World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
40
Citations
7229
World Ranking
4470
National Ranking
1588

Chi On Chui publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Chi On Chui sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 139 publications — 11th percentile

11% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Chi On Chui D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Chi On Chui sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 40 D-Index — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Chi On Chui is affiliated with the University of California, Los Angeles in the United States and conducts research primarily in the field of Engineering.

The scientist's work spans several subfields of study, including Electrical and Electronic Engineering, Biomedical Engineering, Computational Mechanics, Surfaces, Coatings and Films, and Atomic and Molecular Physics, and Optics.

The main research topics covered by Chi On Chui include:

  • Advancements in Semiconductor Devices and Circuit Design
  • Nanowire Synthesis and Applications
  • Low-power high-performance VLSI design
  • Radiation Effects in Electronics
  • Semiconductor materials and devices
  • Integrated Circuits and Semiconductor Failure Analysis
  • Fluid Dynamics and Thin Films

Chi On Chui has published several papers in diverse venues. Recent publications include:

  • "A 3nm CMOS FinFlex™ Platform Technology with Enhanced Power Efficiency and Performance for Mobile SoC and High Performance Computing Applications," 2022, 2022 International Electron Devices Meeting (IEDM)
  • "Critical Process Features Enabling Aggressive Contacted Gate Pitch Scaling for 3nm CMOS Technology and Beyond," 2022, 2022 International Electron Devices Meeting (IEDM)
  • "Nanoparticles suppress fluid instabilities in the thermal drawing of ultralong nanowires," 2020, Nature Communications
  • "On Noise Performance of Dual-Gated Silicon FET Biosensors With Schottky Contacts," 2021, IEEE Transactions on Electron Devices
  • "On nonlinearity in field-effect transistor-based binding assay response," 2022, Applied Physics Letters

Frequent coauthors of Chi On Chui include M.C. Chiang, J.J. Liaw, J.-Y. Yeh, H.F. Chen, and K.T. Lai. Each of these collaborators has coauthored multiple papers with the scientist.

Publication venues where Chi On Chui's work most often appears include:

  • 2022 International Electron Devices Meeting (IEDM)
  • Nature Communications
  • IEEE Transactions on Electron Devices
  • Applied Physics Letters

Best Publications

  • On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates

    K. Martens;Chi On Chui;G. Brammertz;B. De Jaeger

  • Germanium MOS capacitors incorporating ultrathin high-/spl kappa/ gate dielectric

    Chi On Chui;S. Ramanathan;B.B. Triplett;P.C. McIntyre

  • A sub-400/spl deg/C germanium MOSFET technology with high-/spl kappa/ dielectric and metal gate

    Chi On Chui;Hyoungsub Kim;D. Chi;B.B. Triplett

  • Activation and diffusion studies of ion-implanted p and n dopants in germanium

    Chi On Chui;Kailash Gopalakrishnan;Peter B. Griffin;James D. Plummer

  • Forming a type i heterostructure in a group iv semiconductor

    Chi On Chui;Prashant Majhi;Wilman Tsai;Jack T. Kavalieros

  • Engineering chemically abrupt high-k metal oxide∕silicon interfaces using an oxygen-gettering metal overlayer

    Hyoungsub Kim;Paul C. McIntyre;Chi On Chui;Krishna C. Saraswat

  • Effects of hydrogen annealing on heteroepitaxial-Ge layers on Si: Surface roughness and electrical quality

    Ammar Nayfeh;Chi On Chui;Krishna C. Saraswat;Takao Yonehara

  • A stacked memory device on logic 3D technology for ultra-high-density data storage

    Jiyoung Kim;Augustin J. Hong;Sung Min Kim;Kyeong Sik Shin

  • High performance germanium MOSFETs

    Krishna Saraswat;Chi On Chui;Tejas Krishnamohan;Donghyun Kim

  • Variability Impact of Random Dopant Fluctuation on Nanoscale Junctionless FinFETs

    G. Leung;Chi On Chui

  • Interfacial characteristics of HfO2 grown on nitrided Ge (100) substrates by atomic-layer deposition

    Hyoungsub Kim;Paul C. McIntyre;Chi On Chui;Krishna C. Saraswat

  • Nanoscale germanium MOS Dielectrics-part I: germanium oxynitrides

    Chi On Chui;F. Ito;K.C. Saraswat

  • Atomic layer deposition of high-/spl kappa/ dielectric for germanium MOS applications - substrate

    Chi On Chui;H. Kim;P.C. McIntyre;K.C. Saraswat

  • Effective dark current suppression with asymmetric MSM photodetectors in Group IV semiconductors

    Chi On Chui;A.K. Okyay;K.C. Saraswat

  • On the origin of enhanced sensitivity in nanoscale FET-based biosensors.

    Kaveh Shoorideh;Chi On Chui

  • Scalability and electrical properties of germanium oxynitride MOS dielectrics

    Chi On Chui;F. Ito;K.C. Saraswat

  • Ge based high performance nanoscale MOSFETs

    Krishna C. Saraswat;Chi On Chui;Tejas Krishnamohan;Ammar Nayfeh

  • 5nm CMOS Production Technology Platform featuring full-fledged EUV, and High Mobility Channel FinFETs with densest 0.021µm2 SRAM cells for Mobile SoC and High Performance Computing Applications

    Unknown

  • InGaAs metal-oxide-semiconductor capacitors with HfO2 gate dielectric grown by atomic-layer deposition

    N. Goel;P. Majhi;C. O. Chui;W. Tsai

  • Thermal analysis of heterogeneous 3D ICs with various integration scenarios

    Ting-Yen Chiang;S.J. Souri;Chi On Chui;K.C. Saraswat

  • Nanoscale germanium MOS Dielectrics-part II: high-/spl kappa/ gate dielectrics

    Chi On Chui;H. Kim;D. Chi;P.C. McIntyre

Frequent Co-Authors

Krishna C. Saraswat
Krishna C. Saraswat Stanford University
Paul C. McIntyre
Paul C. McIntyre Stanford University
Hyoungsub Kim
Hyoungsub Kim Sungkyunkwan University
Puneet Gupta
Puneet Gupta University of California, Los Angeles
Prashant Majhi
Prashant Majhi Intel (United States)
Bruce Dunn
Bruce Dunn University of California, Los Angeles
Robert W. Dutton
Robert W. Dutton Stanford University
Takao Yonehara
Takao Yonehara Canon (Japan)
Yahya Rahmat-Samii
Yahya Rahmat-Samii University of California, Los Angeles
Yoshio Nishi
Yoshio Nishi Stanford University

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