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Hideaki Aochi

Hideaki Aochi

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
36
Citations
8165
World Ranking
5250
National Ranking
220

Research.com Recognitions

  • 2021 - IEEE Fellow For contributions to three dimensional flash memories

Overview

Hideaki Aochi is affiliated with Kioxia Corporation in Japan, focusing on research related to three dimensional flash memories. Their work is recognized within the field of memory storage technologies.

In 2021, Hideaki Aochi was named an IEEE Fellow for contributions to the development and advancement of three dimensional flash memories.

Best Publications

  • Bit Cost Scalable Technology with Punch and Plug Process for Ultra High Density Flash Memory

    H. Tanaka;M. Kido;K. Yahashi;M. Oomura

  • Non-volatile semiconductor storage device and method of manufacturing the same

    Yoshiaki Fukuzumi;Ryota Katsumata;Masaru Kidoh;Masaru Kito

  • Nonvolatile semiconductor memory device and method for manufacturing same

    Shigeki Hattori;Reika Ichihara;Masaya Terai;Hideyuki Nishizawa

  • Pipe-shaped BiCS flash memory with 16 stacked layers and multi-level-cell operation for ultra high density storage devices

    Ryota Katsumata;Masaru Kito;Yoshiaki Fukuzumi;Masaru Kido

  • Optimal Integration and Characteristics of Vertical Array Devices for Ultra-High Density, Bit-Cost Scalable Flash Memory

    Y. Fukuzumi;Y. Matsuoka;M. Kito;M. Kido

  • Semiconductor memory and method for manufacturing the same

    Hiroyasu Tanaka;Ryota Katsumata;Hideaki Aochi;Masaru Kidoh

  • Semiconductor memory device and method for manufacturing same

    Takuji Kuniya;Yosuke Komori;Ryota Katsumata;Yoshiaki Fukuzumi

  • Multi-stacked 1G cell/layer Pipe-shaped BiCS flash memory

    Takashi Maeda;Kiyotaro Itagaki;Tomoo Hishida;Ryota Katsumata

  • MANUFACTURING METHOD OF A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE

    Kito Masaru;Aochi Hideaki;Katsumata Ryota;Nitayama Akihiro

  • Memory system, semiconductor memory and its driving method

    Hideaki Aochi;Yoshiaki Fukuzumi;Ryuta Katsumata;Masaru Kito

  • Semiconductor memory device and method for manufacturing the same

    Yoshiaki Fukuzumi;Shinya Arai;Masaki Tsuji;Hideaki Aochi

  • Disturbless flash memory due to high boost efficiency on BiCS structure and optimal memory film stack for ultra high density storage device

    Y. Komori;M. Kido;M. Kito;R. Katsumata

  • Nonvolatile semiconductor memory device and method for manufacturing the same

    Takamitsu Ishihara;Hideaki Aochi

  • Optimal device structure for Pipe-shaped BiCS Flash memory for ultra high density storage device with excellent performance and reliability

    Megumi Ishiduki;Yoshiaki Fukuzumi;Ryota Katsumata;Masaru Kito

  • Nonvolatile semiconductor memory and method for manufacturing the same

    Masaru Kidoh;Ryota Katsumata;Masaru Kito;Yoshiaki Fukuzumi

  • Semiconductor memory and manufacturing method thereof

    Hideaki Aochi;Ryuta Katsumata;Masaru Kito;Takashi Kito

  • Nonvolatile semiconductor storage device and method for manufacturing the same

    Hideaki Aochi;Tomoko Fujiwara;Yoshiaki Fukuzumi;Megumi Ishizuki

  • Nonvolatile semiconductor storage device and method of manufacturing the same

    Masaru Kidoh;Masaru Kito;Ryota Katsumata;Yoshiaki Fukuzumi

  • Semiconductor memory device and manufacturing method thereof

    Hiroyasu Tanaka;Ryota Katsumata;Hideaki Aochi;Masaru Kido

  • Investigation of thin‐film Ni/single‐crystal SiC interface reaction

    I. Ohdomari;S. Sha;H. Aochi;T. Chikyow

  • Semiconductor memory device and method for fabricating semiconductor memory device

    Yoshiaki Fukuzumi;Ryota Katsumata;Masaru Kidoh;Masaru Kito

Frequent Co-Authors

Akihiro Nitayama
Akihiro Nitayama Toshiba (Japan)
Tomoharu Tanaka
Tomoharu Tanaka Toshiba (Japan)
Adrian M. Ionescu
Adrian M. Ionescu École Polytechnique Fédérale de Lausanne

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