World's Best Scientists 2026 revealed!
Takao Yonehara

Takao Yonehara

D-Index & Metrics

Engineering and Technology

D-Index
41
Citations
7855
World Ranking
6886
National Ranking
140

Takao Yonehara publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Takao Yonehara sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 158 publications — 30th percentile

30% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Takao Yonehara D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Takao Yonehara sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 41 D-Index — 31st percentile

31% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Takao Yonehara is a researcher affiliated with Canon in Japan, focusing on the engineering field with a specialization in electrical and electronic engineering. Their recent research contributions explore key aspects of semiconductor materials and devices, as well as advancements in semiconductor devices and circuit design.

Their work addresses topics including:

  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Ferroelectric and Negative Capacitance Devices

Takao Yonehara has contributed to the scientific community primarily through publications in applied physics and engineering journals. One of their recent papers includes:

  • Finite temperature effects on the structural stability of Si-doped HfO2 using first-principles calculations, 2023, Applied Physics Letters

They have collaborated frequently with co-authors such as:

  • Yosuke Harashima
  • Hiroaki Koga
  • Zeyuan Ni
  • Michio Katouda
  • Akira Notake

Their publications have appeared in venues including:

  • Applied Physics Letters

Takao Yonehara's work primarily resides within the subfields of electrical and electronic engineering, contributing to knowledge on semiconductor materials and device technologies. Their research encompasses both fundamental and practical aspects influencing the development of advanced semiconductor devices.

Best Publications

  • Process for producing semiconductor article

    Kiyofumi Sakaguchi;Takao Yonehara;Shoji Nishida;Kenji Yamagata

  • Method of producing semiconductor substrate

    Kiyofumi Sakaguchi;Takao Yonehara

  • Epitaxial layer transfer by bond and etch back of porous Si

    Takao Yonehara;Kiyofumi Sakaguchi;Nobuhiko Sato

  • Process for production of semiconductor substrate

    Kiyofumi Sakaguchi;Takao Yonehara

  • Semiconductor parts and their manufacturing method

    Yonehara Takao

  • Method of producing semiconductor member and method of producing solar cell

    Katsumi Nakagawa;Takao Yonehara;Shoji Nishida;Kiyofumi Sakaguchi

  • Process of making semiconductor-on-insulator substrate

    Takao Yonehara;Kenji Yamagata

  • Method for preparing semiconductor member

    Takeshi Ichikawa;Takao Yonehara;Kiyofumi Sakaguchi

  • Control of Grain Boundary Location By Selective Nucleation Over Amorphous Substrates

    T. Yonehara;Y. Nishigaki;H. Mizutani;S. Kondoh

  • Effects of hydrogen annealing on heteroepitaxial-Ge layers on Si: Surface roughness and electrical quality

    Ammar Nayfeh;Chi On Chui;Krishna C. Saraswat;Takao Yonehara

  • Method of manufacturing semiconductor article

    Kiyofumi Sakaguchi;Takao Yonehara

  • Manufacture of semiconductor substrate

    Kiyobumi Sakaguchi;Takao Yonehara;清文 坂口;隆夫 米原

  • Process for producing solar cell, process for producing thin-film semiconductor, process for separating thin-film semiconductor, and process for forming semiconductor

    Shoji Nishida;Takao Yonehara;Kiyofumi Sakaguchi;Masaaki Iwane

  • Thin-film semiconductor device and method of manufacturing the same

    Kiyofumi Sakaguchi;Takao Yonehara

  • Process for producing semiconductor substrate by heat treating

    Nobuhiko Sato;Takao Yonehara;Kiyofumi Sakaguchi

  • Method for forming semiconductor thin film

    Takao Yonehara;Yoshiyuki Osada

  • Epitaxial growth on porous Si for a new bond and etchback silicon-on-insulator

    Nobuhiko Sato;Kiyofumi Sakaguchi;Kenji Yamagata;Yasutomo Fujiyama

  • Hydrogen annealed silicon-on-insulator

    Nobuhiko Sato;Takao Yonehara

  • Semiconductor article and method of manufacturing the same

    Kiyofumi Sakaguchi;Takao Yonehara

  • Display device and process of producing the same

    Hiroshi Matsuda;Takao Yonehara;Etsuro Kishi;Tsutomu Ikeda

Frequent Co-Authors

Kiyofumi Sakaguchi
Kiyofumi Sakaguchi Canon (Japan)
Krishna C. Saraswat
Krishna C. Saraswat Stanford University
Chi On Chui
Chi On Chui University of California, Los Angeles
Hiroshi Kawarada
Hiroshi Kawarada Waseda University
Takashi Jimbo
Takashi Jimbo Nagoya Institute of Technology
Paul C. McIntyre
Paul C. McIntyre Stanford University
Tetsuo Soga
Tetsuo Soga Nagoya Institute of Technology
Ali Kemal Okyay
Ali Kemal Okyay Stanford University
Masayoshi Umeno
Masayoshi Umeno Chubu University
Akira Suzuki
Akira Suzuki Kobe University

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