World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
32
Citations
5549
World Ranking
9521
National Ranking
216

Overview

What is he best known for?

The fields of study he is best known for:

  • Semiconductor
  • Silicon
  • Electrical engineering

Hisashi Ohtani mostly deals with Semiconductor device, Amorphous silicon, Optoelectronics, Crystallization and Semiconductor. His research integrates issues of Crystal and Hybrid silicon laser in his study of Semiconductor device. In his research on the topic of Crystal, Thin film is strongly related with Single crystal.

His work in Amorphous silicon addresses issues such as Silicon, which are connected to fields such as Thin-film transistor. His work carried out in the field of Optoelectronics brings together such families of science as Threshold voltage and Electrical engineering. His Crystal growth research focuses on subjects like Crystallinity, which are linked to Electronic engineering.

His most cited work include:

  • Semiconductor device and manufacturing method therefor (324 citations)
  • Semiconductor device having an SOI structure and manufacturing method therefor (240 citations)
  • Semiconductor thin film and semiconductor device (229 citations)

What are the main themes of his work throughout his whole career to date?

His main research concerns Optoelectronics, Semiconductor device, Semiconductor, Thin-film transistor and Amorphous silicon. His biological study spans a wide range of topics, including Layer, Thin film, Electronic engineering and Electrical engineering. The Semiconductor device study combines topics in areas such as Active layer, Substrate, Crystal and Laser.

Hisashi Ohtani has researched Semiconductor in several fields, including Crystallinity and Single crystal. His Thin-film transistor study combines topics from a wide range of disciplines, such as Quartz substrate, Annealing, Doping and Amorphous semiconductors. His research in Amorphous silicon intersects with topics in Crystallization and Crystalline silicon.

He most often published in these fields:

  • Optoelectronics (62.99%)
  • Semiconductor device (49.61%)
  • Semiconductor (37.01%)

What were the highlights of his more recent work (between 2004-2012)?

  • Optoelectronics (62.99%)
  • Semiconductor device (49.61%)
  • Thin film (24.41%)

In recent papers he was focusing on the following fields of study:

Hisashi Ohtani spends much of his time researching Optoelectronics, Semiconductor device, Thin film, Electrical engineering and Active matrix. His Optoelectronics research is mostly focused on the topic Semiconductor. Hisashi Ohtani combines subjects such as Solid-state laser, Vertical-cavity surface-emitting laser, Selective laser sintering and Nanocrystalline silicon with his study of Semiconductor device.

The study incorporates disciplines such as Crystallization, Crystalline silicon and Dielectric in addition to Thin film. His work in Electrical engineering covers topics such as Thin-film transistor which are related to areas like Signal, Waveform, Line and Display device. His Electronic engineering research is multidisciplinary, incorporating elements of Crystal structure and Silicon.

Between 2004 and 2012, his most popular works were:

  • Semiconductor device and manufacturing method therefor (324 citations)
  • Process for fabricating semiconductor device (107 citations)
  • Semiconductor fabricating apparatus (27 citations)

In his most recent research, the most cited papers focused on:

  • Semiconductor
  • Electrical engineering
  • Silicon

Optoelectronics, Semiconductor device, Electronic engineering, Impurity and Semiconductor are his primary areas of study. His Optoelectronics study integrates concerns from other disciplines, such as Crystallization and Laser. His studies deal with areas such as Amorphous silicon, Nanocrystalline silicon, Monocrystalline silicon, Heat treating and Hybrid silicon laser as well as Semiconductor device.

His studies in Electronic engineering integrate themes in fields like Buried oxide, Oxide, Single crystal and Active layer. His Impurity study spans across into fields like Depletion region and Thin film. Hisashi Ohtani has included themes like Beam, Oscillation, Distributed feedback laser, Laser crystallization and Substrate in his Semiconductor study.

Best Publications

  • Semiconductor device and manufacturing method therefor

    Shunpei Yamazaki;Hisashi Ohtani;Toshiji Hamatani

  • Semiconductor thin film and semiconductor device

    Shunpei Yamazaki;Hisashi Ohtani;Toru Mitsuki;Akiharu Miyanaga

  • Electro-optical device and semiconductor circuit

    Hisashi Ohtani;Jun Koyama;Shunpei Yamazaki

  • Active Matry Display

    Hisashi Ohtani;Akiharu Miyanaga;Takeshi Fukunaga;Hongyong Zhang

  • Method for manufacturing a semiconductor device using a catalyst

    Hisashi Ohtani;Akiharu Miyanaga;Hongyong Zhang;Naoaki Yamaguchi

  • Production method for a thin film semiconductor device with an alignment marker made out of the same layer as the active region

    Naoto Kusumoto;Yasuhiko Takemura;Hisashi Ohtani

  • Active matrix display apparatus and fabricating method thereof

    Akiharu Miyanaga;Hisashi Ohtani;Yasuhiko Takemura

  • Method for manufacturing a thin film transistor using catalyst elements to promote crystallization

    Hisashi Ohtani;Hiroki Adachi;Akiharu Miyanaga;Toru Takayama

  • Process for fabricating semiconductor device

    Hisashi Ohtani;Takeshi Fukunaga;Akiharu Miyanaga

  • Method of preparing a semiconductor having a controlled crystal orientation

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Thin film transistor having grain boundaries with segregated oxygen and halogen elements

    Shunpei Yamazaki;Satoshi Teramoto;Jun Koyama;Yasushi Ogata

  • Semiconductor device having doped polycrystalline layer

    Akiharu Miyanaga;Hisashi Ohtani;Satoshi Teramoto

  • CMOS semiconductor device and apparatus using the same

    Yamazaki Shunpei;Ohtani Hisashi;Fukunaga Takeshi

  • Method of crystallizing a silicon film

    Hisashi Ohtani;Yasuhiko Takemura;Akiharu Miyanaga;Shunpei Yamazaki

  • Semiconductor device structure

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Semiconductor device and method for its preparation

    Hongyong Zhang;Toru Takayama;Yasuhiko Takemura;Akiharu Miyanaga

  • Active matrix type display device and method of manufacturing the same

    Hisashi Ohtani;Yasushi Ogata

  • Semiconductor active matrix circuit

    Jun Koyama;Yasuhiko Takemura;Masahiko Hayakawa;Shunpei Yamazaki

  • Active matrix display device having wiring layers which are connected over multiple contact parts

    Jun Koyama;Hisashi Ohtani;Yasushi Ogata;Shunpei Yamazaki

  • Laser processing method

    Satoshi Teramoto;Hisashi Ohtani;Akiharu Miyanaga;Toshiji Hamatani

Frequent Co-Authors

Shunpei Yamazaki
Shunpei Yamazaki Semiconductor Energy Laboratory (Japan)
Jun Koyama
Jun Koyama Semiconductor Energy Laboratory (Japan)
Hongyong Zhang
Hongyong Zhang Tokyo Institute of Technology

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