2023 - Research.com Electronics and Electrical Engineering in Japan Leader Award
Semiconductor, semiconductor device, and method for fabricating the same
Shunpei Yamazaki;Yasuhiko Takemura;Hongyong Zhang;Toru Takayama.
(1994)
Semiconductor device and method of manufacture thereof
Hongyong Zhang;Yasuhiko Takemura;Toshimitsu Konuma;Hideto Ohnuma.
(2009)
Process for fabricating thin film transistor
Hongyong Zang;Hideto Ohnuma;Yasuhiko Takemura.
(1994)
Insulated gate field effect semiconductor devices having a LDD region and an anodic oxide film of a gate electrode
Shunpei Yamazaki;Yasuhiko Takemura;Hongyong Zhang.
(1992)
Method for mfg. semiconductor device
Hongyong Zhang;Akira Koyama;Yasuhiko Takemura.
(2004)
Process for laser processing and apparatus for use in the same
Hongyong Zhang;Shunpei Yamazaki;Yasuhiko Takemura.
(2003)
Active Matry Display
Hisashi Ohtani;Akiharu Miyanaga;Takeshi Fukunaga;Hongyong Zhang.
(1997)
Method for manufacturing a semiconductor device using a catalyst
Hisashi Ohtani;Akiharu Miyanaga;Hongyong Zhang;Naoaki Yamaguchi.
(1995)
Method for annealing a semiconductor
Hongyong Zhang;Naoto Kusumoto.
(1993)
Semiconductor device having a thin film transistor
Hongyong Zhang;Naoto Kusumoto.
(2002)
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Semiconductor Energy Laboratory (Japan)
Semiconductor Energy Laboratory (Japan)
JSR (Japan)
Semiconductor Energy Laboratory (Japan)
Toshiba (Japan)
Queen Mary University of London
University of Göttingen
Tsinghua University
University of Arizona
Peking University
University of Sydney
University of Turin
Claude Bernard University Lyon 1
University of California, Irvine
King's College London
University College London
National Taiwan University
Salk Institute for Biological Studies
Uppsala University
University of California, San Diego
Ludwig-Maximilians-Universität München