World's Best Scientists 2026 revealed!
Jun-ichi Nishizawa

Jun-ichi Nishizawa

D-Index & Metrics

Materials Science

D-Index
43
Citations
7267
World Ranking
12312
National Ranking
773

Jun-ichi Nishizawa publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jun-ichi Nishizawa sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 440 publications — 81st percentile

81% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Jun-ichi Nishizawa D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jun-ichi Nishizawa sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 43 D-Index — 5th percentile

5% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2018 - Polish Academy of Science
  • 2000 - IEEE Edison Medal For contributions to materials science and technology, and the invention of the static induction transistor.

Overview

Jun-ichi Nishizawa was affiliated with Tohoku University in Japan. Their research output primarily spanned the field of Engineering, with a particular focus on Electrical and Electronic Engineering, Biomedical Engineering, Computer Vision and Pattern Recognition, Radiation, and Radiology, Nuclear Medicine and Imaging.

The scientist contributed to research topics including:

  • Advanced Semiconductor Detectors and Materials
  • Advanced X-ray and CT Imaging
  • Augmented Reality Applications
  • Radiation Detection and Scintillator Technologies
  • Anatomy and Medical Technology
  • Surgical Simulation and Training
  • Semiconductor Quantum Structures and Devices

Frequent coauthors in their publications included Katsuyuki Takagi, Hiroki Kase, Kento Tabata, and Toru Aoki.

Nishizawa's research appeared in several publication venues. The most frequent were:

  • Proceedings of the International Display Workshops
  • Sensors and Materials
  • Colloids and Surfaces A Physicochemical and Engineering Aspects
  • Journal of Instrumentation
  • Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment

Some of Nishizawa's recent papers included:

  • "Characteristic evaluation of the pseudo-polymorphism of amorphous atorvastatin calcium hydrates by terahertz spectroscopy," 2021, Colloids and Surfaces A Physicochemical and Engineering Aspects
  • "Comparative study of In/CdTe/Au Schottky- and p-n junction-diode detectors formed by backside laser irradiation doping," 2020, Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment
  • "Spatial awareness application using mixed reality for 3D X-ray CT examination," 2023, Journal of Instrumentation
  • "Effects of Heating on Electrical and Spectral Properties of In/CdTe/Au X- and γ-ray Detectors with a Schottky Barrier or Laser-induced p-n Junction," 2020, Sensors and Materials
  • "Resistance to Pressure in Laser-doped p-n and Schottky-type Barrier Junctions," 2024, Sensors and Materials

Jun-ichi Nishizawa was awarded the IEEE Edison Medal in 2000 for contributions to materials science and technology and the invention of the static induction transistor. Additionally, the Polish Academy of Science honored Nishizawa in 2018.

Best Publications

  • Molecular Layer Epitaxy

    Jun‐ichi Nishizawa;Hitoshi Abe;Toru Kurabayashi

  • Tunable terahertz wave generation in the 3- to 7-THz region from GaP

    Tadao Tanabe;K. Suto;J. Nishizawa;K. Saito

  • On the reaction mechanism of GaAs MOCVD

    Jun-ichi Nishizawa;Toru Kurabayashi

  • On the Reaction Mechanism of GaAs MOCVD

    J. Nishizawa;T. Kurabayashi

  • Semiconductor Raman laser

    J. Nishizawa;K. Suto

  • Blue light emission from ZnSe p‐n junctions

    Jun‐ichi Nishizawa;Kazuomi Itoh;Yasuo Okuno;Fumitoshi Sakurai

  • DISPOSITIF POUR FORMER UN CRISTAL DE SEMI-CONDUCTEUR

    Nishizawa Junichi;Abe Hitoshi;Suzuki Soubei

  • THz imaging of nucleobases and cancerous tissue using a GaP THz-wave generator

    Jun Ichi Nishizawa;Tetsuo Sasaki;Ken Suto;Tetsuya Yamada

  • Nearly perfect crystal growth of III–V compounds by the temperature difference method under controlled vapour pressure

    J. Nishizawa;Y. Okuno;H. Tadano

  • Mechanism of surface reaction in GaAs layer growth

    J. Nishizawa;T. Kurabayashi;H. Abe;A. Nozoe

  • Short channel MOSFET with buried anti-punch through region

    Jun-ichi Nishizawa;Tadahiro Ohmi

  • Molecular layer epitaxy of silicon

    Jun-ichi Nishizawa;Kenji Aoki;Sohbe Suzuki;Kazuhiko Kikuchi

  • Photostimulated molecular layer epitaxy

    Jun‐ichi Nishizawa;Hitoshi Abe;Toru Kurabayashi;Naoki Sakurai

  • Nonstoichiometry of Te-Doped GaAs

    Jun-ichi Nishizawa;Hideo Otsuka;Shigenobu Yamakoshi;Katsuhiko Ishida

  • Silicon molecular layer epitaxy

    Jun‐ichi Nishizawa;Kenji Aoki;Sohbe Suzuki;Kazuhiko Kikuchi

  • High-frequency high-power static induction transistor

    J. Nishizawa;K. Yamamoto

  • Ferroelectric PVDF cladding terahertz waveguide

    T. Hidaka;H. Minamide;H. Ito;J. Nishizawa

  • Low-frequency vibrational modes of riboflavin and related compounds

    Masae Takahashi;Yoichi Ishikawa;Jun Ichi Nishizawa;Hiromasa Ito

  • Frequency-tunable terahertz wave generation via excitation of phonon-polaritons in GaP

    Tadao Tanabe;Ken Suto;Jun Ichi Nishizawa;Kyosuke Saito

  • Analysis of static characteristics of a bipolar-mode SIT (BSIT)

    J. Nishizawa;T. Ohmi;Hsiao-Liang Chen

  • Gas-phase nucleation during the thermal decomposition of silane in hydrogen

    T.U.M.S. Murthy;N. Miyamoto;M. Shimbo;J. Nishizawa

  • Liquid phase epitaxy of GaP by a temperature difference method under controlled vapor pressure

    J. Nishizawa;Y. Okuno

  • Epitaxial Growth with Light Irradiation

    Masashi Kumagawa;Hideo Sunami;Takeshi Terasaki;Jun-ichi Nishizawa

  • Characteristics of static induction transistors: Effects of series resistance

    Y. Mochida;J. Nishizawa;T. Ohmi;R.K. Gupta

  • Minority‐carrier lifetime measurements of efficient GaAlAs p‐n heterojunctions

    J. Nishizawa;K. Suto;T. Teshima

Frequent Co-Authors

Tadahiro Ohmi
Tadahiro Ohmi Tohoku University
Hiromasa Ito
Hiromasa Ito RIKEN Center for Advanced Photonics
Bogdan M. Wilamowski
Bogdan M. Wilamowski Auburn University
Masayoshi Esashi
Masayoshi Esashi Tohoku University
Shigenobu Yamakoshi
Shigenobu Yamakoshi Fujitsu (Japan)
Tatsuo Itoh
Tatsuo Itoh University of California, Los Angeles
Masayuki Ishikawa
Masayuki Ishikawa Toshiba (Japan)
Akira Uedono
Akira Uedono University of Tsukuba
Lester F. Eastman
Lester F. Eastman Cornell University

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