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Electronics and Electrical Engineering

D-Index
34
Citations
4932
World Ranking
5797
National Ranking
89

Overview

Geok Ing Ng is affiliated with Nanyang Technological University in Singapore. Their research primarily focuses on engineering and physics, with a concentrated expertise in electrical and electronic engineering and condensed matter physics. The work spans multiple subfields, including electronic, optical and magnetic materials, atomic and molecular physics, optics, and biomedical engineering.

Their main research topics include:

  • GaN-based semiconductor devices and materials
  • Semiconductor materials and devices
  • Ga2O3 and related materials
  • Radio frequency integrated circuit design
  • Semiconductor quantum structures and devices
  • Metal and thin film mechanics
  • Silicon carbide semiconductor technologies

Geok Ing Ng has contributed to various publication venues, frequently publishing in:

  • Materials Science and Engineering B
  • Applied Physics Express
  • IEEE Electron Device Letters
  • physica status solidi (a)
  • Applied Physics Letters

Recent papers authored or co-authored by Geok Ing Ng include:

  • "Vertical GaN-on-GaN Schottky Diodes as α-Particle Radiation Sensors," 2020, Micromachines
  • "GaN-on-Si HEMTs Fabricated With Si CMOS-Compatible Metallization for Power Amplifiers in Low-Power Mobile SoCs," 2020, IEEE Microwave and Wireless Components Letters
  • "Demonstration of vertically-ordered h-BN/AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors on Si substrate," 2021, Materials Science and Engineering B
  • "AlN/GaN MISHEMTs on Si with in-situ SiN as a gate dielectric for power amplifiers in mobile SoCs," 2021, Applied Physics Express
  • "Enhancing the piezoelectric modulus of wurtzite AlN by ion beam strain engineering," 2021, Applied Physics Letters

Frequent collaborators with Geok Ing Ng include:

  • Hanlin Xie
  • S. Arulkumaran
  • Hanchao Li
  • Kumud Ranjan
  • Yue Wang

Best Publications

  • Reduced surface leakage current and trapping effects in AlGaN/GaN high electron mobility transistors on silicon with SiN/Al2O3 passivation

    Z. H. Liu;G. I. Ng;H. Zhou;S. Arulkumaran

  • Improved two-dimensional electron gas transport characteristics in AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor with atomic layer-deposited Al2O3 as gate insulator

    Z. H. Liu;G. I. Ng;S. Arulkumaran;Y. K. T. Maung

  • AlGaN/GaN two-dimensional-electron gas heterostructures on 200 mm diameter Si(111)

    S. Tripathy;Vivian K. X. Lin;S. B. Dolmanan;Joyce P. Y. Tan

  • 0.10 /spl mu/m graded InGaAs channel InP HEMT with 305 GHz f/sub T/ and 340 GHz f/sub max/

    M. Wojtowicz;R. Lai;D.C. Streit;G.I. Ng

  • Temperature-dependent forward gate current transport in atomic-layer-deposited Al2O3/AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor

    Z. H. Liu;G. I. Ng;S. Arulkumaran;Y. K. T. Maung

  • High Microwave-Noise Performance of AlGaN/GaN MISHEMTs on Silicon With $\hbox{Al}_{2}\hbox{O}_{3}$ Gate Insulator Grown by ALD

    Zhi Hong Liu;Geok Ing Ng;S. Arulkumaran;Ye Maung

  • InAlN/GaN HEMTs on Si With High ${{f}}_{ ext {T}}$ of 250 GHz

    Weichuan Xing;Zhihong Liu;Haodong Qiu;Kumud Ranjan

  • Atomic layer deposition of ZrO2 as gate dielectrics for AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors on silicon

    G. Ye;H. Wang;S. Arulkumaran;G. I. Ng

  • Improved Linearity for Low-Noise Applications in 0.25- $ \mu\hbox{m}$ GaN MISHEMTs Using ALD $\hbox{Al}_{2}\hbox{O}_{3}$ as Gate Dielectric

    Z H Liu;G I Ng;S Arulkumaran;Y K T Maung

  • Low‐ and high‐field transport properties of pseudomorphic InxGa1−xAs/In0.52Al0.48As (0.53≤x≤0.65) modulation‐doped heterostructures

    W.‐P. Hong;G. I. Ng;P. K. Bhattacharya;D. Pavlidis

  • Direct Current and Microwave Characteristics of Sub-micron AlGaN/GaN High-Electron-Mobility Transistors on 8-Inch Si(111) Substrate

    Subramaniam Arulkumaran;Geok Ing Ng;Sahmuganathan Vicknesh;Hong Wang

  • Demonstration of submicron-gate AlGaN/GaN high- electron-mobility transistors on silicon with complementary metal-oxide-semiconductor-compatible non-gold metal stack

    Subramaniam Arulkumaran;Geok Ing Ng;Sahmuganathan Vicknesh;Hong Wang

  • Low-Temperature Chemical Transformations for High-Performance Solution-Processed Oxide Transistors

    Rohit Abraham John;Nguyen Anh Chien;Sudhanshu Shukla;Naveen Tiwari

  • Temperature dependent microwave performance of AlGaN/GaN high-electron-mobility transistors on high-resistivity silicon substrate

    S. Arulkumaran;Z.H. Liu;G.I. Ng;W.C. Cheong

  • Improved Power Device Figure-of-Merit (4.0×108 V2 Ω-1 cm-2) in AlGaN/GaN High-Electron-Mobility Transistors on High-Resistivity 4-in. Si

    Subramaniam Arulkumaran;Sahmuganathan Vicknesh;Ng Geok Ing;Susai Lawrence Selvaraj

  • Design and experimental characteristics of strained In/sub 0.52/Al/sub 0.48/As/In/sub x/Ga/sub 1-x/As (x>0.53) HEMTs

    G.-I. Ng;D. Pavlidis;M. Jaffe;J. Singh

  • Electrothermal Large-Signal Model of III–V FETs Including Frequency Dispersion and Charge Conservation

    Lin-Sheng Liu;Jian-Guo Ma;Geok-Ing Ng

  • An analytical approach to the capacitance-voltage characteristics of double-heterojunction HEMTs

    J.-L. Cazaux;G.-I. Ng;D. Pavlidis;H.-F. Chau

  • Effect of gate-source and gate-drain Si3N4 passivation on current collapse in AlGaN∕GaN high-electron-mobility transistors on silicon

    Unknown

  • Metamorphic InP/InGaAs double-heterojunction bipolar transistors on GaAs grown by molecular-beam epitaxy

    H. Q. Zheng;K. Radhakrishnan;H. Wang;K. H. Yuan

  • Characteristics of strained In/sub 0.65/Ga/sub 0.35/As/In/sub 0/./sub 52/Al/sub 0/./sub 48/As HEMT with optimized transport parameters

    G.I. Ng;W.-P. Hong;D. Pavlidis;M. Tutt

  • Electrothermal large-signal model of III–V FETs accounting for frequency dispersion and charge conservation

    Lin-Sheng Liu;Jian-Guo Ma;Geok-Ing Ng

  • Enhanced Breakdown Voltage With High Johnson's Figure-of-Merit in 0.3- $\mu{ m m}$ T-gate AlGaN/GaN HEMTs on Silicon by $({ m NH}_{4})_{2}{ m S}_{x}$ Treatment

    S. Arulkumaran;G. I. Ng;S. Vicknesh

Frequent Co-Authors

Dimitris Pavlidis
Dimitris Pavlidis Boston University
Youngwoo Kwon
Youngwoo Kwon Seoul National University
Sukant K. Tripathy
Sukant K. Tripathy University of Massachusetts Lowell
Richard Lai
Richard Lai Northrop Grumman (United States)
Boon S. Ooi
Boon S. Ooi King Abdullah University of Science and Technology
John Kennedy
John Kennedy GNS Science
Hiroshi Amano
Hiroshi Amano Nagoya University
Jasprit Singh
Jasprit Singh University of Michigan–Ann Arbor

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