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Michael W. Geis

Michael W. Geis

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 58 7803 7543 1934 1793 183 10071
Engineering and Technology 58 2540 2426 776 704 186 10827

Michael W. Geis publications per year

The chart shows the history of publications by Michael W. Geis between 1975 and 2024, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Michael W. Geis published across 50 years, from 1975 to 2024, averaging 4.1 papers a year. Output peaked at 16 publications in 1982. 2 of the 206 publications appeared in the last two years.

No. of publications
5 10 15
Bar chart. Horizontal axis: year, 1975 to 2024. Vertical axis: number of publications, 0 to 16. Peak 16 publications in 1982. 1975: 1 publication 1976: 2 publications 1977: 1 publication 1978: 0 publications 1979: 5 publications 1980: 4 publications 1981: 13 publications 1982: 16 publications 1983: 15 publications 1984: 7 publications 1985: 7 publications 1986: 9 publications 1987: 6 publications 1988: 3 publications 1989: 6 publications 1990: 3 publications 1991: 7 publications 1992: 5 publications 1993: 5 publications 1994: 3 publications 1995: 3 publications 1996: 3 publications 1997: 8 publications 1998: 3 publications 1999: 2 publications 2000: 2 publications 2001: 2 publications 2002: 2 publications 2003: 4 publications 2004: 4 publications 2005: 4 publications 2006: 5 publications 2007: 10 publications 2008: 8 publications 2009: 2 publications 2010: 3 publications 2011: 1 publication 2012: 2 publications 2013: 0 publications 2014: 0 publications 2015: 1 publication 2016: 3 publications 2017: 4 publications 2018: 6 publications 2019: 0 publications 2020: 2 publications 2021: 1 publication 2022: 1 publication 2023: 0 publications 2024: 2 publications
1975 2024

206 publications in total across all disciplines

View publications per year as a table
Michael W. Geis: publications per year, 1975 to 2024
Year Publications
1975 1
1976 2
1977 1
1978 0
1979 5
1980 4
1981 13
1982 16
1983 15
1984 7
1985 7
1986 9
1987 6
1988 3
1989 6
1990 3
1991 7
1992 5
1993 5
1994 3
1995 3
1996 3
1997 8
1998 3
1999 2
2000 2
2001 2
2002 2
2003 4
2004 4
2005 4
2006 5
2007 10
2008 8
2009 2
2010 3
2011 1
2012 2
2013 0
2014 0
2015 1
2016 3
2017 4
2018 6
2019 0
2020 2
2021 1
2022 1
2023 0
2024 2
Total 206
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Michael W. Geis publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Michael W. Geis sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: publications, 38–47 to 804+. Vertical axis: number of scientists, 0 to 457. Most scientists, 457, have 148–157 publications. The last bar groups every scientist with 804 publications or more. The highlighted bar, 178–187 publications, is where this scientist sits. 38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38–47 publications 804+

This scientist: 186 publications — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

View publications distribution as a table
Number of Engineering and Technology scientists by publication count, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
Publications Scientists This scientist
38–47 20
48–57 35
58–67 96
68–77 135
78–87 190
88–97 259
98–107 283
108–117 369
118–127 341
128–137 386
138–147 372
148–157 457
158–167 415
168–177 407
178–187 421 186
188–197 378
198–207 403
208–217 317
218–227 346
228–237 321
238–247 260
248–257 280
258–267 240
268–277 214
278–287 242
288–297 203
298–307 166
308–317 154
318–327 175
328–337 159
338–347 99
348–357 131
358–367 106
368–377 118
378–387 97
388–397 108
398–407 82
408–417 71
418–427 64
428–437 55
438–447 54
448–457 60
458–467 47
468–477 40
478–487 30
488–497 29
498–507 38
508–517 40
518–527 32
528–537 23
538–547 28
548–557 23
558–567 19
568–577 16
578–587 17
588–597 18
598–607 22
608–617 15
618–627 9
628–637 11
638–647 21
648–657 12
658–667 9
668–677 11
678–687 9
688–697 6
698–707 14
708–717 7
718–727 8
728–737 10
738–747 9
748–757 5
758–767 5
768–777 11
778–787 7
788–797 2
798–803 4
804+ 100
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Michael W. Geis D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Michael W. Geis sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 78 bars. Horizontal axis: D-Index, 30 to 107+. Vertical axis: number of scientists, 0 to 426. Most scientists, 426, have 42 D-Index. The last bar groups every scientist with 107 D-Index or more. The highlighted bar, 58 D-Index, is where this scientist sits. 30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 58 D-Index — 75th percentile

75% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

View D-Index distribution as a table
Number of Engineering and Technology scientists by D-index, Research.com 2026 ranking edition. Based on 9,796 ranked scientists.
D-Index Scientists This scientist
30 59
31 114
32 129
33 189
34 200
35 262
36 311
37 312
38 350
39 385
40 348
41 362
42 426
43 380
44 310
45 341
46 301
47 306
48 271
49 246
50 210
51 253
52 213
53 221
54 195
55 186
56 170
57 167
58 166 58
59 144
60 152
61 141
62 138
63 131
64 118
65 114
66 119
67 95
68 87
69 77
70 89
71 69
72 54
73 46
74 55
75 54
76 49
77 53
78 46
79 28
80 39
81 36
82 24
83 26
84 36
85 18
86 25
87 19
88 26
89 27
90 23
91 15
92 12
93 9
94 15
95 10
96 13
97 13
98 9
99 7
100 7
101 8
102 7
103 7
104 9
105 6
106 9
107+ 99
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Overview

Michael W. Geis is a researcher affiliated with MIT in the United States. Their work spans several interconnected fields including materials science, engineering, and mathematics, with a particular focus on materials chemistry and mathematical physics.

The research topics covered by Michael W. Geis include:

  • Diamond and Carbon-based Materials Research
  • Semiconductor materials and devices
  • Metal and Thin Film Mechanics
  • High-pressure geophysics and materials
  • Electronic and Structural Properties of Oxides
  • Advanced Mathematical Physics Problems
  • Spectral Theory in Mathematical Physics

Their publication record comprises papers in both applied sciences and theoretical studies. Key recent papers include:

  • Stable, low-resistance, 1.5 to 3.5 kΩ sq−1, diamond surface conduction with a mixed metal-oxide protective film (2020) in Diamond and Related Materials
  • Controlling the carrier density of surface conductive diamond (2021) in Diamond and Related Materials
  • Hydrogen and deuterium termination of diamond for low surface resistance and surface step control (2021) in Diamond and Related Materials
  • Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides (2020) in ACS Applied Materials & Interfaces
  • Concentration of quantum integrable eigenfunctions on a convex surface of revolution (2020) in arXiv (Cornell University)

Michael W. Geis frequently publishes in venues including:

  • Diamond and Related Materials
  • arXiv (Cornell University)
  • ACS Applied Materials & Interfaces
  • Applied Surface Science
  • physica status solidi (a)

The researcher collaborates regularly with several coauthors, most notably:

  • M.A. Hollis
  • G. W. Turner
  • Joseph O. Varghese
  • Jeffrey W. Daulton
  • C.H. Wuorio

Their scientific investigations focus on understanding and improving properties of diamond surface conduction, semiconductor functionality, and oxide interfaces through experimental and theoretical approaches. Their work incorporates advanced methods in materials chemistry and applied mathematics, reflecting a combination of engineering principles and mathematical physics.

Best Publications

  • Photonic ADC: overcoming the bottleneck of electronic jitter.

    Anatol Khilo;Steven J Spector;Matthew E Grein;Amir H Nejadmalayeri

  • Electron field emission from diamond and other carbon materials after H2, O2, and Cs treatment

    M. W. Geis;J. C. Twichell;J. Macaulay;K. Okano

  • Diamond cold cathode

    M.W. Geis;N.N. Efremow;J.D. Woodhouse;M.D. McAleese

  • Diamond emitters fabrication and theory

    M. W. Geis;J. C. Twichell;T. M. Lyszczarz

  • Crystallographic orientation of silicon on an amorphous substrate using an artificial surface‐relief grating and laser crystallization

    M. W. Geis;D. C. Flanders;Henry I. Smith

  • A new surface electron-emission mechanism in diamond cathodes

    M. W. Geis;N. N. Efremow;K. E. Krohn;J. C. Twichell

  • High-temperature point-contact transistors and Schottky diodes formed on synthetic boron-doped diamond

    M.W. Geis;D.D. Rathman;D.J. Ehrlich;R.A. Murphy

  • Zone‐Melting Recrystallization of Si Films with a Moveable‐Strip‐Heater Oven

    M. W. Geis;Henry I. Smith;B. ‐Y. Tsaur;John C. C. Fan

  • Exceptionally high voltage Schottky diamond diodes and low boron doping

    J E Butler;M W Geis;K E Krohn;J Lawless

  • Comparison of electric field emission from nitrogen‐doped, type Ib diamond, and boron‐doped diamond

    M. W. Geis;J. C. Twichell;N. N. Efremow;K. Krohn

  • Fundamental issues in heteroepitaxy—A Department of Energy, Council on Materials Science Panel Report

    Ernst G. Bauer;Brian W. Dodson;Daniel J. Ehrlich;Leonard C. Feldman

  • CMOS-Compatible All-Si High-Speed Waveguide Photodiodes With High Responsivity in Near-Infrared Communication Band

    M.W. Geis;S.J. Spector;M.E. Grein;R.T. Schulein

  • Capacitance-voltage measurements on metal-SiO/sub 2/-diamond structures fabricated with

    M.W. Geis;J.A. Gregory;B.B. Pate

  • Submicrosecond submilliwatt silicon-on-insulator thermooptic switch

    M.W. Geis;S.J. Spector;R.C. Williamson;T.M. Lyszczarz

  • Lateral epitaxy by seeded solidification for growth of single‐crystal Si films on insulators

    John C. C. Fan;M. W. Geis;Bor‐Yeu Tsaur

  • Silicon waveguide infrared photodiodes with >35 GHz bandwidth and phototransistors with 50 AW -1 response

    M. W. Geis;S. J. Spector;M. E. Grein;J. U. Yoon

  • Lateral epitaxial growth by seeded solidification.

    Bor-Yeu Tsaur;John C C Fan;Michael W Geis

  • Self‐developing UV photoresist using excimer laser exposure

    T. F. Deutsch;M. W. Geis

  • A novel anisotropic dry etching technique

    M. W. Geis;G. A. Lincoln;N. Efremow;W. J. Piacentini

  • Silicon graphoepitaxy using a strip-heater oven

    M. W. Geis;D. A. Antoniadis;D. J. Silversmith;R. W. Mountain

  • Silicon photonics for compact, energy-efficient interconnects [Invited]

    T. Barwicz;H. Byun;F. Gan;C. W. Holzwarth

Frequent Co-Authors

John C. C. Fan
John C. C. Fan Kopin Corporation (United States)
Franz X. Kärtner
Franz X. Kärtner Universität Hamburg
Miloš A. Popović
Miloš A. Popović Boston University
Harry A. Atwater
Harry A. Atwater California Institute of Technology
Jason S. Orcutt
Jason S. Orcutt IBM (United States)

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