The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Michael W. Geis sits on this spectrum.
This scientist: 186 publications — 42nd percentile
42% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Michael W. Geis sits on this spectrum.
This scientist: 58 D-Index — 75th percentile
75% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Michael W. Geis is a researcher affiliated with MIT in the United States. Their work spans several interconnected fields including materials science, engineering, and mathematics, with a particular focus on materials chemistry and mathematical physics.
The research topics covered by Michael W. Geis include:
Their publication record comprises papers in both applied sciences and theoretical studies. Key recent papers include:
Michael W. Geis frequently publishes in venues including:
The researcher collaborates regularly with several coauthors, most notably:
Their scientific investigations focus on understanding and improving properties of diamond surface conduction, semiconductor functionality, and oxide interfaces through experimental and theoretical approaches. Their work incorporates advanced methods in materials chemistry and applied mathematics, reflecting a combination of engineering principles and mathematical physics.
Anatol Khilo;Steven J Spector;Matthew E Grein;Amir H Nejadmalayeri
M. W. Geis;J. C. Twichell;J. Macaulay;K. Okano
M.W. Geis;N.N. Efremow;J.D. Woodhouse;M.D. McAleese
M. W. Geis;J. C. Twichell;T. M. Lyszczarz
M. W. Geis;D. C. Flanders;Henry I. Smith
M. W. Geis;N. N. Efremow;K. E. Krohn;J. C. Twichell
M.W. Geis;D.D. Rathman;D.J. Ehrlich;R.A. Murphy
M. W. Geis;Henry I. Smith;B. ‐Y. Tsaur;John C. C. Fan
J E Butler;M W Geis;K E Krohn;J Lawless
M. W. Geis;J. C. Twichell;N. N. Efremow;K. Krohn
Ernst G. Bauer;Brian W. Dodson;Daniel J. Ehrlich;Leonard C. Feldman
M.W. Geis;S.J. Spector;M.E. Grein;R.T. Schulein
M.W. Geis;J.A. Gregory;B.B. Pate
M.W. Geis;S.J. Spector;R.C. Williamson;T.M. Lyszczarz
John C. C. Fan;M. W. Geis;Bor‐Yeu Tsaur
M. W. Geis;S. J. Spector;M. E. Grein;J. U. Yoon
Bor-Yeu Tsaur;John C C Fan;Michael W Geis
T. F. Deutsch;M. W. Geis
M. W. Geis;G. A. Lincoln;N. Efremow;W. J. Piacentini
M. W. Geis;D. A. Antoniadis;D. J. Silversmith;R. W. Mountain
T. Barwicz;H. Byun;F. Gan;C. W. Holzwarth
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