World's Best Scientists 2026 revealed!

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Materials Science

D-Index
55
Citations
10566
World Ranking
8628
National Ranking
2123

Engineering and Technology

D-Index
53
Citations
9916
World Ranking
3430
National Ranking
1007

Research.com Recognitions

  • 2020 - Member of the National Academy of Engineering For innovation and entrepreneurship in electronic materials and devices for displays.

Overview

John C. C. Fan is affiliated with Kopin Corporation in the United States. Their career focuses on electronic materials and devices, particularly in the domain of display technologies.

In recognition of their contributions, John C. C. Fan was elected as a Member of the National Academy of Engineering in 2020. The citation for this award highlights their innovation and entrepreneurship in the field of electronic materials and devices for displays.

Although no recent papers, co-authors, or publications venues are recorded, the available information underscores John C. C. Fan's activity within applied research and development related to electronic display systems.

Best Publications

  • X-ray photoemission spectroscopy studies of Sn-doped indium-oxide films

    John C. C. Fan;John B. Goodenough

  • METHOD FOR MANUFACTURE OF THIN-FILM OF SEMICONDUCTOR MATERIAL

    Bozler Carl O;Fan John C C;Mcclelland Robert W

  • Theoretical temperature dependence of solar cell parameters

    John C. C. Fan

  • Transparent heat mirrors for solar-energy applications.

    John C. C. Fan;Frank J. Bachner

  • Liquid crystal light valve device

    Brenda Dingle;John C C Fan;Jeffrey Jacobsen;Robert Mcclelland

  • Method of producing sheets of crystalline material and devices made therefrom

    Carl O. Bozler;John C. C. Fan;Robert W. McClelland

  • Method of crystallizing amorphous material with a moving energy beam

    John C. C. Fan;Herbert J. Zieger

  • Transparent heat‐mirror films of TiO2/Ag/TiO2 for solar energy collection and radiation insulation

    John C. C. Fan;Frank J. Bachner;George H. Foley;Paul M. Zavracky

  • Properties of Sn‐Doped In2 O 3 Films Prepared by RF Sputtering

    John C. C. Fan;Frank J. Bachner

  • Zone‐Melting Recrystallization of Si Films with a Moveable‐Strip‐Heater Oven

    M. W. Geis;Henry I. Smith;B. ‐Y. Tsaur;John C. C. Fan

  • Transparent heat-mirror

    John C. C. Fan;Frank J. Bachner

  • Method for improving the crystallinity of semiconductor films by laser beam scanning

    Herbert J. Zeiger;John C.C. Fan

  • A technique for producing epitaxial films on reuseable substrates

    R. W. McClelland;C. O. Bozler;J. C. C. Fan

  • Lateral epitaxy by seeded solidification for growth of single‐crystal Si films on insulators

    John C. C. Fan;M. W. Geis;Bor‐Yeu Tsaur

  • Effect of O2 pressure during deposition on properties of rf‐sputtered Sn‐doped In2O3 films

    John C. C. Fan;Frank J. Bachner;George H. Foley

  • Lateral epitaxial growth by seeded solidification.

    Bor-Yeu Tsaur;John C C Fan;Michael W Geis

  • Semiconductor thin films

    Bor-Yeu Tsaur;John C. C. Fan;Michael W. Geis

  • Explosive crystallization of amorphous germanium

    H. J. Leamy;W. L. Brown;George Celler;G. Foti

  • Efficient Si solar cells by laser photochemical doping

    T. F. Deutsch;J. C. C. Fan;G. W. Turner;R. L. Chapman

  • Reducing dislocations in semiconductors utilizing repeated thermal cycling during multistage epitaxial growth

    John C. C. Fan;Bor-Yeu Tsaur;Ronald P. Gale;Frances M. Davis

Frequent Co-Authors

Jeffrey Jacobsen
Jeffrey Jacobsen Kopin Corporation (United States)
Jagdish Narayan
Jagdish Narayan North Carolina State University
John B. Goodenough
John B. Goodenough The University of Texas at Austin
Steven R. J. Brueck
Steven R. J. Brueck University of New Mexico
George H. Gilmer
George H. Gilmer Colorado School of Mines
Harold R. Fetterman
Harold R. Fetterman University of California, Los Angeles
Richard M. Osgood
Richard M. Osgood Columbia University

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