The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Leonid A. Bendersky sits on this spectrum.
This scientist: 244 publications — 45th percentile
45% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Leonid A. Bendersky sits on this spectrum.
This scientist: 51 D-Index — 24th percentile
24% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Leonid A. Bendersky is affiliated with the National Institute of Standards and Technology in the United States. Their research primarily focuses on materials science and engineering, with notable work in subfields such as materials chemistry, electrical and electronic engineering, mechanical engineering, polymers and plastics, and sustainability-related disciplines.
The scientist has contributed to various topics including:
Over recent years, Bendersky has published papers in several respected venues. Their recent publications include:
Bendersky frequently collaborates with several researchers, including:
The scientist's publications have appeared in diverse venues such as:
In terms of disciplinary focus, Bendersky's work is rooted in both broad and specialized domains of materials science and engineering. This includes concentrated research efforts in materials chemistry and electrical and electronic engineering, along with contributions to mechanical engineering and sustainable material technologies.
William J. Boettinger;C E. Johnson;Leonid A. Bendersky;Kil-Won Moon
Feng Zhang;Huairuo Zhang;Sergiy Krylyuk;Cory A. Milligan
A. Gilad Kusne;Heshan Yu;Changming Wu;Huairuo Zhang
I. Takeuchi;W. Yang;K.-S. Chang;M. A. Aronova
A. Gilad Kusne;A. Gilad Kusne;Heshan Yu;Changming Wu;Huairuo Zhang
L.A. Bendersky;W.J. Boettinger;B.P. Burton;F.S. Biancaniello
Dwight Hunter;Will Osborn;Ke Wang;Nataliya Kazantseva
Junheng Gao;Suihe Jiang;Huairuo Zhang;Yuhe Huang
W. J. Boettinger;L. Bendersky;J. G. Early
Sam Vaziri;Eilam Yalon;Miguel Muñoz Rojo;Saurabh V. Suryavanshi
Leonid A. Bendersky;Frank W. Gayle
R Maier;J L. Cohn;J J. Neumeier;Leonid A. Bendersky
K S. Chang;M A. Aronova;C L. Lin;Makoto Murakami
C. J. Lu;L. A. Bendersky;Hai Lu;William J. Schaff
A. L. Roytburd;S. P. Alpay;L. A. Bendersky;V. Nagarajan
S P. Alpay;V Nagarajan;Leonid A. Bendersky;Mark D. Vaudin
J. L. Murray;A. J. Mcalister;R. J. Schaefer;L. A. Bendersky
I. Levin;L.A. Bendersky;D.G. Brandon;M. Rühle
Peng Wu;Tarek Ameen;Huairuo Zhang;Leonid A. Bendersky
R. S. Roth;C. J. Rawn;L. A. Bendersky
M. Murakami;Kao-Shuo Chang;M. A. Aronova;C. L. Lin
L. Bendersky;R.J. Schaefer;F.S. Biancaniello;W.J. Boettinger
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