World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
55
Citations
10566
World Ranking
8626
National Ranking
2121

Engineering and Technology

D-Index
53
Citations
9916
World Ranking
3432
National Ranking
1008

John C. C. Fan publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where John C. C. Fan sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 148 publications — 26th percentile

26% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

John C. C. Fan D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where John C. C. Fan sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 53 D-Index — 66th percentile

66% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Research.com Recognitions

  • 2020 - Member of the National Academy of Engineering For innovation and entrepreneurship in electronic materials and devices for displays.

Overview

John C. C. Fan is affiliated with Kopin Corporation in the United States. Their career focuses on electronic materials and devices, particularly in the domain of display technologies.

In recognition of their contributions, John C. C. Fan was elected as a Member of the National Academy of Engineering in 2020. The citation for this award highlights their innovation and entrepreneurship in the field of electronic materials and devices for displays.

Although no recent papers, co-authors, or publications venues are recorded, the available information underscores John C. C. Fan's activity within applied research and development related to electronic display systems.

Best Publications

  • X-ray photoemission spectroscopy studies of Sn-doped indium-oxide films

    John C. C. Fan;John B. Goodenough

  • METHOD FOR MANUFACTURE OF THIN-FILM OF SEMICONDUCTOR MATERIAL

    Bozler Carl O;Fan John C C;Mcclelland Robert W

  • Theoretical temperature dependence of solar cell parameters

    John C. C. Fan

  • Transparent heat mirrors for solar-energy applications.

    John C. C. Fan;Frank J. Bachner

  • Liquid crystal light valve device

    Brenda Dingle;John C C Fan;Jeffrey Jacobsen;Robert Mcclelland

  • Method of producing sheets of crystalline material and devices made therefrom

    Carl O. Bozler;John C. C. Fan;Robert W. McClelland

  • Method of crystallizing amorphous material with a moving energy beam

    John C. C. Fan;Herbert J. Zieger

  • Transparent heat‐mirror films of TiO2/Ag/TiO2 for solar energy collection and radiation insulation

    John C. C. Fan;Frank J. Bachner;George H. Foley;Paul M. Zavracky

  • Properties of Sn‐Doped In2 O 3 Films Prepared by RF Sputtering

    John C. C. Fan;Frank J. Bachner

  • Zone‐Melting Recrystallization of Si Films with a Moveable‐Strip‐Heater Oven

    M. W. Geis;Henry I. Smith;B. ‐Y. Tsaur;John C. C. Fan

  • Transparent heat-mirror

    John C. C. Fan;Frank J. Bachner

  • Method for improving the crystallinity of semiconductor films by laser beam scanning

    Herbert J. Zeiger;John C.C. Fan

  • A technique for producing epitaxial films on reuseable substrates

    R. W. McClelland;C. O. Bozler;J. C. C. Fan

  • Lateral epitaxy by seeded solidification for growth of single‐crystal Si films on insulators

    John C. C. Fan;M. W. Geis;Bor‐Yeu Tsaur

  • Effect of O2 pressure during deposition on properties of rf‐sputtered Sn‐doped In2O3 films

    John C. C. Fan;Frank J. Bachner;George H. Foley

  • Lateral epitaxial growth by seeded solidification.

    Bor-Yeu Tsaur;John C C Fan;Michael W Geis

  • Semiconductor thin films

    Bor-Yeu Tsaur;John C. C. Fan;Michael W. Geis

  • Explosive crystallization of amorphous germanium

    H. J. Leamy;W. L. Brown;George Celler;G. Foti

  • Efficient Si solar cells by laser photochemical doping

    T. F. Deutsch;J. C. C. Fan;G. W. Turner;R. L. Chapman

  • Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    John C. C. Fan;Bor-Yeu Tsaur;Ronald P. Gale;Frances M. Davis

Frequent Co-Authors

Jeffrey Jacobsen
Jeffrey Jacobsen Kopin Corporation (United States)
Jagdish Narayan
Jagdish Narayan North Carolina State University
John B. Goodenough
John B. Goodenough The University of Texas at Austin
Steven R. J. Brueck
Steven R. J. Brueck University of New Mexico
George H. Gilmer
George H. Gilmer Colorado School of Mines
Harold R. Fetterman
Harold R. Fetterman University of California, Los Angeles
Richard M. Osgood
Richard M. Osgood Columbia University

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