His main research concerns Silicon, Optics, Optoelectronics, Surface micromachining and Electronic engineering. His research integrates issues of Chemical vapor deposition, Nitride and Analytical chemistry in his study of Silicon. His Optics research is multidisciplinary, incorporating perspectives in Etching and Wafer.
His work carried out in the field of Optoelectronics brings together such families of science as Stress, Annealing and Grain boundary. Reinoud F. Wolffenbuttel interconnects Compatibility, Infrared, Electrical engineering and Microelectromechanical systems in the investigation of issues within Electronic engineering. His Microelectromechanical systems study which covers Optical path that intersects with Microsystem.
The scientist’s investigation covers issues in Optoelectronics, Optics, Silicon, Optical filter and Surface micromachining. His Optoelectronics research includes themes of Etching and Detector. His Optics research incorporates elements of Wafer and Microelectromechanical systems.
His studies deal with areas such as Electronic engineering, Electrical engineering and Analytical chemistry as well as Silicon. His research investigates the link between Electronic engineering and topics such as Capacitive sensing that cross with problems in Accelerometer, Voltage and Capacitance. His Optical filter study incorporates themes from Full width at half maximum, Resist, Absorption, Distributed Bragg reflector and Filter.
His primary areas of study are Optics, Optoelectronics, Optical filter, Microelectromechanical systems and Resonator. His study in the fields of Distributed Bragg reflector under the domain of Optics overlaps with other disciplines such as Surface micromachining. His Optoelectronics research includes elements of Electrical impedance, Thermopile and Detector.
His Optical filter study combines topics in areas such as Transmittance, Spectrometer, Refractive index, Fabry–Pérot interferometer and Absorption spectroscopy. The various areas that Reinoud F. Wolffenbuttel examines in his Refractive index study include Etching, Residual stress and Silicon. As a member of one scientific family, he mostly works in the field of Resonator, focusing on Absorption and, on occasion, Analytical chemistry, Raman spectroscopy, Chemical vapor deposition and Absorbance.
His scientific interests lie mostly in Optics, Optical filter, Optoelectronics, Microelectromechanical systems and Absorption. The concepts of his Optics study are interwoven with issues in Microsystem and Distortion. His Optical filter study integrates concerns from other disciplines, such as Wavelength, Fabry–Pérot interferometer, Resonator and Spectrometer.
His Microelectromechanical systems research is multidisciplinary, incorporating elements of Chip, Thermal conductivity and Detector, Thermal conductivity detector. His work deals with themes such as Wafer and Path length, which intersect with Absorption. His research in Refractive index tackles topics such as Silicon which are related to areas like CMOS.
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SURFACE MICROMACHINED TUNEABLE INTERFEROMETER ARRAY
K. Aratani;P. J. French;P. M. Sarro;D. Poenar.
SPIE milestone series (1999)
Low-temperature intermediate Au-Si wafer bonding; eutectic or silicide bond
R.F. Wolffenbuttel.
Sensors and Actuators A-physical (1997)
Low-temperature silicon wafer-to-wafer bonding using gold at eutectic temperature
R.F. Wolffenbuttel;K.D. Wise.
Sensors and Actuators A-physical (1994)
State-of-the-art in integrated optical microspectrometers
R.F. Wolffenbuttel.
IEEE Transactions on Instrumentation and Measurement (2004)
Optimization of a low-stress silicon nitride process for surface-micromachining applications
P.J French;P.M Sarro;R Mallée;E.J.M Fakkeldij.
Sensors and Actuators A-physical (1997)
Process and design considerations for surface micromachined beams for a tuneable interferometer array in silicon
K. Aratani;P.J. French;P.M. Sarro;R.F. Wolffenbuttel.
international conference on micro electro mechanical systems (1993)
MEMS-based optical mini- and microspectrometers for the visible and infrared spectral range
R F Wolffenbuttel.
Journal of Micromechanics and Microengineering (2005)
Modeling the mechanical behavior of bulk-micromachined silicon accelerometers
R.P. van Kampen;R.F. Wolffenbuttel.
Sensors and Actuators A-physical (1998)
Comparison of techniques for measuring both compressive and tensile stress in thin films
B.P. van Drieënhuizen;J.F.L. Goosen;P.J. French;R.F. Wolffenbuttel.
Sensors and Actuators A-physical (1993)
Infrared micro-spectrometer based on a diffraction grating
S.H. Kong;D.D.L. Wijngaards;R.F. Wolffenbuttel.
Sensors and Actuators A-physical (2001)
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University of Minho
Delft University of Technology
University of Zaragoza
Basque Center for Materials, Applications and Nanostructures
Delft University of Technology
MIT
University of Michigan–Ann Arbor
École Polytechnique Fédérale de Lausanne
Basque Center for Materials, Applications and Nanostructures
Publications: 24