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Jean-Luc Rouvière

Jean-Luc Rouvière

D-Index & Metrics

Materials Science

D-Index
52
Citations
9282
World Ranking
9607
National Ranking
268

Overview

Jean-Luc Rouvière is affiliated with Grenoble Alpes University in France. Their research spans multiple fields, primarily focusing on materials science, engineering, and physics and astronomy. They have contributed to these disciplines through a combination of experimental techniques, material synthesis, and device characterization.

The main fields of study for Rouvière include:

  • Materials Science
  • Engineering
  • Physics and Astronomy

Their work covers several subfields, notably:

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Biomedical Engineering

Key research topics addressed by Rouvière involve:

  • GaN-based semiconductor devices and materials
  • Advanced Electron Microscopy Techniques and Applications
  • Chalcogenide Semiconductor Thin Films
  • Electron and X-Ray Spectroscopy Techniques
  • Ga2O3 and related materials
  • Quantum Dots Synthesis And Properties
  • 2D Materials and Applications

Rouvière has published numerous papers, among which the recent notable works include:

  • "Improved measurement of electric fields by nanobeam precession electron diffraction," 2020, Journal of Applied Physics
  • "Assessment of Active Dopants and p-n Junction Abruptness Using In Situ Biased 4D-STEM," 2022, Nano Letters
  • "The influence of illumination conditions in the measurement of built-in electric field at p-n junctions by 4D-STEM," 2022, Applied Physics Letters
  • "The role of surface diffusion in the growth mechanism of III-nitride nanowires and nanotubes," 2020, Nanotechnology
  • "Synthesis of relaxed Ge0.9Sn0.1/Ge by nanosecond pulsed laser melting," 2022, Applied Surface Science

Frequent co-authors collaborating with Rouvière include:

  • Hanako Okuno
  • M. den Hertog
  • E. Monroy
  • B. Daudin
  • David Cooper

Their publications are often featured in established venues such as:

  • Nanotechnology
  • arXiv (Cornell University)
  • BIO Web of Conferences
  • Journal of Applied Physics
  • Applied Physics Letters

Best Publications

  • Stranski-Krastanov growth mode during the molecular beam epitaxy of highly strained GaN

    B. Daudin;F. Widmann;G. Feuillet;Y. Samson

  • Blue-light emission from GaN self-assembled quantum dots due to giant piezoelectric effect

    F. Widmann;J. Simon;B. Daudin;G. Feuillet

  • Growth kinetics and optical properties of self-organized GaN quantum dots

    F. Widmann;B. Daudin;G. Feuillet;Y. Samson

  • POLARITY DETERMINATION OF GAN FILMS BY ION CHANNELING AND CONVERGENT BEAM ELECTRON DIFFRACTION

    B. Daudin;J. L. Rouvière;M. Arlery

  • Theoretical discussions on the geometrical phase analysis.

    J.L. Rouvière;E. Sarigiannidou

  • Confirmation of the domino-cascade model by lifepo4/fepo 4 precession electron diffraction

    G. Brunetti;D. Robert;P. Bayle-Guillemaud;J.L. Rouvière

  • Polarity determination for GaN films grown on (0001) sapphire and high-pressure-grown GaN single crystals

    J. L. Rouviere;J. L. Weyher;M. Seelmann-Eggebert;S. Porowski

  • Crystal structure and band gap determination of HfO2 thin films

    Marie C. Cheynet;Simone Pokrant;Frans D. Tichelaar;Jean-Luc Rouvière

  • Strain measurements by convergent-beam electron diffraction: The importance of stress relaxation in lamella preparations

    L. Clément;R. Pantel;L. F. Tz. Kwakman;J. L. Rouvière

  • Improved quality GaN grown by molecular beam epitaxy using In as a surfactant

    F. Widmann;B. Daudin;G. Feuillet;N. Pelekanos

  • Improved precision in strain measurement using nanobeam electron diffraction

    A. Béché;J. L. Rouvière;L. Clément;J. M. Hartmann

  • Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography.

    A. Béché;J.L. Rouvière;J.P. Barnes;D. Cooper

  • Recent advances in defect-selective etching of GaN

    J.L Weyher;J.L Weyher;P.D Brown;J.L Rouvière;T Wosinski

  • Improved strain precision with high spatial resolution using nanobeam precession electron diffraction

    Jean-Luc Rouviere;Armand Béché;Yannick Martin;Thibaud Denneulin

  • Growth of aluminum nitride on (111) silicon: Microstructure and interface structure

    A. Bourret;A. Barski;J. L. Rouvière;G. Renaud

  • Strain mapping of semiconductor specimens with nm-scale resolution in a transmission electron microscope

    David Cooper;Thibaud Denneulin;Nicolas Bernier;Armand Béché

  • Strain relaxation in (0001) AlN/GaN heterostructures

    Alain Bourret;Christoph Adelmann;Bruno Daudin;Jean-Luc Rouvière

  • Control of gold surface diffusion on Si nanowires

    Martien I. den Hertog;Jean-Luc. Rouviere;Florian Dhalluin;Pierre J. Desré

  • Quantitative characterization of GaN quantum-dot structures in AlN by high-resolution transmission electron microscopy

    M. Arlery;J. L. Rouvière;F. Widmann;B. Daudin

  • Transmission electron microscopy structural characterisation of GaN layers grown on (0001) sapphire

    J.L. Rouviere;M. Arlery;B. Daudin;G. Feuillet

  • Odd electron diffraction patterns in silicon nanowires and silicon thin films explained by microtwins and nanotwins.

    C. Cayron;M. Den Hertog;L. Latu-Romain;C. Mouchet

Frequent Co-Authors

B. Daudin
B. Daudin Grenoble Alpes University
Thierry Baron
Thierry Baron Grenoble Alpes University
Eva Monroy
Eva Monroy Grenoble Alpes University
David K. C. Cooper
David K. C. Cooper University of Pittsburgh
Jian-Min Zuo
Jian-Min Zuo University of Illinois at Urbana-Champaign
Nicolas Grandjean
Nicolas Grandjean École Polytechnique Fédérale de Lausanne
Christian Colliex
Christian Colliex University of Paris-Saclay
Rafal E. Dunin-Borkowski
Rafal E. Dunin-Borkowski Forschungszentrum Jülich

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