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Masanobu Miyao

Masanobu Miyao

D-Index & Metrics

Materials Science

D-Index
47
Citations
8081
World Ranking
11142
National Ranking
692

Overview

Masanobu Miyao is a researcher affiliated with Kyushu University in Japan. The available data does not provide detailed information on specific publications, co-authors, or research topics but confirms the current professional association with the university.

While specific recent papers or publication venues are not listed, Masanobu Miyao's profile includes roles in academic research and the pursuit of scholarly activities within a university setting, which commonly involves contributions to research outputs and collaboration within scientific communities.

The absence of listed main fields of study, subfields, or topics of work suggests that detailed bibliometric data or thematic research focus is not accessible at this time.

No information on awards or book publications is included in the provided data, and the profile does not indicate retired or deceased status, implying ongoing affiliation.

This profile reflects only verified elements from currently available data without speculation on research impact or detailed academic achievements.

Best Publications

  • Electrical properties of poly-Ge on glass substrate grown by two-step solid-phase crystallization

    Kaoru Toko;Isakane Nakao;Taizoh Sadoh;Takashi Noguchi

  • Semiconductor device and semiconductor substrate having selectively etched portions filled with silicon germanium

    Nobuyuki Sugii;Kiyokazu Nakagawa;Shinya Yamaguchi;Masanobu Miyao

  • Transistor provided with strained germanium layer

    Eiichi Murakami;Kiyokazu Nakagawa;Takashi Ohshima;Hiroyuki Hitachi Daiyon Kyoshinryo Eto

  • Electrical injection and detection of spin-polarized electrons in silicon through an Fe3Si/Si Schottky tunnel barrier

    Y. Ando;K. Hamaya;K. Kasahara;Y. Kishi

  • Electrical injection and detection of spin-polarized electrons in silicon through an Fe_3Si/Si Schottky tunnel barrier

    Y. Ando;K. Hamaya;K. Kasahara;Y. Kishi

  • Orientation-controlled Si thin films on insulating substrates by Al-induced crystallization combined with interfacial-oxide layer modulation

    Masashi Kurosawa;Naoyuki Kawabata;Taizoh Sadoh;Masanobu Miyao

  • Transient structural relaxation of amorphous silicon

    W. Sinke;T. Warabisako;M. Miyao;T. Tokuyama

  • Low-temperature formation (<500°C) of poly-Ge thin-film transistor with NiGe Schottky source/drain

    T. Sadoh;H. Kamizuru;A. Kenjo;M. Miyao

  • Role of Si1−xGex buffer layer on mobility enhancement in a strained-Si n-channel metal–oxide–semiconductor field-effect transistor

    Nobuyuki Sugii;Kiyokazu Nakagawa;Shinya Yamaguchi;Masanobu Miyao

  • Reverse temperature dependence of Ge surface segregation during Si‐molecular beam epitaxy

    Kiyokazu Nakagawa;Masanobu Miyao

  • Room-temperature generation of giant pure spin currents using epitaxial Co2FeSi spin injectors

    Takashi Kimura;Naoki Hashimoto;Shinya Yamada;Masanobu Miyao

  • Giant Ge-on-Insulator Formation by Si–Ge Mixing-Triggered Liquid-Phase Epitaxy

    Masanobu Miyao;Takanori Tanaka;Kaoru Toko;Masanori Tanaka

  • Highly (111)-oriented Ge thin films on insulators formed by Al-induced crystallization

    K. Toko;M. Kurosawa;N. Saitoh;N. Yoshizawa

  • High-quality single-crystal Ge stripes on quartz substrate by rapid-melting-growth

    Masanobu Miyao;Kaoru Toko;Takanori Tanaka;Taizoh Sadoh

  • Epitaxial ferromagnetic Fe$_{3}$Si/Si(111) structures with high-quality hetero-interfaces

    K. Hamaya;K. Ueda;Y. Kishi;Y. Ando

  • Epitaxial ferromagnetic Fe3Si∕Si(111) structures with high-quality heterointerfaces

    K. Hamaya;K. Ueda;Y. Kishi;Y. Ando

  • Effect of atomically controlled interfaces on Fermi-level pinning at metal/Ge interfaces

    K. Yamane;K. Hamaya;Y. Ando;Y. Enomoto

  • High hole mobility in strained Ge channel of modulation-doped p-Si0.5Ge0.5/Ge/Si1−xGex heterostructure

    Masanobu Miyao;Eiichi Murakami;Hiroyuki Etoh;Kiyokazu Nakagawa

  • Ferromagnetism and Electronic Structures of Nonstoichiometric Heusler-Alloy Fe3 xMnxSi Epilayers Grown on Ge(111)

    K. Hamaya;K. Hamaya;H. Itoh;O. Nakatsuka;K. Ueda

  • Electrical properties for poly-Ge films fabricated by pulsed laser annealing

    Hajime Watakabe;Toshiyuki Sameshima;Hiroshi Kanno;Masanobu Miyao

  • Estimation of the spin polarization for Heusler-compound thin films by means of nonlocal spin-valve measurements: Comparison of Co 2 FeSi and Fe 3 Si

    K. Hamaya;K. Hamaya;N. Hashimoto;S. Oki;S. Yamada

Frequent Co-Authors

Jong Hyeok Park
Jong Hyeok Park Yonsei University
Mitsumasa Koyanagi
Mitsumasa Koyanagi Tohoku University
Tokuo Kure
Tokuo Kure Hitachi (Japan)
Tetsu Tanaka
Tetsu Tanaka Tohoku University
Shinichiro Kimura
Shinichiro Kimura Hitachi (Japan)
Noritaka Usami
Noritaka Usami Nagoya University
Takashi Suemasu
Takashi Suemasu University of Tsukuba
Albert Polman
Albert Polman Institute for Atomic and Molecular Physics

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