World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
55
Citations
18579
World Ranking
8441
National Ranking
2078

R. Joseph Kline publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where R. Joseph Kline sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 141 publications — 11th percentile

11% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

R. Joseph Kline D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where R. Joseph Kline sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 55 D-Index — 34th percentile

34% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

R. Joseph Kline is affiliated with the National Institute of Standards and Technology in the United States. Their research mainly focuses on the fields of Materials Science and Engineering, with specific emphasis on subfields such as Materials Chemistry, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Radiation, and Biomedical Engineering.

The scientist's work spans multiple topics, including:

  • Block Copolymer Self-Assembly
  • Material Dynamics and Properties
  • Advanced Polymer Synthesis and Characterization
  • Rheology and Fluid Dynamics Studies
  • Organic Electronics and Photovoltaics
  • Conducting polymers and applications
  • X-ray Spectroscopy and Fluorescence Analysis

R. Joseph Kline has published research in various scientific journals. Frequent publication venues include:

  • ACS Nano
  • Chemistry of Materials
  • Acta Crystallographica Section A Foundations and Advances
  • Science Advances
  • Advanced Energy Materials

Notable papers by R. Joseph Kline include:

  • Soft crystal martensites: An in situ resonant soft x-ray scattering study of a liquid crystal martensitic transformation, 2020, Science Advances
  • Confinement and Processing Can Alter the Morphology and Periodicity of Bottlebrush Block Copolymers in Thin Films, 2020, ACS Nano
  • Influence of Polymer Aggregation and Liquid Immiscibility on Morphology Tuning by Varying Composition in PffBT4T-2DT/Nonfullerene Organic Solar Cells, 2020, Advanced Energy Materials
  • Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography, 2020, Chemistry of Materials
  • A NIST facility for resonant soft x-ray scattering measuring nano-scale soft matter structure at NSLS-II, 2021, Journal of Physics Condensed Matter

Frequent co-authors of R. Joseph Kline include:

  • Daniel F. Sunday
  • Dean M. DeLongchamp
  • Paul F. Nealey
  • S. Mukherjee
  • Eliot Gann

Best Publications

  • Liquid-crystalline semiconducting polymers with high charge-carrier mobility.

    Iain McCulloch;Martin Heeney;Clare Bailey;Kristijonas Genevicius

  • Dependence of Regioregular Poly(3-hexylthiophene) Film Morphology and Field-Effect Mobility on Molecular Weight

    R.Joseph Kline;Michael D. McGehee;Ekaterina N. Kadnikova;Jinsong Liu

  • Controlling the Field‐Effect Mobility of Regioregular Polythiophene by Changing the Molecular Weight

    R.J. Kline;M.D. McGehee;E.N. Kadnikova;E.N. Kadnikova;J. Liu;J. Liu

  • Highly oriented crystals at the buried interface in polythiophene thin-film transistors

    R. Joseph Kline;Michael D. McGehee;Michael F. Toney

  • Molecular origin of high field-effect mobility in an indacenodithiophene–benzothiadiazole copolymer

    Xinran Zhang;Hugo Bronstein;Auke J. Kronemeijer;Jeremy Smith

  • Microstructural Characterization and Charge Transport in Thin Films of Conjugated Polymers

    Alberto Salleo;R. Joseph Kline;Dean M. DeLongchamp;Michael L. Chabinyc

  • Metrology for the next generation of semiconductor devices

    Unknown

  • Molecular-weight-dependent mobilities in regioregular poly(3-hexyl-thiophene) diodes

    Chiatzun Goh;R. Joseph Kline;Michael D. McGehee;Ekaterina N. Kadnikova

  • Contact-induced crystallinity for high-performance soluble acene-based transistors and circuits.

    D. J. Gundlach;J. E. Royer;S. K. Park;S. Subramanian

  • Semiconducting Thienothiophene Copolymers: Design, Synthesis, Morphology, and Performance in Thin‐Film Organic Transistors

    I McCulloch;M Heeney;ML Chabinyc;D DeLongchamp

  • Molecular packing of high-mobility diketo pyrrolo-pyrrole polymer semiconductors with branched alkyl side chains

    Xinran Zhang;Lee J. Richter;Dean M. DeLongchamp;R. Joseph Kline

  • X-ray scattering study of thin films of poly(2,5-bis(3-alkylthiophen-2-yl)thieno[3,2-b]thiophene).

    Michael L. Chabinyc;Michael F. Toney;R. Joseph Kline;Iain McCulloch

  • Critical Role of Side-Chain Attachment Density on the Order and Device Performance of Polythiophenes

    R. Joseph Kline;Dean M. Delongchamp;Daniel A. Fischer;Eric K. Lin

  • Quantitative analysis of lattice disorder and crystallite size in organic semiconductor thin films

    Jonathan Rivnay;Rodrigo Noriega;R. Joseph Kline;Alberto Salleo

  • Anisotropic Structure and Charge Transport in Highly Strain‐Aligned Regioregular Poly(3‐hexylthiophene)

    Brendan O'Connor;R. Joseph Kline;Brad R. Conrad;Lee J. Richter

  • High Carrier Mobility Polythiophene Thin Films: Structure Determination by Experiment and Theory†

    Dean M. DeLongchamp;Regis J. Kline;Eric K. Lin;Daniel A. Fischer

  • Morphology and Charge Transport in Conjugated Polymers

    R. J. Kline;M. D. McGehee

  • Molecular characterization of organic electronic films.

    Dean M. DeLongchamp;R. Joseph Kline;Daniel A. Fischer;Lee J. Richter

  • Correlations between Mechanical and Electrical Properties of Polythiophenes

    Brendan O’Connor;Edwin P. Chan;Calvin Chan;Brad R. Conrad

  • Interfacial Segregation in Polymer/Fullerene Blend Films for Photovoltaic Devices

    David S. Germack;Calvin K. Chan;R. Joseph Kline;Daniel A. Fischer

  • Structural Origin of Gap States in Semicrystalline Polymers and the Implications for Charge Transport

    Jonathan Rivnay;Rodrigo Noriega;John E. Northrup;R. Joseph Kline

Frequent Co-Authors

Dean M. DeLongchamp
Dean M. DeLongchamp National Institute of Standards and Technology
Michael F. Toney
Michael F. Toney University of Colorado Boulder
Lee J. Richter
Lee J. Richter National Institute of Standards and Technology
Iain McCulloch
Iain McCulloch University of Oxford
Martin Heeney
Martin Heeney Imperial College London
Daniel A. Fischer
Daniel A. Fischer National Institute of Standards and Technology
David J. Gundlach
David J. Gundlach National Institute of Standards and Technology
Paul F. Nealey
Paul F. Nealey University of Chicago
Wen-li Wu
Wen-li Wu National Institute of Standards and Technology
Eric K. Lin
Eric K. Lin National Institute of Standards and Technology

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