World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
31
Citations
5167
World Ranking
6491
National Ranking
2128

Diane C. Boyd publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Diane C. Boyd sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 53 publications — 1st percentile

1% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Diane C. Boyd D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Diane C. Boyd sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 31 D-Index — 6th percentile

6% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Best Publications

  • Extension and source/drain design for high-performance FinFET devices

    J. Kedzierski;Meikei Ieong;E. Nowak;T.S. Kanarsky

  • Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs

    K. Rim;J. Chu;H. Chen;K.A. Jenkins

  • High performance CMOS fabricated on hybrid substrate with different crystal orientations

    M. Yang;M. Ieong;L. Shi;K. Chan

  • High-performance symmetric-gate and CMOS-compatible V/sub t/ asymmetric-gate FinFET devices

    J. Kedzierski;D.M. Fried;E.J. Nowak;T. Kanarsky

  • Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation

    J. Kedzierski;E. Nowak;T. Kanarsky;Y. Zhang

  • Fabrication and mobility characteristics of ultra-thin strained Si directly on insulator (SSDOI) MOSFETs

    K. Rim;K. Chan;L. Shi;D. Boyd

  • Electrical integrity of state-of-the-art 0.13 /spl mu/m SOI CMOS devices and circuits transferred for three-dimensional (3D) integrated circuit (IC) fabrication

    K.W. Guarini;A.W. Topol;M. Ieong;R. Yu

  • Method for forming mosfet device

    Diane Catherine Boyd;Hussein Ibrahim Hanafi;Meikei Ieong;Wesley Charles Natzle

  • Hybrid planar and FinFET CMOS devices

    Bruce B. Doris;Diane C. Boyd;Meikei Ieong;Thomas S. Kanarsky

  • Method for manufacturing ultra thin body field effect transistor (fet) and ultra-thin body fet device (ultra-thin body super-steep retrograde well (ssrw) fet device) manufactured by the same

    C Boyd Daine;Judson R Holt;Meikei Leong;Renee T Mo

  • Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO 2 gate dielectrics

    Min Yang;E.P. Gusev;Meikei Ieong;O. Gluschenkov

  • Fully-depleted SOI MOSFETs with low source and drain resistance and minimal overlap capacitance using a recessed channel damascene gate process

    Hussein I. Hanafi;Diane C. Boyd;Kevin K. Chan;Wesley Natzle

  • High performance CMOS device structure with mid-gap metal gate

    Anda C. Mocuta;Meikei Ieong;Ricky S. Amos;Diane C. Boyd

  • Strained Si CMOS (SS CMOS) technology: Opportunities and challenges

    K. Rim;R. Anderson;D. Boyd;F. Cardone

  • Two gates are better than one [double-gate MOSFET process]

    P.M. Solomon;K.W. Guarini;Y. Zhang;K. Chan

  • High-performance high-κ/metal gates for 45nm CMOS and beyond with gate-first processing

    M. Chudzik;B. Doris;R. Mo;J. Sleight

  • Stressed semiconductor device structures having granular semiconductor material

    Bruce B. Doris;Michael P. Belyansky;Diane C. Boyd;Dureseti Chidambarrao

  • Threshold voltage control in NiSi-gated MOSFETs through silicidation induced impurity segregation (SIIS)

    J. Kedzierski;D. Boyd;P. Ronsheim;S. Zafar

  • Triple-self-aligned, planar double-gate MOSFETs: devices and circuits

    K.W. Guarini;P.M. Solomon;Y. Zhang;K.K. Chan

  • RESIST IMAGE REVERSAL PROCESS AND INTEGRATED CIRCUIT CHIP THEREOF

    Void Dian C;Furukawa Tosiharu;Homes Steven J;Ma William H

Frequent Co-Authors

Meikei Ieong
Meikei Ieong Simbury Limited
Bruce B. Doris
Bruce B. Doris IBM (United States)
John A. Ott
John A. Ott IBM (United States)
Min Yang
Min Yang Sterne, Kessler, Goldstein & Fox
Patricia M. Mooney
Patricia M. Mooney Simon Fraser University
Oleg Gluschenkov
Oleg Gluschenkov IBM (United States)
Kevin K. Chan
Kevin K. Chan IBM (United States)
Kathryn W. Guarini
Kathryn W. Guarini IBM (United States)
Wilfried Haensch
Wilfried Haensch Argonne National Laboratory
Huilong Zhu
Huilong Zhu Chinese Academy of Sciences

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Related Online Degrees & Career Pathways

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Competency matters in engineering education, and selecting from the best competency-based colleges ensures that students focus on mastering essential skills rather than time-based class schedules. These programs often align better with the practical demands of the engineering profession.

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