World's Best Scientists 2026 revealed!
Yosi Shacham-Diamand

Yosi Shacham-Diamand

D-Index & Metrics

Materials Science

D-Index
47
Citations
9452
World Ranking
11056
National Ranking
52

Engineering and Technology

D-Index
44
Citations
8777
World Ranking
5750
National Ranking
38

Yosi Shacham-Diamand publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Yosi Shacham-Diamand sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 318 publications — 79th percentile

79% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Yosi Shacham-Diamand D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Yosi Shacham-Diamand sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 44 D-Index — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Overview

Yosi Shacham-Diamand is affiliated with Tel Aviv University in Israel and has an extensive body of research primarily in the fields of Engineering and Materials Science. Their work spans multiple subfields including Biomedical Engineering, Electrical and Electronic Engineering, Plant Science, Materials Chemistry, and Molecular Biology.

Their research topics cover a range of specialized areas such as Smart Agriculture and AI, Electrochemical Analysis and Applications, Supramolecular Self-Assembly in Materials, Microfluidic and Bio-sensing Technologies, Electrochemical Sensors and Biosensors, Advanced Chemical Sensor Technologies, and Analytical Chemistry and Sensors.

Frequent publication venues for their research include ECS Meeting Abstracts, Microelectronic Engineering, Sensors, Advanced Healthcare Materials, and Biosensors and Bioelectronics.

Their recent papers demonstrate a focus on sensor technologies, materials chemistry, and sustainable agriculture approaches. Notable recent publications are:

  • "Smart Farming Revolution: Portable and Real-Time Soil Nitrogen and Phosphorus Monitoring for Sustainable Agriculture" (2023) published in Sensors
  • "Phase Transition and Crystallization Kinetics of a Supramolecular System in a Microfluidic Platform" (2020) published in Chemistry of Materials
  • "Conductive Peptide-Based MXene Hydrogel as a Piezoresistive Sensor" (2024) published in Advanced Healthcare Materials
  • "Electrical Impedance Spectroscopy of plant cells in aqueous biological buffer solutions and their modelling using a unified electrical equivalent circuit over a wide frequency range: 4Hz to 20 GHz" (2020) published in Biosensors and Bioelectronics
  • "Gold, Silver, and Electrum Electroless Plating on Additively Manufactured Laser Powder-Bed Fusion AlSi10Mg Parts: A Review" (2021) published in Coatings

Yosi Shacham-Diamand frequently collaborates with several coauthors, including:

  • Aakash Jog
  • Dana Cohen-Gerassi
  • Kian Kadan-Jamal
  • Adi Avni
  • Tali Dotan

Best Publications

  • Engineered hybrid cardiac patches with multifunctional electronics for online monitoring and regulation of tissue function

    Ron Feiner;Leeya Engel;Sharon Fleischer;Maayan Malki

  • Electroless deposition of metal films with spray processor

    Valery Dubin;Vinh Nguyen;Yosi Shacham-Diamand

  • Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration

    Valery M. Dubin;Yosi Shacham‐Diamand;Bin Zhao;P. K. Vasudev

  • Electroless copper deposition for ULSI

    Yosi Shacham-Diamand;Valery Dubin;Matthew Angyal

  • Copper transport in thermal SiO2

    Y. Shacham‐Diamand;A. Dedhia;D. Hoffstetter;W. G. Oldham

  • Electroless deposition equipment or apparatus and method of performing electroless deposition

    Yosi Shacham-Diamand;Valery M. Dubin;Chiu H. Ting;Bin Zhao

  • Characterization of channel hot electron injection by the subthreshold slope of NROM/sup TM/ device

    E. Lusky;Y. Shacham-Diamand;I. Bloom;B. Eitan

  • A random access photodiode array for intelligent image capture

    O. Yadid-Pecht;R. Ginosar;Y. Shacham-Diamand

  • High aspect ratio quarter-micron electroless copper integrated technology

    Y. Shacham-Diamand;S.Y. Lopatin

  • 30years of electroless plating for semiconductor and polymer micro-systems

    Y. Shacham-Diamand;T. Osaka;Y. Okinaka;A. Sugiyama

  • Copper electroless deposition technology for ultra-large-scale-integration (ULSI) metallization

    Yosi Shacham-Diamand;Valery M. Dubin

  • Integrated electroless metallization for ULSI

    Yosi Shacham-Diamand;Sergey Lopatin

  • Characterization of electroless deposited Co(W,P) thin films for encapsulation of copper metallization

    A. Kohn;M. Eizenberg;Y. Shacham-Diamand;Y. Sverdlov

  • Electrons retention model for localized charge in oxide-nitride-oxide (ONO) dielectric

    E. Lusky;Y. Shacham-Diamand;I. Bloom;B. Eitan

  • Copper deposition and thermal stability issues in copper-based metallization for ULSI technology

    Jian Li;Y. Shacham-Diamand;J.W. Mayer

  • Electrochemically deposited thin film alloys for ULSI and MEMS applications

    Y. Shacham-Diamand;Y. Sverdlov

  • Thin electroless barrier for copper films

    Sergey D. Lopatin;Yosi Y. Shacham-Diamand;Valery M. Dubin;Yoon So Kim

  • STM/AFM studies of the evolution of morphology of electroplated Ni/W alloys

    L Zhu;O Younes;N Ashkenasy;Y Shacham-Diamand

  • Electroless Silver and Silver with Tungsten Thin Films for Microelectronics and Microelectromechanical System Applications

    Yosi Shacham‐Diamand;Alexandra Inberg;Yelena Sverdlov;Nathan Croitoru

  • Electroless Copper Deposition Using Glyoxylic Acid as Reducing Agent for Ultralarge Scale Integration Metallization

    Yosi Y. Shacham‐Diamand

Frequent Co-Authors

Shimshon Belkin
Shimshon Belkin Hebrew University of Jerusalem
Eliezer Gileadi
Eliezer Gileadi Tel Aviv University
Tetsuya Osaka
Tetsuya Osaka Waseda University
Amir Boag
Amir Boag Tel Aviv University
Pavel Ginzburg
Pavel Ginzburg Tel Aviv University
Friedrich Schäffler
Friedrich Schäffler Johannes Kepler University of Linz
Eliora Z. Ron
Eliora Z. Ron Tel Aviv University
Emmanuel P. Giannelis
Emmanuel P. Giannelis Cornell University
Peter Lievens
Peter Lievens KU Leuven
Yishay Feldman
Yishay Feldman Weizmann Institute of Science

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