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D-Index & Metrics

Materials Science

D-Index
60
Citations
12444
World Ranking
7083
National Ranking
414

Wolfgang Stolz publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Wolfgang Stolz sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 622 publications — 93rd percentile

93% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Wolfgang Stolz D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Wolfgang Stolz sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 60 D-Index — 46th percentile

46% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Wolfgang Stolz is affiliated with Philipp University of Marburg in Germany and has made contributions in the fields of Engineering as well as Physics and Astronomy. Their research focuses primarily on Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, with additional work in Spectroscopy, Condensed Matter Physics, and Biomedical Engineering.

The scientist's work covers several main topics, including:

  • Semiconductor Quantum Structures and Devices
  • Semiconductor Lasers and Optical Devices
  • Photonic and Optical Devices
  • Spectroscopy and Laser Applications
  • Advanced Semiconductor Detectors and Materials
  • Advanced Fiber Laser Technologies
  • Semiconductor materials and devices

Recent publications by Wolfgang Stolz include:

  • "Signatures of a frequency-modulated comb in a VECSEL," 2021, published in Optica
  • "Widely Tunable Terahertz-Generating Semiconductor Disk Laser," 2020, published in physica status solidi (RRL) - Rapid Research Letters
  • "Direct Probe of Room-Temperature Quantum-Tunneling Processes in Type-II Heterostructures Using Terahertz Emission Spectroscopy," 2020, published in Physical Review Applied
  • "In situ analysis of Bi terminated GaAs (0 0 1) and Ga(As,Bi) surfaces during growth by MOVPE," 2020, published in Applied Surface Science
  • "Performance characteristics of low threshold current 1.25 μm type-II GaInAs/GaAsSb 'W'-lasers for optical communications," 2021, published in Journal of Physics D Applied Physics

Wolfgang Stolz often collaborates with several researchers, including:

  • Kerstin Volz
  • Christian Fuchs
  • Jannik Lehr
  • Martín Koch
  • Dominic A. Duffy

The scientist has published frequently in venues such as:

  • arXiv (Cornell University)
  • Physical Review B
  • Applied Physics Letters
  • Electronics Letters
  • Optics Express

Best Publications

  • GaP-nucleation on exact Si (0 0 1) substrates for III/V device integration

    Kerstin Volz;Andreas Beyer;Wiebke Witte;Jens Ohlmann

  • 106 W continuous-wave output power from vertical-external-cavity surface-emitting laser

    Bernd Heinen;Tzu-Lin Wang;M. Sparenberg;Andreas Weber

  • Exciton-LO-phonon quantum kinetics: Evidence of memory effects in bulk GaAs.

    L. Bányai;D. B. Tran Thoai;E. Reitsamer;H. Haug

  • (Ga, In)(N, As)-fine structure of the band gap due to nearest-neighbor configurations of the isovalent nitrogen

    P. J. Klar;H. Grüning;J. Koch;S. Schäfer

  • From N isoelectronic impurities to N-induced bands in the GaNxAs1−x alloy

    P. J. Klar;H. Grüning;W. Heimbrodt;J. Koch

  • Reduced threshold current densities of (GaIn)(NAs)/GaAs single quantum well lasers for emission wavelengths in the range 1.28 - 1.38 [micro sign]m

    F. Hohnsdorf;J. Koch;S. Leu;W. Stolz

  • Heteroepitaxy of GaP on Si: Correlation of morphology, anti-phase-domain structure and MOVPE growth conditions

    I. Németh;B. Kunert;W. Stolz;K. Volz

  • 4.35 kW peak power femtosecond pulse mode-locked VECSEL for supercontinuum generation

    Keith G. Wilcox;Anne C. Tropper;Harvey E. Beere;David A. Ritchie

  • Electrical injection Ga(AsBi)/(AlGa)As single quantum well laser

    P. Ludewig;N. Knaub;N. Hossain;S. Reinhard

  • Laser operation of Ga(NAsP) lattice-matched to (001) silicon substrate

    S. Liebich;M. Zimprich;A. Beyer;C. Lange

  • Si (001) surface preparation for the antiphase domain free heteroepitaxial growth of GaP on Si substrate

    B. Kunert;I. Németh;S. Reinhard;K. Volz

  • Disorder mediated biexcitonic beats in semiconductor quantum wells

    T. F. Albrecht;K. Bott;T. Meier;A. Schulze

  • Passively modelocked VECSEL emitting 682 fs pulses with 5.1W of average output power

    M. Scheller;T.-L. Wang;B. Kunert;W. Stolz

  • Interaction between conduction band edge and nitrogen states probed by carrier effective-mass measurements in Ga As 1 − x N x

    Francesco Masia;G. Pettinari;A. Polimeni;M. Felici

  • Direct-band-gap Ga(NAsP)-material system pseudomorphically grown on GaP substrate

    B. Kunert;K. Volz;J. Koch;W. Stolz

  • Optical Coherence in Semiconductors: Strong Emission Mediated by Nondegenerate Interactions.

    S. T. Cundiff;M. Koch;W. H. Knox;J. Shah

  • Room-temperature threshold reduction in vertical-cavity surface-emitting lasers by injection of spin-polarized electrons

    J. Rudolph;S. Döhrmann;D. Hägele;M. Oestreich

  • Optical and structural properties of GaAs grown on (100) Si by molecular‐beam epitaxy

    W. Stolz;F. E. G. Guimaraes;K. Ploog

  • Tunable high-power high-brightness linearly polarized vertical-external-cavity surface-emitting lasers

    Li Fan;Mahmoud Fallahi;James T. Murray;Robert Bedford

  • Quantitative description of disorder parameters in (GaIn)(NAs) quantum wells from the temperature-dependent photoluminescence spectroscopy

    O. Rubel;M. Galluppi;S. D. Baranovskii;K. Volz

Frequent Co-Authors

Stephan W. Koch
Stephan W. Koch Philipp University of Marburg
Jerome V. Moloney
Jerome V. Moloney University of Arizona
Martin Koch
Martin Koch Philipp University of Marburg
Ernst O. Göbel
Ernst O. Göbel Physikalisch-Technische Bundesanstalt
Martin R. Hofmann
Martin R. Hofmann Ruhr University Bochum
Jochen Feldmann
Jochen Feldmann Ludwig-Maximilians-Universität München
Thomas Elsaesser
Thomas Elsaesser Max Planck Society
Andreas W. Bett
Andreas W. Bett Fraunhofer Institute for Solar Energy Systems
Jörg Sundermeyer
Jörg Sundermeyer Philipp University of Marburg

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