World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
5269
World Ranking
5558
National Ranking
1907

Neil Goldsman publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Neil Goldsman sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 294 publications — 56th percentile

56% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Neil Goldsman D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Neil Goldsman sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 35 D-Index — 21st percentile

21% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Neil Goldsman is affiliated with the University of Maryland, College Park in the United States. Their research focuses on several fields within engineering and materials science, particularly emphasizing electrical and electronic engineering and biomedical engineering. The scientist's contributions span topics related to advanced semiconductor materials and devices as well as radiation effects in electronics.

Goldsman's work addresses key topics including:

  • Ga2O3 and related materials
  • Silicon Carbide Semiconductor Technologies
  • Photocathodes and Microchannel Plates
  • GaN-based semiconductor devices and materials
  • ZnO doping and properties
  • Radiation Effects in Electronics
  • Nuclear reactor physics and engineering

Frequent co-authors in Goldsman's publications include Akin Akturk, Zeynep Dilli, Y. Cui, C. Darmody, and Prabal Saxena. These collaborations have contributed to diverse topics in semiconductor research and device optimization.

Their recent papers demonstrate an ongoing engagement with semiconductor device physics and materials characterization, including:

  • Investigation of Wide- and Ultrawide-Bandgap Semiconductors From Impact-Ionization Coefficients, 2020, IEEE Transactions on Electron Devices
  • Energy Dependence of Atmospheric Neutron-Induced Failures in Silicon Carbide Power Devices, 2022, IEEE Transactions on Nuclear Science
  • Effects of Fermi pinning and quantum mechanisms on leakage current of 4H-SiC Schottky diodes, 2022, Journal of Applied Physics
  • Temperature Dependent Characterization-based Design Optimization of a DC-DC Converter for High-Temperature Applications, 2022, 2022 IEEE Applied Power Electronics Conference and Exposition (APEC)
  • Comparison of contact metals evaporated onto monolayer molybdenum disulfide, 2022, Journal of Applied Physics

Goldsman commonly publishes in scientific venues such as the Journal of Applied Physics, IEEE Transactions on Electron Devices, IEEE Transactions on Nuclear Science, and proceedings from the IEEE Applied Power Electronics Conference and Exposition (APEC), reflecting a focus on applied physics and electrical engineering disciplines.

Their research contributions primarily address engineering challenges in advanced materials and semiconductor technologies, including device performance under radiation, high-temperature operation, and materials characterization for next-generation electronic components.

Best Publications

  • Time Dependence of Bias-Stress-Induced SiC MOSFET Threshold-Voltage Instability Measurements

    A.J. Lelis;D. Habersat;R. Green;A. Ogunniyi

  • Electron transport and full-band electron-phonon interactions in graphene

    Akin Akturk;Neil Goldsman

  • Semiclassical transport and phonon scattering of electrons in semiconducting carbon nanotubes

    G. Pennington;N. Goldsman

  • A Physical Model of High Temperature 4H-SiC MOSFETs

    S. Potbhare;N. Goldsman;A. Lelis;J.M. McGarrity

  • F-inverted compact antenna for wireless sensor networks and manufacturing method

    Bo Yang;Felice M. Vanin;Xi Shao;Quirino Balzano

  • Thin flexible rechargeable electrochemical energy cell and method of fabrication

    Martin C. Peckerar;Neil Goldsman;Yves Ngu;Zeynep Dilli

  • Characterization of Transient Gate Oxide Trapping in SiC MOSFETs Using Fast $I$ – $V$ Techniques

    M. Gurfinkel;H.D. Xiong;K.P. Cheung;J.S. Suehle

  • Radiation Effects in Commercial 1200 V 24 A Silicon Carbide Power MOSFETs

    A. Akturk;J. M. McGarrity;S. Potbhare;N. Goldsman

  • An Antenna Co-Design Dual Band RF Energy Harvester

    Bo Li;Xi Shao;Negin Shahshahan;Neil Goldsman

  • Numerical and experimental characterization of 4H-silicon carbide lateral metal-oxide-semiconductor field-effect transistor

    Siddharth Potbhare;Neil Goldsman;Gary Pennington;Aivars Lelis

  • A physics-based analytical/numerical solution to the Boltzmann transport equation for use in device simulation

    Neil Goldsman;Lindor Henrickson;Jeffrey Frey

  • Physics-based numerical modeling and characterization of 6H-silicon-carbide metal–oxide–semiconductor field-effect transistors

    Stephen K. Powell;Neil Goldsman;James M. McGarrity;Joseph Bernstein

  • Device Modeling at Cryogenic Temperatures: Effects of Incomplete Ionization

    A. Akturk;J. Allnutt;Z. Dilli;N. Goldsman

  • A comparison of numerical solutions of the Boltzmann transport equation for high-energy electron transport silicon

    A. Abramo;L. Baudry;R. Brunetti;R. Castagne

  • Electron Transport and Velocity Oscillations in a Carbon Nanotube

    A.. Akturk;G.. Pennington;N.. Goldsman;A.. Wickenden

  • 2-D MOSFET modeling including surface effects and impact ionization by self-consistent solution of the Boltzmann, Poisson, and hole-continuity equations

    Wenchao Liang;N. Goldsman;I. Mayergoyz;P.J. Oldiges

  • A Focused Asymmetric Metal–Insulator–Metal Tunneling Diode: Fabrication, DC Characteristics and RF Rectification Analysis

    Kwangsik Choi;F. Yesilkoy;Geunmin Ryu;Si Hyung Cho

  • Rf power harvesting circuit

    Thomas Steven Salter;George M. Metze;Neil Goldsman;Kwangsik Choi

  • Bias Stress-Induced Threshold-Voltage Instability of SiC MOSFETs

    Aivars J. Lelis;Daniel B. Habersat;G. Lopez;J.M. McGarrity

  • Efficient calculation of ionization coefficients in silicon from the energy distribution function

    Neil Goldsman;Yu‐Jen Wu;Jeffrey Frey

  • CdZnTe heteroepitaxy on 3″ (112) Si: Interface, surface, and layer characteristics

    N. K. Dhar;P. R. Boyd;M. Martinka;J. H. Dinan

  • Temperature-Dependence of SiC MOSFET Threshold-Voltage Instability

    Aivars J. Lelis;Daniel B. Habersat;Ronald Green;Neil Goldsman

  • Self-consistent modeling of heating and MOSFET performance in 3-D integrated circuits

    A. Akturk;N. Goldsman;G. Metze

Frequent Co-Authors

Shuvra S. Bhattacharyya
Shuvra S. Bhattacharyya University of Maryland, College Park
John S. Suehle
John S. Suehle National Institute of Standards and Technology
Omar M. Ramahi
Omar M. Ramahi University of Waterloo
Mario Dagenais
Mario Dagenais University of Maryland, College Park
Jimmy Xu
Jimmy Xu Brown University
Anant K. Agarwal
Anant K. Agarwal The Ohio State University
Madan Dubey
Madan Dubey United States Army Research Laboratory
David J. Gundlach
David J. Gundlach National Institute of Standards and Technology
Zhong Lin Wang
Zhong Lin Wang Georgia Institute of Technology

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