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D-Index & Metrics

Materials Science

D-Index
63
Citations
19523
World Ranking
6056
National Ranking
1547

David J. Gundlach publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where David J. Gundlach sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 208 publications — 33rd percentile

33% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

David J. Gundlach D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where David J. Gundlach sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 63 D-Index — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

David J. Gundlach is affiliated with the National Institute of Standards and Technology in the United States. Their research primarily spans the fields of Engineering and Materials Science, focusing on subfields such as Electrical and Electronic Engineering, Polymers and Plastics, Materials Chemistry, and Electronic, Optical and Magnetic Materials.

Their scholarly work extensively covers topics related to organic electronics and photonics. The main research themes include:

  • Organic Light-Emitting Diodes Research
  • Organic Electronics and Photovoltaics
  • Thin-Film Transistor Technologies
  • Conducting Polymers and Applications
  • Luminescence and Fluorescent Materials
  • Photonic and Optical Devices
  • Nonlinear Optical Materials Research

Frequent co-authors collaborating with David J. Gundlach comprise Sebastian Engmann, Emily G. Bittle, Jasleen K. Bindra, Pragya R. Shrestha, and Chad D. Cruz. These partnerships have supported contributions across multiple studies and publications.

Publications by David J. Gundlach appear most often in the following venues:

  • Journal of Materials Chemistry C
  • ACS Applied Electronic Materials
  • Materials Today Advances
  • SSRN Electronic Journal

Representative recent papers authored or co-authored by David J. Gundlach include:

  • "High-density polyethylene-an inert additive with stabilizing effects on organic field-effect transistors," 2020, Journal of Materials Chemistry C
  • "The role of orientation in the MEL response of OLEDs," 2021, Journal of Materials Chemistry C
  • "Magnetic Field Sensor Based on a OLED/Organic Photodetector Stack," 2023, ACS Applied Electronic Materials
  • "Non-resonant phase sensitive approach for time resolved microwave conductivity in photoactive thin films," 2024, Materials Today Advances
  • "Non-Resonant Phase Sensitive Approach for Time Resolved Microwave Conductivity in Photoactive Thin Films," 2023, SSRN Electronic Journal

Best Publications

  • Stacked pentacene layer organic thin-film transistors with improved characteristics

    Y.-Y. Lin;D.J. Gundlach;S.F. Nelson;T.N. Jackson

  • Pentacene organic thin-film transistors-molecular ordering and mobility

    D.J. Gundlach;Y.Y. Lin;T.N. Jackson;S.F. Nelson

  • Temperature-independent transport in high-mobility pentacene transistors

    S. F. Nelson;Y. Y. Lin;D. J. Gundlach;Thomas Nelson Jackson

  • Organic thin-film transistor-driven polymer-dispersed liquid crystal displays on flexible polymeric substrates

    C. D Sheraw;L. Zhou;J. R Huang;D. J Gundlach

  • Threshold Voltage Shift in Organic Field Effect Transistors by Dipole-Monolayers on the Gate Insulator

    K. P. Pernstich;A. N. Rashid;S. Haas;G. Schitter

  • Threshold voltage shift in organic field effect transistors by dipole monolayers on the gate insulator

    K. P. Pernstich;S. Haas;D. Oberhoff;C. Goldmann

  • An experimental study of contact effects in organic thin film transistors

    D. J. Gundlach;D. J. Gundlach;L. Zhou;J. A. Nichols;T. N. Jackson

  • Contact-induced crystallinity for high-performance soluble acene-based transistors and circuits.

    D. J. Gundlach;J. E. Royer;S. K. Park;S. Subramanian

  • Mobility overestimation due to gated contacts in organic field-effect transistors

    Emily G. Bittle;James I. Basham;James I. Basham;Thomas N. Jackson;Oana D. Jurchescu

  • Semiconducting Thienothiophene Copolymers: Design, Synthesis, Morphology, and Performance in Thin‐Film Organic Transistors

    I McCulloch;M Heeney;ML Chabinyc;D DeLongchamp

  • Pentacene organic thin-film transistors for circuit and display applications

    H. Klauk;D.J. Gundlach;J.A. Nichols;T.N. Jackson

  • Contact resistance extraction in pentacene thin film transistors

    Peter V Necliudov;Michael S Shur;David J Gundlach;Thomas N Jackson

  • Modeling of organic thin film transistors of different designs

    P. V. Necliudov;M. S. Shur;D. J. Gundlach;T. N. Jackson

  • Pentacene TFT with improved linear region characteristics using chemically modified source and drain electrodes

    D.J. Gundlach;Li Li Jia;T.N. Jackson

  • Anisotropic Structure and Charge Transport in Highly Strain‐Aligned Regioregular Poly(3‐hexylthiophene)

    Brendan O'Connor;R. Joseph Kline;Brad R. Conrad;Lee J. Richter

  • Solvent-induced phase transition in thermally evaporated pentacene films

    D. J. Gundlach;T. N. Jackson;D. G. Schlom;S. F. Nelson

  • Contact Resistance in Organic Field‐Effect Transistors: Conquering the Barrier

    Matthew Waldrip;Oana D. Jurchescu;David J. Gundlach;Emily G. Bittle

  • Thin-film transistors based on well-ordered thermally evaporated naphthacene films

    D. J. Gundlach;J. A. Nichols;L. Zhou;T. N. Jackson

  • A Flexible Solution-Processed Memristor

    N. Gergel-Hackett;B. Hamadani;B. Dunlap;J. Suehle

  • Extraordinary control of terahertz beam reflectance in graphene electro-absorption modulators.

    Berardi Sensale-Rodriguez;Rusen Yan;Rusen Yan;Subrina Rafique;Mingda Zhu

  • Undoped polythiophene field-effect transistors with mobility of 1cm2V−1s−1

    B. H. Hamadani;D. J. Gundlach;I. McCulloch;M. Heeney

Frequent Co-Authors

Thomas N. Jackson
Thomas N. Jackson Pennsylvania State University
Curt A. Richter
Curt A. Richter National Institute of Standards and Technology
Oana D. Jurchescu
Oana D. Jurchescu Wake Forest University
Lee J. Richter
Lee J. Richter National Institute of Standards and Technology
Dean M. DeLongchamp
Dean M. DeLongchamp National Institute of Standards and Technology
John E. Anthony
John E. Anthony University of Kentucky
R. Joseph Kline
R. Joseph Kline National Institute of Standards and Technology
Daniel A. Fischer
Daniel A. Fischer National Institute of Standards and Technology
Lian-Mao Peng
Lian-Mao Peng Peking University
Iain McCulloch
Iain McCulloch University of Oxford

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