World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
44
Citations
7792
World Ranking
5798
National Ranking
1623

Manuel Quevedo-Lopez publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Manuel Quevedo-Lopez sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 330 publications — 81st percentile

81% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Manuel Quevedo-Lopez D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Manuel Quevedo-Lopez sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 44 D-Index — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Manuel Quevedo-Lopez is affiliated with The University of Texas at Dallas in the United States. Their research spans multiple fields, principally focusing on Engineering and Materials Science. Within these domains, they have contributed extensively to specialized subfields such as Electrical and Electronic Engineering, Materials Chemistry, Electronic, Optical and Magnetic Materials, Renewable Energy, Sustainability and the Environment, and Biomedical Engineering.

Their work addresses a range of topics including Perovskite Materials and Applications, ZnO doping and properties, Thin-Film Transistor Technologies, Ga2O3 and related materials, Advanced Photocatalysis Techniques, Luminescence Properties of Advanced Materials, and Chalcogenide Semiconductor Thin Films.

Manuel Quevedo-Lopez has collaborated frequently with a number of coauthors, including Carlos Ávila-Avendaño, Leunam Fernández-Izquierdo, Martin Gregorio Reyes-Banda, Maria Isabel Pintor-Monroy, and J. A. Caraveo-Frescas.

The scientist's recent published papers include:

  • Mechanical and microstructural properties of broadband anti-reflective TiO2/SiO2 coatings for photovoltaic applications fabricated by magnetron sputtering, 2020, Solar Energy Materials and Solar Cells
  • Optical and mechanical properties of Zr-oxide doped TiO2/SiO2 anti-reflective coatings for PV glass covers, 2022, Solar Energy Materials and Solar Cells
  • PVP-SiO2 and PVP-TiO2 hybrid films for dielectric gate applications in CdS-based thin film transistors, 2020, Polymer
  • Nanocrystalline and Polycrystalline β-Ga2O3 Thin Films for Deep Ultraviolet Detectors, 2020, ACS Applied Electronic Materials
  • Deep UV Sensors Enabling Solar-Blind Flame Detectors for Large-Area Applications, 2021, IEEE Sensors Journal

Their publications have appeared frequently in several scientific venues, notably:

  • Advanced Materials Technologies
  • ACS Applied Materials & Interfaces
  • Journal of Materials Science Materials in Electronics
  • SSRN Electronic Journal
  • ACS Applied Electronic Materials

Best Publications

  • Effect of nitrogen on band alignment in HfSiON gate dielectrics

    S. Sayan;N. V. Nguyen;J. Ehrstein;J. J. Chambers

  • Biofunctionalized two-dimensional Ti3C2 MXenes for ultrasensitive detection of cancer biomarker.

    Saurabh Kumar;Yongjiu Lei;Niman H. Alshareef;M.A. Quevedo-Lopez

  • Impurities and Electronic Property Variations of Natural MoS2 Crystal Surfaces.

    Rafik Addou;Stephen McDonnell;Diego Barrera;Zaibing Guo

  • Large-Area Deposition of MoS2 by Pulsed Laser Deposition with In Situ Thickness Control

    Martha I. Serna;Seong H. Yoo;Salvador Moreno;Yang Xi

  • Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning

    P. D. Kirsch;P. Sivasubramani;J. Huang;C. D. Young

  • Nucleation and growth study of atomic layer deposited HfO 2 gate dielectrics resulting in improved scaling and electron mobility

    P. D. Kirsch;M. A. Quevedo-Lopez;H. J. Li;Y. Senzaki

  • Optimization of poly(vinylidene fluoride-trifluoroethylene) films as non-volatile memory for flexible electronics

    Duo Mao;Manuel Angel Quevedo Quevedo-López;Harvey J. Stiegler;Bruce E. Gnade

  • High-Performance Coils and Yarns of Polymeric Piezoelectric Nanofibers

    Mahmoud Baniasadi;Jiacheng Huang;Zhe Xu;Salvador Moreno

  • Work function engineering using lanthanum oxide interfacial layers

    H. N. Alshareef;M. Quevedo-Lopez;H. C. Wen;R. Harris

  • Mechanical and microstructural properties of broadband anti-reflective TiO2/SiO2 coatings for photovoltaic applications fabricated by magnetron sputtering

    D.F. Zambrano;R. Villarroel;R. Espinoza-González;N. Carvajal

  • Poly(3-hexylthiophene)-CdSe Quantum Dot Bulk Heterojunction Solar Cells: Influence of the Functional End-Group of the Polymer

    Kumaranand Palaniappan;John W. Murphy;Nadia Khanam;Julius Horvath

  • Hafnium interdiffusion studies from hafnium silicate into silicon

    M. Quevedo-Lopez;M. El-Bouanani;S. Addepalli;J. L. Duggan

  • Biocompatible Collagen Films as Substrates for Flexible Implantable Electronics

    Salvador Moreno;Mahmoud Baniasadi;Shakil Mohammed;Israel Mejia

  • Ferroelectric Properties and Polarization Switching Kinetic of Poly (vinylidene fluoride-trifluoroethylene) Copolymer

    Duo Mao;Bruce E. Gnade;Manuel A. Quevedo-Lopez

  • Top surface roughness reduction of high-k dielectric materials using plasma based processes

    Manuel A. Quevedo-Lopez;James J. Chambers;Luigi Colombo;Mark R. Visokay

  • Effect of N incorporation on boron penetration from p+ polycrystalline-Si through HfSixOy films

    M. A. Quevedo-Lopez;M. El-Bouanani;M. J. Kim;B. E. Gnade

  • Adjustable structural, optical and dielectric characteristics in sol–gel PMMA–SiO2 hybrid films

    M.D. Morales-Acosta;C.G. Alvarado-Beltrán;M.A. Quevedo-López;B.E. Gnade

  • Dipole Moment Model Explaining nFET V t Tuning Utilizing La, Sc, Er, and Sr Doped HfSiON Dielectrics

    P. Sivasubramani;T.S. Boscke;J. Huang;C.D. Young

  • Optical and mechanical properties of Zr-oxide doped TiO2/SiO2 anti-reflective coatings for PV glass covers

    Unknown

  • Interdiffusion studies for HfSixOy and ZrSixOy on Si

    M. A. Quevedo-Lopez;M. El-Bouanani;B. E. Gnade;R. M. Wallace

  • Metal gate work function engineering using AlNx interfacial layers

    H. N. Alshareef;H. N. Alshareef;H. F. Luan;K. Choi;H. R. Harris

  • Ammonia-free chemically deposited CdS films as active layers in thin film transistors

    G. Arreola-Jardón;L.A. González;L.A. García-Cerda;B. Gnade

  • Preparation of hcp and fcc Ni and Ni/NiO nanoparticles using a citric acid assisted pechini-type method

    L. A. García-Cerda;K. M. Bernal-Ramos;Sagrario M. Montemayor;M. A. Quevedo-López

Frequent Co-Authors

Bruce E. Gnade
Bruce E. Gnade The University of Texas at Dallas
Husam N. Alshareef
Husam N. Alshareef King Abdullah University of Science and Technology
Robert M. Wallace
Robert M. Wallace The University of Texas at Dallas
Paul Kirsch
Paul Kirsch Samsung Austin Semiconductor
Byoung Hun Lee
Byoung Hun Lee Pohang University of Science and Technology
Luigi Colombo
Luigi Colombo The University of Texas at Dallas
Mark R. Visokay
Mark R. Visokay Texas Instruments (United States)
Prashant Majhi
Prashant Majhi Intel (United States)
Gennadi Bersuker
Gennadi Bersuker The Aerospace Corporation
Rino Choi
Rino Choi Inha University

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