World's Best Scientists 2026 revealed!

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
34
Citations
3943
World Ranking
5895
National Ranking
95

Erik Lind publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Erik Lind sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 217 publications — 35th percentile

35% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Erik Lind D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Erik Lind sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 34 D-Index — 18th percentile

18% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Erik Lind is affiliated with Lund University in Sweden and has contributed extensively to the fields of Engineering and Physics and Astronomy. Their work spans 68 publications in Engineering and 32 in Physics and Astronomy, with focused expertise in several subfields.

The scientist's primary research areas include Electrical and Electronic Engineering, Atomic and Molecular Physics and Optics, Biomedical Engineering, Condensed Matter Physics, and Materials Chemistry. These subfields reflect a broad engagement with both fundamental and applied aspects of semiconductor technology and quantum materials.

Erik Lind's research interests cover diverse topics such as:

  • Semiconductor materials and devices
  • Advancements in Semiconductor Devices and Circuit Design
  • Nanowire Synthesis and Applications
  • Semiconductor Quantum Structures and Devices
  • Electronic and Structural Properties of Oxides
  • Quantum and electron transport phenomena
  • Ferroelectric and Negative Capacitance Devices

Among the recent papers associated with the scientist are:

  • Atomic Layer Deposition of Hafnium Oxide on InAs: Insight from Time-Resolved in Situ Studies, 2020, ACS Applied Electronic Materials
  • High-Performance Vertical III-V Nanowire MOSFETs on Si With gm > 3 mS/μm, 2020, IEEE Electron Device Letters
  • Tuning of Source Material for InAs/InGaAsSb/GaSb Application-Specific Vertical Nanowire Tunnel FETs, 2020, ACS Applied Electronic Materials
  • Vertical nanowire III-V MOSFETs with improved high-frequency gain, 2020, Electronics Letters
  • Increased Breakdown Voltage in Vertical Heterostructure III-V Nanowire MOSFETs With a Field Plate, 2021, IEEE Electron Device Letters

Frequent co-authors in their research include:

  • Patrik Olausson
  • Lars-Erik Wernersson
  • Johannes Svensson
  • Lasse Södergren
  • Rainer Timm

The main publication venues for Erik Lind's work encompass:

  • IEEE Transactions on Electron Devices
  • Zenodo (CERN European Organization for Nuclear Research)
  • Applied Physics Letters
  • physica status solidi (a)
  • ACS Applied Electronic Materials

Best Publications

  • Improved subthreshold slope in an InAs nanowire heterostructure field-effect transistor.

    Erik Lind;Ann I. Persson;Lars Samuelson;Lars-Erik Wernersson

  • High-Current GaSb/InAs(Sb) Nanowire Tunnel Field-Effect Transistors

    A. W. Dey;B. M. Borg;B. Ganjipour;M. Ek

  • Vertical InAs nanowire wrap gate transistors with f(t) > 7 GHz and f(max) > 20 GHz.

    M. Egard;S. Johansson;A.-C. Johansson;K.-M. Persson

  • Development of a Vertical Wrap-Gated InAs FET

    C. Thelander;C. Rehnstedt;L.E. Froberg;E. Lind

  • Vertical InAs/GaAsSb/GaSb tunneling field-effect transistor on Si with S = 48 mV/decade and I on = 10 μA/μm for I off = 1 nA/μm at V ds = 0.3 V

    E. Memisevic;J. Svensson;M. Hellenbrand;E. Lind

  • III-V Nanowires—Extending a Narrowing Road

    L-E Wernersson;C Thelander;E Lind;L Samuelson

  • Assembly of nanoscaled field effect transistors

    Lars-Erik Wernersson;Erik Lind;Tomas Bryllert;Jonas Ohlsson

  • Individual Defects in InAs/InGaAsSb/GaSb Nanowire Tunnel Field-Effect Transistors Operating below 60 mV/decade

    Elvedin Memisevic;Markus Hellenbrand;Erik Lind;Axel R. Persson

  • High-Frequency Gate-All-Around Vertical InAs Nanowire MOSFETs on Si Substrates

    Sofia Johansson;Elvedin Memisevic;Lars-Erik Wernersson;Erik Lind

  • High transconductance self-aligned gate-last surface channel In 0.53 Ga 0.47 As MOSFET

    M. Egard;L. Ohlsson;B. M. Borg;F. Lenrick

  • High-Performance InAs Nanowire MOSFETs

    A. W. Dey;C. Thelander;E. Lind;K. A. Dick

  • Temperature dependent properties of InSb and InAs nanowire field-effect transistors

    Henrik A. Nilsson;Philippe Caroff;Claes Thelander;Erik Lind

  • Combining axial and radial nanowire heterostructures: Radial Esaki diodes and tunnel field-effect transistors

    Anil W. Dey;Johannes Svensson;Martin Ek;Erik Lind

  • Low resistance, nonalloyed Ohmic contacts to InGaAs

    Adam M. Crook;Erik Lind;Zach Griffith;Mark J. W. Rodwell

  • A High-Frequency Transconductance Method for Characterization of High- $\kappa$ Border Traps in III-V MOSFETs

    S. Johansson;M. Berg;Karl-Magnus Persson;E. Lind

  • Extrinsic and Intrinsic Performance of Vertical InAs Nanowire MOSFETs on Si Substrates

    Karl-Magnus Persson;Martin Berg;Mattias B. Borg;Jun Wu

  • III-V Heterostructure Nanowire Tunnel FETs

    Erik Lind;Elvedin Memisevic;Anil W. Dey;Lars-Erik Wernersson

  • Band Structure Effects on the Scaling Properties of [111] InAs Nanowire MOSFETs

    E. Lind;M.P. Persson;Y.-M. Niquet;L.-E. Wernersson

  • High-Frequency Performance of Self-Aligned Gate-Last Surface Channel $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ MOSFET

    M. Egard;L. Ohlsson;M. Arlelid;K.-M Persson

  • InAs/InGaAsSb/GaSb Nanowire Tunnel Field-Effect Transistors

    Elvedin Memisevic;Johannes Svensson;Erik Lind;Lars-Erik Wernersson

  • DEVICE RESEARCH CONFERENCE

    Suman Datta;Michael Flatté;Judy Hoyt;Erik Lind

  • Scaling of Vertical InAs–GaSb Nanowire Tunneling Field-Effect Transistors on Si

    Elvedin Memisevic;Johannes Svensson;Markus Hellenbrand;Erik Lind

Frequent Co-Authors

Lars-Erik Wernersson
Lars-Erik Wernersson Lund University
Claes Thelander
Claes Thelander Lund University
Lars Samuelson
Lars Samuelson Lund University
Mark J. W. Rodwell
Mark J. W. Rodwell University of California, Santa Barbara
Werner Seifert
Werner Seifert Lund University
Anders Mikkelsen
Anders Mikkelsen Lund University
Philippe Caroff
Philippe Caroff Microsoft (United States)
Peter M. Nilsson
Peter M. Nilsson Lund University
Magnus T. Borgström
Magnus T. Borgström Lund University
Arthur C. Gossard
Arthur C. Gossard University of California, Santa Barbara

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