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Joseph P. Donnelly

Joseph P. Donnelly

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Engineering and Technology 42 6692 6461 1824 1693 255 5883

Joseph P. Donnelly publications per year

The chart shows the history of publications by Joseph P. Donnelly between 1965 and 2018, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Joseph P. Donnelly published across 54 years, from 1965 to 2018, averaging 5 papers a year. Output peaked at 12 publications in 1988. 4 of the 269 publications appeared in the last two years.

No. of publications
5 10
Bar chart. Horizontal axis: year, 1965 to 2018. Vertical axis: number of publications, 0 to 12. Peak 12 publications in 1988. 1965: 2 publications 1966: 4 publications 1967: 1 publication 1968: 2 publications 1969: 2 publications 1970: 2 publications 1971: 2 publications 1972: 2 publications 1973: 2 publications 1974: 2 publications 1975: 5 publications 1976: 9 publications 1977: 7 publications 1978: 2 publications 1979: 6 publications 1980: 6 publications 1981: 8 publications 1982: 3 publications 1983: 4 publications 1984: 3 publications 1985: 3 publications 1986: 2 publications 1987: 4 publications 1988: 12 publications 1989: 5 publications 1990: 7 publications 1991: 6 publications 1992: 4 publications 1993: 5 publications 1994: 5 publications 1995: 7 publications 1996: 7 publications 1997: 8 publications 1998: 4 publications 1999: 1 publication 2000: 4 publications 2001: 7 publications 2002: 9 publications 2003: 8 publications 2004: 3 publications 2005: 10 publications 2006: 9 publications 2007: 10 publications 2008: 10 publications 2009: 9 publications 2010: 9 publications 2011: 7 publications 2012: 4 publications 2013: 2 publications 2014: 4 publications 2015: 4 publications 2016: 2 publications 2017: 2 publications 2018: 2 publications
1965 2018

269 publications in total across all disciplines

View publications per year as a table
Joseph P. Donnelly: publications per year, 1965 to 2018
Year Publications
1965 2
1966 4
1967 1
1968 2
1969 2
1970 2
1971 2
1972 2
1973 2
1974 2
1975 5
1976 9
1977 7
1978 2
1979 6
1980 6
1981 8
1982 3
1983 4
1984 3
1985 3
1986 2
1987 4
1988 12
1989 5
1990 7
1991 6
1992 4
1993 5
1994 5
1995 7
1996 7
1997 8
1998 4
1999 1
2000 4
2001 7
2002 9
2003 8
2004 3
2005 10
2006 9
2007 10
2008 10
2009 9
2010 9
2011 7
2012 4
2013 2
2014 4
2015 4
2016 2
2017 2
2018 2
Total 269
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Joseph P. Donnelly publications per year - data summary

  • Joseph P. Donnelly, a Engineering and Technology scholar from MIT, has 269 publications recorded across 54 years, from 1965 to 2018.
  • The oldest publication on record dates to 1965 and the most recent to 2018.
  • The most productive year is 1988, with 12 publications.
  • The least productive years with any output are 1967 and 1999, with 1 publication each.
  • The rate of publication averages 5.0 papers per year over the whole span, or 5.0 per year counting only the 54 years with at least one publication.
  • The last 5 years on the chart (2014-2018) hold 14 publications, 5% of the career total.
  • Split into equal eras - 1965-1982: 67 publications (3.7 per year); 1983-2000: 91 publications (5.1 per year); 2001-2018: 111 publications (6.2 per year).
  • Comparing the opening and closing eras, the overall trend of publication is rising.

Joseph P. Donnelly publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Joseph P. Donnelly sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: publications, 38–47 to 804+. Vertical axis: number of scientists, 0 to 457. Most scientists, 457, have 148–157 publications. The last bar groups every scientist with 804 publications or more. The highlighted bar, 248–257 publications, is where this scientist sits. 38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38–47 publications 804+

This scientist: 255 publications — 66th percentile

66% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

View publications distribution as a table
Number of Engineering and Technology scientists by publication count, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
Publications Scientists This scientist
38–47 20
48–57 35
58–67 96
68–77 135
78–87 190
88–97 259
98–107 283
108–117 369
118–127 341
128–137 386
138–147 372
148–157 457
158–167 415
168–177 407
178–187 421
188–197 378
198–207 403
208–217 317
218–227 346
228–237 321
238–247 260
248–257 280 255
258–267 240
268–277 214
278–287 242
288–297 203
298–307 166
308–317 154
318–327 175
328–337 159
338–347 99
348–357 131
358–367 106
368–377 118
378–387 97
388–397 108
398–407 82
408–417 71
418–427 64
428–437 55
438–447 54
448–457 60
458–467 47
468–477 40
478–487 30
488–497 29
498–507 38
508–517 40
518–527 32
528–537 23
538–547 28
548–557 23
558–567 19
568–577 16
578–587 17
588–597 18
598–607 22
608–617 15
618–627 9
628–637 11
638–647 21
648–657 12
658–667 9
668–677 11
678–687 9
688–697 6
698–707 14
708–717 7
718–727 8
728–737 10
738–747 9
748–757 5
758–767 5
768–777 11
778–787 7
788–797 2
798–803 4
804+ 100
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Joseph P. Donnelly publication distribution in Engineering and Technology in 2026 - data summary

  • The chart plots the publication count of all 9,796 Engineering and Technology scientists ranked by Research.com in 2026, grouped into 78 ranges running from 38–47 to 804+ publications.
  • Joseph P. Donnelly, a Engineering and Technology scholar from MIT, records 255 publications - the 66th percentile of the discipline.
  • 66% of ranked Engineering and Technology scientists score the same or lower than Joseph P. Donnelly, and about 34% score higher.
  • The median of the discipline falls in the 198–207 publications range, and Joseph P. Donnelly ranks above the median.
  • The most crowded range is 148–157 publications, holding 457 scientists (5% of the field).
  • 61% of the field sits in the lowest quarter of the value range (up to 228–237 publications), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 804 publications or more, 100 scientists in all (1% of the field).

Joseph P. Donnelly D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Joseph P. Donnelly sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: D-Index, 30 to 107+. Vertical axis: number of scientists, 0 to 426. Most scientists, 426, have 42 D-Index. The last bar groups every scientist with 107 D-Index or more. The highlighted bar, 42 D-Index, is where this scientist sits. 30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 42 D-Index — 35th percentile

35% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

View D-Index distribution as a table
Number of Engineering and Technology scientists by D-index, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
D-Index Scientists This scientist
30 59
31 114
32 129
33 189
34 200
35 262
36 311
37 312
38 350
39 385
40 348
41 362
42 426 42
43 380
44 310
45 341
46 301
47 306
48 271
49 246
50 210
51 253
52 213
53 221
54 195
55 186
56 170
57 167
58 166
59 144
60 152
61 141
62 138
63 131
64 118
65 114
66 119
67 95
68 87
69 77
70 89
71 69
72 54
73 46
74 55
75 54
76 49
77 53
78 46
79 28
80 39
81 36
82 24
83 26
84 36
85 18
86 25
87 19
88 26
89 27
90 23
91 15
92 12
93 9
94 15
95 10
96 13
97 13
98 9
99 7
100 7
101 8
102 7
103 7
104 9
105 6
106 9
107+ 99
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Joseph P. Donnelly D-index placement in Engineering and Technology in 2026 - data summary

  • The chart plots the discipline H-index (D-index) of all 9,796 Engineering and Technology scientists ranked by Research.com in 2026, grouped into 78 ranges running from 30 to 107+ D-Index.
  • Joseph P. Donnelly, a Engineering and Technology scholar from MIT, records 42 D-Index - the 35th percentile of the discipline.
  • 35% of ranked Engineering and Technology scientists score the same or lower than Joseph P. Donnelly, and about 65% score higher.
  • The median of the discipline falls in the 47 D-Index range, and Joseph P. Donnelly ranks below the median.
  • The most crowded range is 42 D-Index, holding 426 scientists (4% of the field).
  • 57% of the field sits in the lowest quarter of the value range (up to 49 D-Index), so the distribution is heavily right-skewed and high scores are rare.
  • The final bar has no upper bound: it groups every scientist with 107 D-Index or more, 99 scientists in all (1% of the field).

Overview

What is he best known for?

The fields of study he is best known for:

  • Optics
  • Laser
  • Semiconductor

Joseph P. Donnelly spends much of his time researching Optics, Optoelectronics, Gallium arsenide, Laser and Ion implantation. His Optics research is multidisciplinary, incorporating elements of Semiconductor and Electrical efficiency. As part of the same scientific family, Joseph P. Donnelly usually focuses on Optoelectronics, concentrating on Avalanche photodiode and intersecting with Photodiode, Photodetector and Geiger counter.

His Gallium arsenide research incorporates elements of Fiber and High power lasers. The study incorporates disciplines such as Diode, Hybrid array and Noise figure in addition to Laser. The concepts of his Ion implantation study are interwoven with issues in Annealing, Wafer, Electrical resistivity and conductivity and Silicon.

His most cited work include:

  • BIOMIMETIC GRADIENT HYDROGELS FOR TISSUE ENGINEERING (180 citations)
  • BIOMIMETIC GRADIENT HYDROGELS FOR TISSUE ENGINEERING (180 citations)
  • Planar optical waveguide, modulator, variable coupler and switch (133 citations)

What are the main themes of his work throughout his whole career to date?

His primary areas of study are Optoelectronics, Optics, Laser, Semiconductor laser theory and Gallium arsenide. Joseph P. Donnelly mostly deals with Diode in his studies of Optoelectronics. In his research, Ion implantation is intimately related to Semiconductor device, which falls under the overarching field of Diode.

He undertakes multidisciplinary investigations into Optics and Slab in his work. As a part of the same scientific study, Joseph P. Donnelly usually deals with the Laser, concentrating on Epitaxy and frequently concerns with Analytical chemistry. His Semiconductor laser theory research integrates issues from Optical fiber, Laser beam quality and Light-emitting diode.

He most often published in these fields:

  • Optoelectronics (76.08%)
  • Optics (64.59%)
  • Laser (40.67%)

What were the highlights of his more recent work (between 2008-2018)?

  • Optoelectronics (76.08%)
  • Optics (64.59%)
  • Laser (40.67%)

In recent papers he was focusing on the following fields of study:

Joseph P. Donnelly mainly focuses on Optoelectronics, Optics, Laser, Optical amplifier and Amplifier. His biological study spans a wide range of topics, including Avalanche photodiode and Quantum well. Joseph P. Donnelly connects Optics with Slab in his study.

His Laser research is multidisciplinary, relying on both Photonic integrated circuit, Epitaxy, Diode, Bar and Optical fiber. His research integrates issues of Stimulated emission, Active laser medium, Laser beams and Noise figure in his study of Optical amplifier. His work in Amplifier tackles topics such as Semiconductor which are related to areas like Fiber, Electronic engineering and Fiber amplifier.

Between 2008 and 2018, his most popular works were:

  • BIOMIMETIC GRADIENT HYDROGELS FOR TISSUE ENGINEERING (180 citations)
  • BIOMIMETIC GRADIENT HYDROGELS FOR TISSUE ENGINEERING (180 citations)
  • High-Power, Low-Noise 1.5-μm Slab-Coupled Optical Waveguide (SCOW) Emitters: Physics, Devices, and Applications (63 citations)

In his most recent research, the most cited papers focused on:

  • Optics
  • Laser
  • Semiconductor

Joseph P. Donnelly focuses on Optoelectronics, Optics, Laser, Epitaxy and Wavelength. Optoelectronics is closely attributed to Analytical chemistry in his study. His Optics study often links to related topics such as Noise figure.

His work carried out in the field of Laser brings together such families of science as Interference, Optical communication and Doping. His studies in Epitaxy integrate themes in fields like Quantum well, Quantum cascade laser and Diffraction. His Wavelength research includes elements of Photon counting and APDS.

Best Publications

  • BIOMIMETIC GRADIENT HYDROGELS FOR TISSUE ENGINEERING

    Shilpa Sant;Matthew J. Hancock;Matthew J. Hancock;Joseph P. Donnelly;Joseph P. Donnelly;Dharini Iyer;Dharini Iyer;Dharini Iyer

  • Planar optical waveguide, modulator, variable coupler and switch

    Frederick J. Leonberger;Joseph P. Donnelly

  • Design Considerations for 1.06- $mu$ m InGaAsP–InP Geiger-Mode Avalanche Photodiodes

    J.P. Donnelly;E.K. Duerr;K.A. McIntosh;E.A. Dauler

  • Near-diffraction-limited diode laser arrays by wavelength beam combining.

    B. Chann;R. K. Huang;L. J. Missaggia;C. T. Harris

  • High-Power, Low-Noise 1.5-μm Slab-Coupled Optical Waveguide (SCOW) Emitters: Physics, Devices, and Applications

    P. W. Juodawlkis;J. J. Plant;W. Loh;L. J. Missaggia

  • Afterpulsing in Geiger-mode avalanche photodiodes for 1.06μm wavelength

    K. E. Jensen;P. I. Hopman;E. K. Duerr;E. A. Dauler

  • Symmetric three-guide optical coupler with nonidentical center and outside guides

    J. Donnelly;H. Haus;N. Whitaker

  • Proton bombardment in InP

    J.P. Donnelly;C.E. Hurwitz

  • High-Brightness Wavelength Beam Combined Semiconductor Laser Diode Arrays

    R.K. Huang;B. Chann;L.J. Missaggia;J.P. Donnelly

  • AlGaAs-InGaAs slab-coupled optical waveguide lasers

    J.P. Donnelly;R.K. Huang;J.N. Walpole;L.J. Missaggia

  • Limitations on power-transfer efficiency in three-guide optical couplers

    J. Donnelly

  • 40-Gbit/s all-optical circulating shift register with an inverter

    K. L. Hall;J. P. Donnelly;S. H. Groves;C. I. Fennelly

  • High-power 1.5-/spl mu/m InGaAsP-InP slab-coupled optical waveguide amplifier

    P.W. Juodawlkis;J.J. Plant;R.K. Huang;L.J. Missaggia

  • Arrays of InP-based Avalanche Photodiodes for Photon Counting

    S. Verghese;J.P. Donnelly;E.K. Duerr;K.A. McIntosh

  • Slab-coupled 1.3-μm semiconductor laser with single-spatial large-diameter mode

    J.N. Walpole;J.P. Donnelly;P.J. Taylor;L.J. Missaggia

  • The effect of implant temperature on the electrical characteristics of ion implanted indium phosphide

    J.P. Donnelly;C.E. Hurwitz

  • 1.5-/spl mu/m InGaAsP-InP slab-coupled optical waveguide lasers

    J.J. Plant;P.W. Juodawlkis;R.K. Huang;J.P. Donnelly

  • Transient annealing of selenium‐implanted gallium arsenide using a graphite strip heater

    R. L. Chapman;John C. C. Fan;J. P. Donnelly;B‐Y. Tsaur

  • High-resistivity layers in n-InP produced by Fe ion implantation

    J.P. Donnelly;C.E. Hurwitz

  • 1.5-μm tapered-gain-region lasers with high-CW output powers

    J.P. Donnelly;J.N. Walpole;S.H. Groves;R.J. Bailey

  • Slab-coupled optical waveguide laser and amplifier

    James N. Walpole;Joseph P. Donnelly;Stephen R. Chinn

  • The electrical characteristics of InP implanted with the column IV elements

    J.P. Donnelly;G.A. Ferrante

Frequent Co-Authors

John C. C. Fan
John C. C. Fan Kopin Corporation (United States)
Katherine L. Hall
Katherine L. Hall Wellesley College
Federico Capasso
Federico Capasso Harvard University
Ali Khademhosseini
Ali Khademhosseini Terasaki Foundation
S. S. Meyer
S. S. Meyer University of Chicago
Krishna V. Shenoy
Krishna V. Shenoy Stanford University

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