The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Abdelkarim Mercha sits on this spectrum.
This scientist: 252 publications — 45th percentile
45% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,065 publications or more.
The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Abdelkarim Mercha sits on this spectrum.
This scientist: 40 D-Index — 36th percentile
36% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 111 D-Index or more.
Abdelkarim Mercha is affiliated with Imec in Belgium and focuses their research on engineering, specifically within electrical and electronic engineering. Their work primarily addresses advancements in semiconductor devices and circuit design as well as semiconductor materials and devices. Their research also covers integrated circuits and semiconductor failure analysis.
Mercha's recent publication is titled "Plasma Charging Damage in HK-First and HK-Last RMG NMOS Devices", published in 2021 by the IEEE Transactions on Device and Materials Reliability. This paper explores challenges related to plasma charging damage in advanced semiconductor devices.
Frequent coauthors collaborating with Mercha include:
Mercha's publication venues demonstrate a focus on high-impact journals related to device reliability, with work published in the IEEE Transactions on Device and Materials Reliability.
The topics of Mercha's research work include:
The breadth of Mercha's research lies at the intersection of developing new semiconductor device technologies and analyzing the reliability and failure mechanisms affecting integrated circuits. Their contributions support ongoing efforts to refine materials and device architectures for improved performance and durability within electronic systems.
G Van der Plas;P Limaye;I Loi;A Mercha
Dmitry Yakimets;Geert Eneman;Pieter Schuddinck;Trong Huynh Bao
D. Linten;S. Thijs;M.I. Natarajan;P. Wambacq
V. Subramanian;B. Parvais;J. Borremans;A. Mercha
J. Van Olmen;A. Mercha;G. Katti;C. Huyghebaert
A. Mercha;J.M. Rafi;E. Simoen;E. Augendre
T. Chiarella;L. Witters;A. Mercha;C. Kerner
A. Mercha;G. Van der Plas;V. Moroz;I. De Wolf
N. Collaert;A. De Keersgieter;A. Dixit;I. Ferain
E. Simoen;A. Mercha;L. Pantisano;C. Claeys
Ivan Ciofi;Antonino Contino;Philippe J. Roussel;Rogier Baert
D. Linten;L. Aspemyr;W. Jeamsaksiri;J. Ramos
Vaidyanathan Subramanian;A Mercha;B Parvais;J Loo
D. Jang;E. Bury;R. Ritzenthaler;M. Garcia Bardon
A.J. Scholten;G.D.J. Smit;R.M.T. Pijper;L.F. Tiemeijer
S. Nuttinck;B. Parvais;G. Curatola;A. Mercha
N. Collaert;A. De Keersgieter;A. Dixit;I. Ferain
G. Katti;A. Mercha;J. Van Olmen;C. Huyghebaert
Eddy Simoen;Abdelkarim Mercha;Corneel Claeys;N Lukyanchikova
D. Lederer;B. Parvais;A. Mercha;N. Collaert
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