several co-authors, including:
In 2014, they were recognized as a Fellow of the American Physical Society (APS) with citation for developing and applying advanced soft x-ray instrumentation to advance understanding of magnetic materials and thin films.
A. K. Yadav;A. K. Yadav;C. T. Nelson;C. T. Nelson;S. L. Hsu;S. L. Hsu;Z. Hong
Suraj S. Cheema;Daewoong Kwon;Daewoong Kwon;Nirmaan Shanker;Roberto dos Reis
X. Marti;I. Fina;C. Frontera;Jian Liu
Nianpeng Lu;Pengfei Zhang;Qinghua Zhang;Ruimin Qiao
S. Das;Y. L. Tang;Y. L. Tang;Z. Hong;M. A. P. Gonçalves
H. Ohldag;H. Ohldag;H. Ohldag;A. Scholl;F. Nolting;E. Arenholz
Nagaphani B. Aetukuri;Nagaphani B. Aetukuri;Alexander X. Gray;Marc Drouard;Matteo Cossale
Julia A. Mundy;Charles M. Brooks;Megan E. Holtz;Jarrett A. Moyer
A. Scholl;M. Liberati;E. Arenholz;H. Ohldag;H. Ohldag
Qian Li;Mengmeng Yang;Cheng Gong;Rajesh V. Chopdekar
Padraic Shafer;Pablo García-Fernández;Pablo Aguado-Puente;Anoop R. Damodaran
Zhiyong Qiu;Jia Li;Dazhi Hou;Elke Arenholz
Q. He;Ying-hao Chu;J. T. Heron;S. Y. Yang
J. Li;A. Tan;K.W. Moon;A. Doran
T. S. Santos;J. S. Moodera;K. V. Raman;E. Negusse
J. Everett;E. Céspedes;L. R. Shelford;C. Exley
R. K. Kawakami;E. Rotenberg;Hyuk J. Choi;Ernesto J. Escorcia-Aparicio
Dustin A. Gilbert;Alexander J. Grutter;Elke Arenholz;Kai Liu
Di Yi;Jian Liu;Shang-Lin Hsu;Lipeng Zhang
J. Wu;J. S. Park;W. Kim;W. Kim;E. Arenholz
R. Ramesh
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