World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
4998
World Ranking
5579
National Ranking
64

Best Publications

  • Polysilicon: a versatile material for microsystems

    P.J. French

  • Piezoresistance in polysilicon and its applications to strain gauges

    Unknown

  • Comparison of techniques for measuring both compressive and tensile stress in thin films

    B.P. van Drieënhuizen;J.F.L. Goosen;P.J. French;R.F. Wolffenbuttel

  • Characterizing size-dependent effective elastic modulus of silicon nanocantilevers using electrostatic pull-in instability

    H. Sadeghian;C.K. Yang;J.F.L. Goosen;E. Van der Drift

  • Sensors with digital or frequency output

    S. Middelhoek;P.J. French;J.H. Huijsing;W.J. Lian

  • Comparison of porous silicon, porous polysilicon and porous silicon carbide as materials for humidity sensing applications

    E.J. Connolly;G.M. O’Halloran;H.T.M. Pham;P.M. Sarro

  • Modified Reynolds equation and analytical analysis of squeeze-film air damping of perforated structures

    Unknown

  • Advances in cochlear implants

    Unknown

  • Polyimide sacrificial layer and novel materials for post-processing surface micromachining

    A Bagolini;L Pakula;T L M Scholtes;H T M Pham

  • Galvanic porous silicon formation without external contacts

    C.M.A Ashruf;P.J French;P.M.M.C Bressers;J.J Kelly

  • Fabrication of a CMOS compatible pressure sensor for harsh environments

    L S Pakula;H Yang;H T M Pham;P J French

  • Galvanic Cell Formation in Silicon/Metal Contacts: The Effect on Silicon Surface Morphology

    X. H. Xia;C. M. A. Ashruf;P. J. French;J. J. Kelly

  • A porous SiC ammonia sensor

    E.J. Connolly;B.H. Timmer;H.T.M. Pham;J. Groeneweg

  • The piezojunction effect in silicon sensors and circuits and its relation to piezoresistance

    J.F. Creemer;F. Fruett;G.C.M. Meijer;P.J. French

  • Precision in harsh environments

    Paddy French;Gijsbertus J.M. Krijnen;Fred Roozeboom

  • Sensors for Catheter Applications

    P. J. French;D. Tanase;J. F. L. Goosen

  • Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

    G Craciun;M A Blauw;E van der Drift;P M Sarro

  • The development of a low-stress polysilicon process compatible with standard device processing

    P.J. French;B.P. van Drieenhuizen;D. Poenar;J.F.L. Goosen

  • Advanced time-multiplexed plasma etching of high aspect ratio silicon structures

    M. A. Blauw;G. Craciun;W. G. Sloof;P. J. French

  • Effects of size and defects on the elasticity of silicon nanocantilevers

    Unknown

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