World's Best Scientists 2026 revealed!
Yasuhiko Takemura

Yasuhiko Takemura

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 60 1685 1614 59 55 221 9794

Yasuhiko Takemura publications per year

The chart shows the history of publications by Yasuhiko Takemura between 1988 and 2016, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Yasuhiko Takemura published across 29 years, from 1988 to 2016, averaging 8.2 papers a year. Output peaked at 45 publications in 1994. 2 of the 239 publications appeared in the last two years.

No. of publications
10 20 30 40
Bar chart. Horizontal axis: year, 1988 to 2016. Vertical axis: number of publications, 0 to 45. Peak 45 publications in 1994. 1988: 4 publications 1989: 2 publications 1990: 3 publications 1991: 10 publications 1992: 16 publications 1993: 15 publications 1994: 45 publications 1995: 16 publications 1996: 18 publications 1997: 19 publications 1998: 3 publications 1999: 13 publications 2000: 17 publications 2001: 14 publications 2002: 8 publications 2003: 7 publications 2004: 10 publications 2005: 2 publications 2006: 4 publications 2007: 0 publications 2008: 2 publications 2009: 2 publications 2010: 1 publication 2011: 3 publications 2012: 2 publications 2013: 0 publications 2014: 1 publication 2015: 1 publication 2016: 1 publication
1988 2016

239 publications in total across all disciplines

View publications per year as a table
Yasuhiko Takemura: publications per year, 1988 to 2016
Year Publications
1988 4
1989 2
1990 3
1991 10
1992 16
1993 15
1994 45
1995 16
1996 18
1997 19
1998 3
1999 13
2000 17
2001 14
2002 8
2003 7
2004 10
2005 2
2006 4
2007 0
2008 2
2009 2
2010 1
2011 3
2012 2
2013 0
2014 1
2015 1
2016 1
Total 239
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Yasuhiko Takemura publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Yasuhiko Takemura sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 214–233 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 221 publications — 36th percentile

36% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431 221
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Yasuhiko Takemura D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Yasuhiko Takemura sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 60 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 60 D-Index — 77th percentile

77% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103 60
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Electrical engineering
  • Silicon

The scientist’s investigation covers issues in Thin-film transistor, Semiconductor, Optoelectronics, Amorphous silicon and Semiconductor device. Crystalline silicon and Porosity is closely connected to Electronic engineering in his research, which is encompassed under the umbrella topic of Thin-film transistor. His Semiconductor research is multidisciplinary, incorporating perspectives in Substrate and Silicon.

His Optoelectronics study incorporates themes from Layer, Active matrix, Electrical engineering and Gate oxide. As part of one scientific family, Yasuhiko Takemura deals mainly with the area of Amorphous silicon, narrowing it down to issues related to the Chemical engineering, and often Nanocrystalline silicon. His Semiconductor device research focuses on Thin film and how it connects with Hybrid silicon laser and Laser.

His most cited work include:

  • Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films (161 citations)
  • Electro-optical device and process for fabricating the same and method of driving the same (136 citations)
  • Semiconductor device employing crystallization catalyst (133 citations)

What are the main themes of his work throughout his whole career to date?

Yasuhiko Takemura mostly deals with Optoelectronics, Thin-film transistor, Semiconductor, Semiconductor device and Amorphous silicon. Yasuhiko Takemura has researched Optoelectronics in several fields, including Substrate, Electronic engineering, Electrical engineering and Thin film. As a part of the same scientific study, Yasuhiko Takemura usually deals with the Thin-film transistor, concentrating on Gate oxide and frequently concerns with Gate dielectric.

Yasuhiko Takemura works mostly in the field of Semiconductor, limiting it down to topics relating to Integrated circuit and, in certain cases, Electronic circuit, as a part of the same area of interest. His study looks at the relationship between Semiconductor device and fields such as Amorphous semiconductors, as well as how they intersect with chemical problems. In his work, Nickel is strongly intertwined with Crystallization, which is a subfield of Amorphous silicon.

He most often published in these fields:

  • Optoelectronics (68.05%)
  • Thin-film transistor (43.79%)
  • Semiconductor (40.24%)

What were the highlights of his more recent work (between 1999-2010)?

  • Optoelectronics (68.05%)
  • Thin-film transistor (43.79%)
  • Semiconductor device (31.95%)

In recent papers he was focusing on the following fields of study:

His primary areas of study are Optoelectronics, Thin-film transistor, Semiconductor device, Semiconductor and Amorphous silicon. His research in Optoelectronics intersects with topics in Transistor, Gate oxide, Electronic engineering and Active matrix. His Thin-film transistor research incorporates themes from Thin film, Substrate and Crystalline silicon.

His study explores the link between Semiconductor device and topics such as Laser that cross with problems in Manufacturing process and Robotic arm. His studies in Semiconductor integrate themes in fields like Crystallinity and Integrated circuit. His biological study spans a wide range of topics, including Doping, Silicon oxide, Oxide thin-film transistor, Metallurgy and Crystal.

Between 1999 and 2010, his most popular works were:

  • Active matrix display device including a transistor (71 citations)
  • Semiconductor device structure (28 citations)
  • MIS semiconductor device having an LDD structure and a manufacturing method therefor (23 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Silicon

Yasuhiko Takemura mainly focuses on Optoelectronics, Thin-film transistor, Semiconductor device, Gate oxide and Silicon. His Optoelectronics research incorporates elements of Transistor and Electronic engineering. His Transistor study integrates concerns from other disciplines, such as Active matrix and Display device.

His work deals with themes such as Substrate, Amorphous silicon and Crystalline silicon, which intersect with Thin-film transistor. Gate oxide is a subfield of Electrical engineering that Yasuhiko Takemura investigates. His Silicon research integrates issues from Coating and Semiconductor.

Best Publications

  • Semiconductor, semiconductor device, and method for fabricating the same

    Shunpei Yamazaki;Yasuhiko Takemura;Hongyong Zhang;Toru Takayama

  • Active matrix display device

    Shunpei Yamazaki;Jun Koyama;Yasuhiko Takemura

  • Semiconductor device/circuit having at least partially crystallized semiconductor layer

    Toru Takayama;Yasuhiko Takemura

  • Method of manufacturing a display device having a driver circuit attached to a display substrate

    Shunpei Yamazaki;Yasuhiko Takemura;Setsuo Nakajima;Yasuyuki Arai

  • Method of manufacturing a thin film transistor in which the gate insulator comprises two oxide films

    Hiroki Adachi;Akira Takenouchi;Takeshi Fukada;Hiroshi Uehara

  • Transistor and semiconductor circuit

    Hongyong Zhang;Uochi Hideki;Toru;Takayama

  • Display device and method of fabricating the same

    Shunpei Yamazaki;Yasuhiko Takemura;Setsuo Nakajima;Yasuyuki Arai

  • Transistor and process for fabricating the same

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura

  • Semiconductor device including a plurality of thin film transistors at least some of which have a crystalline silicon film crystal-grown substantially in parallel to the surface of a substrate for the transistor

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Electro-optical device and process for fabricating the same and method of driving the same

    Shunpei Yamazaki;Yasuhiko Takemura

  • Production method for a thin film semiconductor device with an alignment marker made out of the same layer as the active region

    Naoto Kusumoto;Yasuhiko Takemura;Hisashi Ohtani

  • Semiconductor device and process for fabricating the same

    Yasuhiko Takemura;Hiroki Adachi

  • Thin film transistor and semiconductor device including a laser crystallized semiconductor

    Shunpei Yamazaki;Hongyong Zhang;Naoto Kusumoto;Yasuhiko Takemura

  • Method for forming a field-effect transistor including anodic oxidation of the gate

    Shunpei Yamazaki;Akira Mase;Masaaki Hiroki;Yasuhiko Takemura

  • Semiconductor device and manufacture method

    Hongyong Zhang;Hidetaka Uochi;Kokuchi;Tatsu Kokuchi

  • Active matrix display and electrooptical device

    Hongyong Zhang

  • Active matrix display device including a transistor

    Shunpei Yamazaki;Akira Mase;Masaaki Hiroki;Yasuhiko Takemura

  • Process for fabricating semiconductor and process for fabricating semiconductor device

    Toru Takayama;Hongyong Zhang;Shunpei Yamazaki;Yasuhiko Takemura

  • Method of preparing a semiconductor having a controlled crystal orientation

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Semiconductor device and method for fabricating the same

    Zhang Hongyong;Ohnuma Hideto;Yamaguchi Naoaki;Takemura Yasuhiko

Frequent Co-Authors

Shunpei Yamazaki
Shunpei Yamazaki Semiconductor Energy Laboratory (Japan)
Hongyong Zhang
Hongyong Zhang Tokyo Institute of Technology
Hisashi Ohtani
Hisashi Ohtani Semiconductor Energy Laboratory (Japan)

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