World's Best Scientists 2026 revealed!
Hong-Liang Lu

Hong-Liang Lu

D-Index & Metrics

Materials Science

D-Index
50
Citations
8023
World Ranking
10311
National Ranking
2893

Hong-Liang Lu publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Hong-Liang Lu sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 238 publications — 43rd percentile

43% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Hong-Liang Lu D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Hong-Liang Lu sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 50 D-Index — 22nd percentile

22% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Hong-Liang Lu is affiliated with Fudan University in China and conducts research primarily within the fields of Engineering and Materials Science. Their work encompasses multiple subfields including Electrical and Electronic Engineering, Materials Chemistry, Biomedical Engineering, Electronic, Optical and Magnetic Materials, and Renewable Energy, Sustainability and the Environment.

Their research topics focus on areas such as ZnO doping and properties, Ferroelectric and Negative Capacitance Devices, Gas Sensing Nanomaterials and Sensors, Semiconductor materials and devices, Ga2O3 and related materials, MXene and MAX Phase Materials, and Advanced Photocatalysis Techniques.

Hong-Liang Lu has published in various scientific venues, with frequent contributions to:

  • arXiv (Cornell University)
  • SSRN Electronic Journal
  • ACS Applied Materials & Interfaces
  • Nanotechnology
  • IEEE Electron Device Letters

The scientist has collaborated extensively, with frequent co-authors including:

  • David Wei Zhang
  • Li-Yuan Zhu
  • Guang Zeng
  • Xiaoxi Li
  • Zhigang Ji

Notable recent publications by Hong-Liang Lu include:

  • Advances in Noble Metal-Decorated Metal Oxide Nanomaterials for Chemiresistive Gas Sensors: Overview (2023) - Nano-Micro Letters
  • Recent Progress on Flexible Room-Temperature Gas Sensors Based on Metal Oxide Semiconductor (2022) - Nano-Micro Letters
  • Fabrication of a Micro-Electromechanical System-Based Acetone Gas Sensor Using CeO2 Nanodot-Decorated WO3 Nanowires (2020) - ACS Applied Materials & Interfaces
  • Highly stretchable and self-healing strain sensors for motion detection in wireless human-machine interface (2020) - Nano Energy
  • Advance on flexible pressure sensors based on metal and carbonaceous nanomaterial (2021) - Nano Energy

Best Publications

  • Stability and Strength of Atomically Thin Borophene from First Principles Calculations

    Bo Peng;Hao Zhang;Hezhu Shao;Zeyu Ning

  • Stability and strength of atomically thin borophene from first principles calculations

    Bo Peng;Hao Zhang;Hezhu Shao;Zeyu Ning

  • Fabrication of a Micro-Electromechanical System-Based Acetone Gas Sensor Using CeO2 Nanodot-Decorated WO3 Nanowires

    Kaiping Yuan;Cheng-Yu Wang;Li-Yuan Zhu;Qi Cao

  • First-principle calculations of phononic, electronic and optical properties of monolayer arsenene and antimonene allotropes

    Yuanfeng Xu;Bo Peng;Hao Zhang;Hezhu Shao

  • Advance on flexible pressure sensors based on metal and carbonaceous nanomaterial

    Meng-Yang Liu;Cheng-Zhou Hang;Xue-Feng Zhao;Xue-Feng Zhao;Li-Yuan Zhu

  • Modulation of perovskite crystallization processes towards highly efficient and stable perovskite solar cells with MXene quantum dot-modified SnO2

    Yingguo Yang;Haizhou Lu;Shanglei Feng;Lifeng Yang

  • Highly stretchable and self-healing strain sensors for motion detection in wireless human-machine interface

    Cheng-Zhou Hang;Xue-Feng Zhao;Xue-Feng Zhao;Song-Yan Xi;Ying-Hui Shang

  • Tunable interfacial properties of epitaxial graphene on metal substrates

    Min Gao;Yi Pan;Chendong Zhang;Hao Hu

  • Fabrication of heterostructured p-CuO/n-SnO2 core-shell nanowires for enhanced sensitive and selective formaldehyde detection

    Li-Yuan Zhu;Kaiping Yuan;Jian-Guo Yang;Hong-Ping Ma

  • Fabrication of 1D Te/2D ReS2 Mixed-Dimensional van der Waals p-n Heterojunction for High-Performance Phototransistor.

    Jia-Jia Tao;Jinbao Jiang;Shi-Nuan Zhao;Yong Zhang

  • First-principles study on the electronic, optical, and transport properties of monolayer α - and β -GeSe

    Yuanfeng Xu;Hao Zhang;Hao Zhang;Hao Zhang;Hezhu Shao;Gang Ni

  • Precise preparation of WO3@SnO2 core shell nanosheets for efficient NH3 gas sensing.

    Kai-Ping Yuan;Li-Yuan Zhu;Jia-He Yang;Cheng-Zhou Hang

  • Influence of Al Doping on the Properties of ZnO Thin Films Grown by Atomic Layer Deposition

    Yang Geng;Li Guo;Sai-Sheng Xu;Qing-Qing Sun

  • A skin-like sensor for intelligent Braille recognition

    Xue-Feng Zhao;Xue-Feng Zhao;Cheng-Zhou Hang;Hong-Liang Lu;Ke Xu

  • Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition.

    Zhi-Yuan Ye;Hong-Liang Lu;Yang Geng;Yu-Zhu Gu

  • The mechanism of the asymmetric SET and RESET speed of graphene oxide based flexible resistive switching memories

    Lu-Hao Wang;Wen Yang;Qing-Qing Sun;Peng Zhou

  • Epitaxial growth and physical properties of 2D materials beyond graphene: from monatomic materials to binary compounds.

    Geng Li;Yu-Yang Zhang;Hui Guo;Li Huang

  • Characterization of atomic-layer-deposited Al2O3∕GaAs interface improved by NH3 plasma pretreatment

    Hong-Liang Lu;Liang Sun;Shi-Jin Ding;Min Xu

  • The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

    Zi-Yi Wang;Rong-Jun Zhang;Hong-Liang Lu;Xin Chen

  • Investigation of growth characteristics, compositions, and properties of atomic layer deposited amorphous Zn-doped Ga2O3 films

    Jiajia Tao;Hong-Liang Lu;Yang Gu;Hong-Ping Ma

  • Synthesis of WO3@ZnWO4@ZnO-ZnO hierarchical nanocactus arrays for efficient photoelectrochemical water splitting

    Kaiping Yuan;Qi Cao;Xinyu Li;Hong-Yan Chen

Frequent Co-Authors

David Wei Zhang
David Wei Zhang Fudan University
Shi-Jin Ding
Shi-Jin Ding Fudan University
Wei Huang
Wei Huang Northwestern Polytechnical University
Tao Wang
Tao Wang Hong Kong Polytechnic University
Bo Peng
Bo Peng University of Electronic Science and Technology of China
Michael Nolan
Michael Nolan Tyndall National Institute
Jiacheng Wang
Jiacheng Wang Chinese Academy of Sciences
Ruguang Ma
Ruguang Ma Chinese Academy of Sciences
J. Joshua Yang
J. Joshua Yang University of Southern California
Marco Fanciulli
Marco Fanciulli University of Milano-Bicocca

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