World's Best Scientists 2026 revealed!
Yasuhiko Takemura

Yasuhiko Takemura

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
60
Citations
9794
World Ranking
1685
National Ranking
59

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Electrical engineering
  • Silicon

The scientist’s investigation covers issues in Thin-film transistor, Semiconductor, Optoelectronics, Amorphous silicon and Semiconductor device. Crystalline silicon and Porosity is closely connected to Electronic engineering in his research, which is encompassed under the umbrella topic of Thin-film transistor. His Semiconductor research is multidisciplinary, incorporating perspectives in Substrate and Silicon.

His Optoelectronics study incorporates themes from Layer, Active matrix, Electrical engineering and Gate oxide. As part of one scientific family, Yasuhiko Takemura deals mainly with the area of Amorphous silicon, narrowing it down to issues related to the Chemical engineering, and often Nanocrystalline silicon. His Semiconductor device research focuses on Thin film and how it connects with Hybrid silicon laser and Laser.

His most cited work include:

  • Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films (161 citations)
  • Electro-optical device and process for fabricating the same and method of driving the same (136 citations)
  • Semiconductor device employing crystallization catalyst (133 citations)

What are the main themes of his work throughout his whole career to date?

Yasuhiko Takemura mostly deals with Optoelectronics, Thin-film transistor, Semiconductor, Semiconductor device and Amorphous silicon. Yasuhiko Takemura has researched Optoelectronics in several fields, including Substrate, Electronic engineering, Electrical engineering and Thin film. As a part of the same scientific study, Yasuhiko Takemura usually deals with the Thin-film transistor, concentrating on Gate oxide and frequently concerns with Gate dielectric.

Yasuhiko Takemura works mostly in the field of Semiconductor, limiting it down to topics relating to Integrated circuit and, in certain cases, Electronic circuit, as a part of the same area of interest. His study looks at the relationship between Semiconductor device and fields such as Amorphous semiconductors, as well as how they intersect with chemical problems. In his work, Nickel is strongly intertwined with Crystallization, which is a subfield of Amorphous silicon.

He most often published in these fields:

  • Optoelectronics (68.05%)
  • Thin-film transistor (43.79%)
  • Semiconductor (40.24%)

What were the highlights of his more recent work (between 1999-2010)?

  • Optoelectronics (68.05%)
  • Thin-film transistor (43.79%)
  • Semiconductor device (31.95%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Thin-film transistor, Semiconductor device, Semiconductor and Amorphous silicon. His research in Optoelectronics intersects with topics in Transistor, Gate oxide, Electronic engineering and Active matrix. His Thin-film transistor research incorporates themes from Thin film, Substrate and Crystalline silicon.

His study explores the link between Semiconductor device and topics such as Laser that cross with problems in Manufacturing process and Robotic arm. His studies in Semiconductor integrate themes in fields like Crystallinity and Integrated circuit. His biological study spans a wide range of topics, including Doping, Silicon oxide, Oxide thin-film transistor, Metallurgy and Crystal.

Between 1999 and 2010, his most popular works were:

  • Active matrix display device including a transistor (71 citations)
  • Semiconductor device structure (28 citations)
  • MIS semiconductor device having an LDD structure and a manufacturing method therefor (23 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Silicon

Yasuhiko Takemura mainly focuses on Optoelectronics, Thin-film transistor, Semiconductor device, Gate oxide and Silicon. His Optoelectronics research incorporates elements of Transistor and Electronic engineering. His Transistor study integrates concerns from other disciplines, such as Active matrix and Display device.

His work deals with themes such as Substrate, Amorphous silicon and Crystalline silicon, which intersect with Thin-film transistor. Gate oxide is a subfield of Electrical engineering that Yasuhiko Takemura investigates. His Silicon research integrates issues from Coating and Semiconductor.

Best Publications

  • Semiconductor, semiconductor device, and method for fabricating the same

    Shunpei Yamazaki;Yasuhiko Takemura;Hongyong Zhang;Toru Takayama

  • Active matrix display device

    Shunpei Yamazaki;Jun Koyama;Yasuhiko Takemura

  • Semiconductor device/circuit having at least partially crystallized semiconductor layer

    Toru Takayama;Yasuhiko Takemura

  • Method of manufacturing a display device having a driver circuit attached to a display substrate

    Shunpei Yamazaki;Yasuhiko Takemura;Setsuo Nakajima;Yasuyuki Arai

  • Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films

    Hiroki Adachi;Akira Takenouchi;Takeshi Fukada;Hiroshi Uehara

  • Transistor and semiconductor circuit

    Hongyong Zhang;Uochi Hideki;Toru;Takayama

  • Display device and method of fabricating the same

    Shunpei Yamazaki;Yasuhiko Takemura;Setsuo Nakajima;Yasuyuki Arai

  • Transistor and process for fabricating the same

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura

  • Semiconductor device including a plurality of thin film transistors at least some of which have a crystalline silicon film crystal-grown substantially in parallel to the surface of a substrate for the transistor

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Electro-optical device and process for fabricating the same and method of driving the same

    Shunpei Yamazaki;Yasuhiko Takemura

  • Production method for a thin film semiconductor device with an alignment marker made out of the same layer as the active region

    Naoto Kusumoto;Yasuhiko Takemura;Hisashi Ohtani

  • Semiconductor device and process for fabricating the same

    Yasuhiko Takemura;Hiroki Adachi

  • Thin film transistor and semiconductor device including a laser crystallized semiconductor

    Shunpei Yamazaki;Hongyong Zhang;Naoto Kusumoto;Yasuhiko Takemura

  • Method for forming a field-effect transistor including anodic oxidation of the gate

    Shunpei Yamazaki;Akira Mase;Masaaki Hiroki;Yasuhiko Takemura

  • Semiconductor device and manufacture method

    Hongyong Zhang;Hidetaka Uochi;Kokuchi;Tatsu Kokuchi

  • Active matrix display and electrooptical device

    Hongyong Zhang

  • Active matrix display device including a transistor

    Shunpei Yamazaki;Akira Mase;Masaaki Hiroki;Yasuhiko Takemura

  • Process for fabricating semiconductor and process for fabricating semiconductor device

    Toru Takayama;Hongyong Zhang;Shunpei Yamazaki;Yasuhiko Takemura

  • Method of preparing a semiconductor having a controlled crystal orientation

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Semiconductor device and method for fabricating the same

    Zhang Hongyong;Ohnuma Hideto;Yamaguchi Naoaki;Takemura Yasuhiko

Frequent Co-Authors

Shunpei Yamazaki
Shunpei Yamazaki Semiconductor Energy Laboratory (Japan)
Hongyong Zhang
Hongyong Zhang Tokyo Institute of Technology

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