Leonid A. Bendersky is affiliated with the National Institute of Standards and Technology in the United States. Their research primarily focuses on materials science and engineering, with notable work in subfields such as materials chemistry, electrical and electronic engineering, mechanical engineering, polymers and plastics, and sustainability-related disciplines.
The scientist has contributed to various topics including:
Over recent years, Bendersky has published papers in several respected venues. Their recent publications include:
Bendersky frequently collaborates with several researchers, including:
The scientist's publications have appeared in diverse venues such as:
In terms of disciplinary focus, Bendersky's work is rooted in both broad and specialized domains of materials science and engineering. This includes concentrated research efforts in materials chemistry and electrical and electronic engineering, along with contributions to mechanical engineering and sustainable material technologies.
William J. Boettinger;C E. Johnson;Leonid A. Bendersky;Kil-Won Moon
Feng Zhang;Huairuo Zhang;Sergiy Krylyuk;Cory A. Milligan
A. Gilad Kusne;Heshan Yu;Changming Wu;Huairuo Zhang
I. Takeuchi;W. Yang;K.-S. Chang;M. A. Aronova
A. Gilad Kusne;A. Gilad Kusne;Heshan Yu;Changming Wu;Huairuo Zhang
L.A. Bendersky;W.J. Boettinger;B.P. Burton;F.S. Biancaniello
Dwight Hunter;Will Osborn;Ke Wang;Nataliya Kazantseva
Junheng Gao;Suihe Jiang;Huairuo Zhang;Yuhe Huang
W. J. Boettinger;L. Bendersky;J. G. Early
Sam Vaziri;Eilam Yalon;Miguel Muñoz Rojo;Saurabh V. Suryavanshi
Leonid A. Bendersky;Frank W. Gayle
R Maier;J L. Cohn;J J. Neumeier;Leonid A. Bendersky
K S. Chang;M A. Aronova;C L. Lin;Makoto Murakami
C. J. Lu;L. A. Bendersky;Hai Lu;William J. Schaff
A. L. Roytburd;S. P. Alpay;L. A. Bendersky;V. Nagarajan
S P. Alpay;V Nagarajan;Leonid A. Bendersky;Mark D. Vaudin
J. L. Murray;A. J. Mcalister;R. J. Schaefer;L. A. Bendersky
I. Levin;L.A. Bendersky;D.G. Brandon;M. Rühle
Peng Wu;Tarek Ameen;Huairuo Zhang;Leonid A. Bendersky
R. S. Roth;C. J. Rawn;L. A. Bendersky
M. Murakami;Kao-Shuo Chang;M. A. Aronova;C. L. Lin
L. Bendersky;R.J. Schaefer;F.S. Biancaniello;W.J. Boettinger
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