The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Akira Ohtomo sits on this spectrum.
This scientist: 341 publications — 68th percentile
68% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Akira Ohtomo sits on this spectrum.
This scientist: 73 D-Index — 71st percentile
71% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Akira Ohtomo is affiliated with the Tokyo Institute of Technology in Japan and has contributed to the field of materials science with a focus on materials chemistry, electronic, optical and magnetic materials, as well as electrical and electronic engineering. Their research spans topics related to ZnO doping and properties, electronic and structural properties of oxides, Ga2O3 and related materials, advanced photocatalysis techniques, two-dimensional materials and applications, semiconductor materials and devices, and hydrogen storage and materials.
Ohtomo's recent publications include:
Their work has been published frequently in journals such as Crystal Growth & Design, Physical Review B, Journal of Applied Physics, Science Advances, and Physical Review Materials.
Frequent collaborators in Ohtomo's publications include Takuto Soma, K. Yoshimatsu, Hiroshi Kumigashira, Kazuki Koreishi, and Osami Sakata.
The main fields and subfields of study related to Ohtomo's research are:
The primary topics that Ohtomo has focused on consist of:
Z. K. Tang;G. K. L. Wong;P. Yu;M. Kawasaki
Atsushi Tsukazaki;Akira Ohtomo;Takeyoshi Onuma;Makoto Ohtani
A. Ohtomo;M. Kawasaki;T. Koida;K. Masubuchi
P. Zu;Z.K. Tang;G.K.L. Wong;M. Kawasaki
A. Ohtomo;D. A. Muller;J. L. Grazul;H. Y. Hwang
K. Ueno;S. Nakamura;H. Shimotani;A. Ohtomo
T. Makino;Y. Segawa;M. Kawasaki;A. Ohtomo
T. Fukumura;Zhengwu Jin;A. Ohtomo;H. Koinuma
David A. Muller;David A. Muller;Naoyuki Nakagawa;Naoyuki Nakagawa;Akira Ohtomo;Akira Ohtomo;John L. Grazul;John L. Grazul
Atsushi Tsukazaki;A. Ohtomo;A. Ohtomo;Tomohiro Kita;Y. Ohno
Hongtao Yuan;Hidekazu Shimotani;Atsushi Tsukazaki;Akira Ohtomo
A. Ohtomo;M. Kawasaki;I. Ohkubo;H. Koinuma
Atsushi Tsukazaki;Masashi Kubota;Akira Ohtomo;Takeyoshi Onuma
Junya Nishii;Faruque M. Hossain;Faruque M. Hossain;Shingo Takagi;Shingo Takagi;Tetsuya Aita
Faruque M. Hossain;J. Nishii;S. Takagi;A. Ohtomo
A. Tsukazaki;A. Tsukazaki;S. Akasaka;K. Nakahara;Y. Ohno
A. Ohtomo;K. Tamura;K. Saikusa;K. Takahashi
A. Ohtomo;K. Tamura;M. Kawasaki;T. Makino
Y. Segawa;A. Ohtomo;M. Kawasaki;H. Koinuma
T. Makino;C. H. Chia;Nguen T. Tuan;H. D. Sun
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