The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Atsushi Tsukazaki sits on this spectrum.
This scientist: 323 publications — 65th percentile
65% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Atsushi Tsukazaki sits on this spectrum.
This scientist: 66 D-Index — 59th percentile
59% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Atsushi Tsukazaki is a researcher affiliated with Tohoku University in Japan, specializing in physics and materials science. Their work extensively covers areas in atomic and molecular physics, optics, and materials chemistry, with particular attention to condensed matter physics and electronic, optical, and magnetic materials.
Their research primarily focuses on topological materials and phenomena, electronic and structural properties of oxides, and advanced condensed matter physics. These areas are complemented by investigations into graphene applications, magnetic properties of thin films, quantum and electron transport phenomena, and two-dimensional materials.
Tsukazaki has contributed to a significant number of publications, with their frequent publication venues including:
Among their recent papers are these notable works:
Repeated collaborations define part of their research network. Frequent co-authors include:
This collaboration network supports work that advances understanding in electronic phenomena and magnetic materials, reinforcing interdisciplinary approaches typical in their fields of study.
Atsushi Tsukazaki;Akira Ohtomo;Takeyoshi Onuma;Makoto Ohtani
Yoshinori Tokura;Yoshinori Tokura;Kenji Yasuda;Atsushi Tsukazaki
Atsushi Tsukazaki;A. Ohtomo;A. Ohtomo;Tomohiro Kita;Y. Ohno
J. G. Checkelsky;J. G. Checkelsky;R. Yoshimi;A. Tsukazaki;K. S. Takahashi
Hongtao Yuan;Hidekazu Shimotani;Atsushi Tsukazaki;Akira Ohtomo
Atsushi Tsukazaki;Masashi Kubota;Akira Ohtomo;Takeyoshi Onuma
Yufan Li;Yufan Li;N. Kanazawa;X. Z. Yu;A. Tsukazaki
M. Mogi;M. Kawamura;R. Yoshimi;A. Tsukazaki
A. Tsukazaki;A. Tsukazaki;S. Akasaka;K. Nakahara;Y. Ohno
J. Shiogai;Y. Ito;T. Mitsuhashi;T. Nojima
T. Koida;S. F. Chichibu;A. Uedono;A. Tsukazaki
Hongtao Yuan;Hidekazu Shimotani;Jianting Ye;Sungjae Yoon
K. Nakahara;S. Akasaka;H. Yuji;K. Tamura
Akira Ohtomo;Atsushi Tsukazaki
T. Makino;Y. Segawa;S. Yoshida;A. Tsukazaki
M. Mogi;R. Yoshimi;A. Tsukazaki;A. Tsukazaki;K. Yasuda
Hidetoshi Masuda;Hideaki Sakai;Masashi Tokunaga;Yuichi Yamasaki
Hidekazu Shimotani;Haruhiko Asanuma;Atsushi Tsukazaki;Akira Ohtomo
T. Makino;Y. Segawa;S. Yoshida;A. Tsukazaki
Kenji Yasuda;Atsushi Tsukazaki;Ryutaro Yoshimi;Kei Takahashi
K. Yasuda;A. Tsukazaki;R. Yoshimi;K. S. Takahashi
R. Yoshimi;A. Tsukazaki;A. Tsukazaki;Y. Kozuka;J. Falson
Masataka Mogi;Minoru Kawamura;Atsushi Tsukazaki;Ryutaro Yoshimi
M. Mogi;R. Yoshimi;A. Tsukazaki;A. Tsukazaki;K. Yasuda
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