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John C. C. Fan

D-Index & Metrics

Discipline name D-Index World Ranking National Ranking Publications Citations
Materials Science 55 8626 2121 164 10566
Engineering and Technology 53 3432 1008 148 9916

John C. C. Fan publications per year

The chart shows the history of publications by John C. C. Fan between 1973 and 2003, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. John C. C. Fan published across 31 years, from 1973 to 2003, averaging 5.7 papers a year. Output peaked at 32 publications in 1981. 5 of the 177 publications appeared in the last two years.

No. of publications
10 20 30
Bar chart. Horizontal axis: year, 1973 to 2003. Vertical axis: number of publications, 0 to 32. Peak 32 publications in 1981. 1973: 1 publication 1974: 6 publications 1975: 5 publications 1976: 5 publications 1977: 7 publications 1978: 3 publications 1979: 10 publications 1980: 23 publications 1981: 32 publications 1982: 23 publications 1983: 9 publications 1984: 17 publications 1985: 4 publications 1986: 1 publication 1987: 4 publications 1988: 3 publications 1989: 1 publication 1990: 2 publications 1991: 2 publications 1992: 0 publications 1993: 1 publication 1994: 5 publications 1995: 0 publications 1996: 0 publications 1997: 5 publications 1998: 2 publications 1999: 0 publications 2000: 0 publications 2001: 1 publication 2002: 1 publication 2003: 4 publications
1973 2003

177 publications in total across all disciplines

View publications per year as a table
John C. C. Fan: publications per year, 1973 to 2003
Year Publications
1973 1
1974 6
1975 5
1976 5
1977 7
1978 3
1979 10
1980 23
1981 32
1982 23
1983 9
1984 17
1985 4
1986 1
1987 4
1988 3
1989 1
1990 2
1991 2
1992 0
1993 1
1994 5
1995 0
1996 0
1997 5
1998 2
1999 0
2000 0
2001 1
2002 1
2003 4
Total 177
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John C. C. Fan publications per year - data summary

  • John C. C. Fan, a Engineering and Technology scholar from Kopin Corporation (United States), has 177 publications recorded across 31 years, from 1973 to 2003.
  • The oldest publication on record dates to 1973 and the most recent to 2003.
  • The most productive year is 1981, with 32 publications.
  • The least productive years with any output are 1973, 1986, 1989, 1993 and others, with 1 publication each.
  • 5 of the 31 years in the span carry no publications at all (1992, 1995, 1996, 1999 and others).
  • The rate of publication averages 5.7 papers per year over the whole span, or 6.8 per year counting only the 26 years with at least one publication.
  • The last 5 years on the chart (1999-2003) hold 6 publications, 3% of the career total.
  • Split into equal eras - 1973-1983: 124 publications (11.3 per year); 1984-1994: 40 publications (3.6 per year); 1995-2003: 13 publications (1.4 per year).
  • Comparing the opening and closing eras, the overall trend of publication is declining.

John C. C. Fan publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where John C. C. Fan sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: publications, 38–47 to 804+. Vertical axis: number of scientists, 0 to 457. Most scientists, 457, have 148–157 publications. The last bar groups every scientist with 804 publications or more. The highlighted bar, 148–157 publications, is where this scientist sits. 38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38–47 publications 804+

This scientist: 148 publications — 26th percentile

26% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

View publications distribution as a table
Number of Engineering and Technology scientists by publication count, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
Publications Scientists This scientist
38–47 20
48–57 35
58–67 96
68–77 135
78–87 190
88–97 259
98–107 283
108–117 369
118–127 341
128–137 386
138–147 372
148–157 457 148
158–167 415
168–177 407
178–187 421
188–197 378
198–207 403
208–217 317
218–227 346
228–237 321
238–247 260
248–257 280
258–267 240
268–277 214
278–287 242
288–297 203
298–307 166
308–317 154
318–327 175
328–337 159
338–347 99
348–357 131
358–367 106
368–377 118
378–387 97
388–397 108
398–407 82
408–417 71
418–427 64
428–437 55
438–447 54
448–457 60
458–467 47
468–477 40
478–487 30
488–497 29
498–507 38
508–517 40
518–527 32
528–537 23
538–547 28
548–557 23
558–567 19
568–577 16
578–587 17
588–597 18
598–607 22
608–617 15
618–627 9
628–637 11
638–647 21
648–657 12
658–667 9
668–677 11
678–687 9
688–697 6
698–707 14
708–717 7
718–727 8
728–737 10
738–747 9
748–757 5
758–767 5
768–777 11
778–787 7
788–797 2
798–803 4
804+ 100
Download as CSV

John C. C. Fan publication distribution in Engineering and Technology in 2026 - data summary

  • The chart plots the publication count of all 9,796 Engineering and Technology scientists ranked by Research.com in 2026, grouped into 78 ranges running from 38–47 to 804+ publications.
  • John C. C. Fan, a Engineering and Technology scholar from Kopin Corporation (United States), records 148 publications - the 26th percentile of the discipline.
  • 26% of ranked Engineering and Technology scientists score the same or lower than John C. C. Fan, and about 74% score higher.
  • The median of the discipline falls in the 198–207 publications range, and John C. C. Fan ranks below the median.
  • The most crowded range is 148–157 publications, holding 457 scientists (5% of the field).
  • 61% of the field sits in the lowest quarter of the value range (up to 228–237 publications), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 804 publications or more, 100 scientists in all (1% of the field).

John C. C. Fan D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where John C. C. Fan sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: D-Index, 30 to 107+. Vertical axis: number of scientists, 0 to 426. Most scientists, 426, have 42 D-Index. The last bar groups every scientist with 107 D-Index or more. The highlighted bar, 53 D-Index, is where this scientist sits. 30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 53 D-Index — 66th percentile

66% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

View D-Index distribution as a table
Number of Engineering and Technology scientists by D-index, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
D-Index Scientists This scientist
30 59
31 114
32 129
33 189
34 200
35 262
36 311
37 312
38 350
39 385
40 348
41 362
42 426
43 380
44 310
45 341
46 301
47 306
48 271
49 246
50 210
51 253
52 213
53 221 53
54 195
55 186
56 170
57 167
58 166
59 144
60 152
61 141
62 138
63 131
64 118
65 114
66 119
67 95
68 87
69 77
70 89
71 69
72 54
73 46
74 55
75 54
76 49
77 53
78 46
79 28
80 39
81 36
82 24
83 26
84 36
85 18
86 25
87 19
88 26
89 27
90 23
91 15
92 12
93 9
94 15
95 10
96 13
97 13
98 9
99 7
100 7
101 8
102 7
103 7
104 9
105 6
106 9
107+ 99
Download as CSV

John C. C. Fan D-index placement in Engineering and Technology in 2026 - data summary

  • The chart plots the discipline H-index (D-index) of all 9,796 Engineering and Technology scientists ranked by Research.com in 2026, grouped into 78 ranges running from 30 to 107+ D-Index.
  • John C. C. Fan, a Engineering and Technology scholar from Kopin Corporation (United States), records 53 D-Index - the 66th percentile of the discipline.
  • 66% of ranked Engineering and Technology scientists score the same or lower than John C. C. Fan, and about 34% score higher.
  • The median of the discipline falls in the 47 D-Index range, and John C. C. Fan ranks above the median.
  • The most crowded range is 42 D-Index, holding 426 scientists (4% of the field).
  • 57% of the field sits in the lowest quarter of the value range (up to 49 D-Index), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 107 D-Index or more, 99 scientists in all (1% of the field).

Research.com Recognitions

  • 2020 - Member of the National Academy of Engineering For innovation and entrepreneurship in electronic materials and devices for displays.

Overview

John C. C. Fan is affiliated with Kopin Corporation in the United States. Their career focuses on electronic materials and devices, particularly in the domain of display technologies.

In recognition of their contributions, John C. C. Fan was elected as a Member of the National Academy of Engineering in 2020. The citation for this award highlights their innovation and entrepreneurship in the field of electronic materials and devices for displays.

Although no recent papers, co-authors, or publications venues are recorded, the available information underscores John C. C. Fan's activity within applied research and development related to electronic display systems.

Best Publications

  • X-ray photoemission spectroscopy studies of Sn-doped indium-oxide films

    John C. C. Fan;John B. Goodenough

  • METHOD FOR MANUFACTURE OF THIN-FILM OF SEMICONDUCTOR MATERIAL

    Bozler Carl O;Fan John C C;Mcclelland Robert W

  • Theoretical temperature dependence of solar cell parameters

    John C. C. Fan

  • Transparent heat mirrors for solar-energy applications.

    John C. C. Fan;Frank J. Bachner

  • Liquid crystal light valve device

    Brenda Dingle;John C C Fan;Jeffrey Jacobsen;Robert Mcclelland

  • Method of producing sheets of crystalline material and devices made therefrom

    Carl O. Bozler;John C. C. Fan;Robert W. McClelland

  • Method of crystallizing amorphous material with a moving energy beam

    John C. C. Fan;Herbert J. Zieger

  • Transparent heat‐mirror films of TiO2/Ag/TiO2 for solar energy collection and radiation insulation

    John C. C. Fan;Frank J. Bachner;George H. Foley;Paul M. Zavracky

  • Properties of Sn‐Doped In2 O 3 Films Prepared by RF Sputtering

    John C. C. Fan;Frank J. Bachner

  • Zone‐Melting Recrystallization of Si Films with a Moveable‐Strip‐Heater Oven

    M. W. Geis;Henry I. Smith;B. ‐Y. Tsaur;John C. C. Fan

  • Transparent heat-mirror

    John C. C. Fan;Frank J. Bachner

  • Method for improving the crystallinity of semiconductor films by laser beam scanning

    Herbert J. Zeiger;John C.C. Fan

  • A technique for producing epitaxial films on reuseable substrates

    R. W. McClelland;C. O. Bozler;J. C. C. Fan

  • Lateral epitaxy by seeded solidification for growth of single‐crystal Si films on insulators

    John C. C. Fan;M. W. Geis;Bor‐Yeu Tsaur

  • Effect of O2 pressure during deposition on properties of rf‐sputtered Sn‐doped In2O3 films

    John C. C. Fan;Frank J. Bachner;George H. Foley

  • Lateral epitaxial growth by seeded solidification.

    Bor-Yeu Tsaur;John C C Fan;Michael W Geis

  • Semiconductor thin films

    Bor-Yeu Tsaur;John C. C. Fan;Michael W. Geis

  • Explosive crystallization of amorphous germanium

    H. J. Leamy;W. L. Brown;George Celler;G. Foti

  • Efficient Si solar cells by laser photochemical doping

    T. F. Deutsch;J. C. C. Fan;G. W. Turner;R. L. Chapman

  • Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    John C. C. Fan;Bor-Yeu Tsaur;Ronald P. Gale;Frances M. Davis

Frequent Co-Authors

Michael W. Geis
Michael W. Geis MIT
Jeffrey Jacobsen
Jeffrey Jacobsen Kopin Corporation (United States)
Jagdish Narayan
Jagdish Narayan North Carolina State University
Joseph P. Donnelly
Joseph P. Donnelly MIT
Henry I. Smith
Henry I. Smith MIT
John B. Goodenough
John B. Goodenough The University of Texas at Austin
Steven R. J. Brueck
Steven R. J. Brueck University of New Mexico
George H. Gilmer
George H. Gilmer Colorado School of Mines
Harold R. Fetterman
Harold R. Fetterman University of California, Los Angeles
Richard M. Osgood
Richard M. Osgood Columbia University

External Links

Personal website of John C. C. Fan

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Finally, effective communication is crucial in engineering and technology sectors. An online master’s in communication can help engineers and tech leaders develop strong interpersonal and organizational communication skills to thrive in collaborative projects.

Best Scientists Citing John C. C. Fan

Shunpei Yamazaki

Shunpei Yamazaki

Semiconductor Energy Laboratory (Japan)

Publications: 56

Abraham C. Ma

Abraham C. Ma

Super Talent Technology, Corp.

Publications: 41

Dureseti Chidambarrao

Dureseti Chidambarrao

IBM (United States)

Publications: 36

Ming-Shiang Shen

Ming-Shiang Shen

Super Talent Electronics, Inc

Publications: 34

Han-Ki Kim

Han-Ki Kim

Sungkyunkwan University

Publications: 31

Jeffrey Jacobsen

Jeffrey Jacobsen

Kopin Corporation (United States)

Publications: 30

Jagdish Narayan

Jagdish Narayan

North Carolina State University

Publications: 29

Robert F. Davis

Robert F. Davis

Carnegie Mellon University

Publications: 23

Harry A. Atwater

Harry A. Atwater

California Institute of Technology

Publications: 21

Henry I. Smith

Henry I. Smith

MIT

Publications: 20

Takao Yonehara

Takao Yonehara

Canon (Japan)

Publications: 19

Bruce B. Doris

Bruce B. Doris

IBM (United States)

Publications: 19

Michael W. Geis

Michael W. Geis

MIT

Publications: 18

Nathan W. Cheung

Nathan W. Cheung

University of California, Berkeley

Publications: 17

Huilong Zhu

Huilong Zhu

Chinese Academy of Sciences

Publications: 17

Kevin J. Linthicum

Kevin J. Linthicum

MACOM (United States)

Publications: 17

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