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Charles H. Dennison

Charles H. Dennison

D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Electronics and Electrical Engineering 39 4734 4545 1660 1554 126 5815

Charles H. Dennison publications per year

The chart shows the history of publications by Charles H. Dennison between 1989 and 2018, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Charles H. Dennison published across 30 years, from 1989 to 2018, averaging 4.4 papers a year. Output peaked at 17 publications in 1992. 2 of the 131 publications appeared in the last two years.

No. of publications
5 10 15
Bar chart. Horizontal axis: year, 1989 to 2018. Vertical axis: number of publications, 0 to 17. Peak 17 publications in 1992. 1989: 1 publication 1990: 8 publications 1991: 7 publications 1992: 17 publications 1993: 17 publications 1994: 15 publications 1995: 6 publications 1996: 8 publications 1997: 6 publications 1998: 6 publications 1999: 4 publications 2000: 6 publications 2001: 7 publications 2002: 9 publications 2003: 3 publications 2004: 4 publications 2005: 0 publications 2006: 2 publications 2007: 0 publications 2008: 0 publications 2009: 0 publications 2010: 1 publication 2011: 0 publications 2012: 0 publications 2013: 1 publication 2014: 1 publication 2015: 0 publications 2016: 0 publications 2017: 1 publication 2018: 1 publication
1989 2018

131 publications in total across all disciplines

View publications per year as a table
Charles H. Dennison: publications per year, 1989 to 2018
Year Publications
1989 1
1990 8
1991 7
1992 17
1993 17
1994 15
1995 6
1996 8
1997 6
1998 6
1999 4
2000 6
2001 7
2002 9
2003 3
2004 4
2005 0
2006 2
2007 0
2008 0
2009 0
2010 1
2011 0
2012 0
2013 1
2014 1
2015 0
2016 0
2017 1
2018 1
Total 131
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Charles H. Dennison publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Charles H. Dennison sits on this spectrum.

No. of scientists
100 200 300 400
Bar chart with 53 bars. Horizontal axis: publications, 34–53 to 1,065+. Vertical axis: number of scientists, 0 to 445. Most scientists, 445, have 174–193 publications. The last bar groups every scientist with 1,065 publications or more. The highlighted bar, 114–133 publications, is where this scientist sits. 34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34–53 publications 1,065+

This scientist: 126 publications — 8th percentile

8% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

View publications distribution as a table
Number of Electronics and Electrical Engineering scientists by publication count, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
Publications Scientists This scientist
34–53 24
54–73 52
74–93 114
94–113 203
114–133 269 126
134–153 355
154–173 403
174–193 445
194–213 430
214–233 431
234–253 399
254–273 366
274–293 335
294–313 300
314–333 276
334–353 250
354–373 214
374–393 187
394–413 152
414–433 169
434–453 147
454–473 111
474–493 117
494–513 103
514–533 99
534–553 92
554–573 75
574–593 58
594–613 69
614–633 50
634–653 62
654–673 54
674–693 44
694–713 37
714–733 28
734–753 26
754–773 26
774–793 19
794–813 23
814–833 20
834–853 16
854–873 20
874–893 11
894–913 11
914–933 16
934–953 13
954–973 10
974–993 11
994–1,013 9
1,014–1,033 9
1,034–1,053 10
1,054–1,064 6
1,065+ 99
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Charles H. Dennison D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Charles H. Dennison sits on this spectrum.

No. of scientists
50 100 150 200 250
Bar chart with 82 bars. Horizontal axis: D-Index, 30 to 111+. Vertical axis: number of scientists, 0 to 263. Most scientists, 263, have 32 D-Index. The last bar groups every scientist with 111 D-Index or more. The highlighted bar, 39 D-Index, is where this scientist sits. 30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 39 D-Index — 33rd percentile

33% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

View D-Index distribution as a table
Number of Electronics and Electrical Engineering scientists by D-index, Research.com 2026 ranking edition. Based on 6,875 ranked scientists.
D-Index Scientists This scientist
30 178
31 257
32 263
33 262
34 244
35 236
36 211
37 220
38 214
39 214 39
40 205
41 187
42 194
43 201
44 155
45 189
46 148
47 160
48 134
49 130
50 141
51 156
52 108
53 130
54 112
55 97
56 111
57 102
58 108
59 120
60 103
61 93
62 92
63 74
64 77
65 73
66 64
67 69
68 60
69 39
70 57
71 59
72 46
73 49
74 38
75 35
76 32
77 35
78 31
79 22
80 34
81 31
82 34
83 23
84 18
85 30
86 19
87 19
88 20
89 8
90 17
91 7
92 14
93 9
94 15
95 10
96 12
97 10
98 10
99 12
100 16
101 5
102 7
103 7
104 8
105 9
106 13
107 4
108 5
109 10
110 8
111+ 96
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Overview

What is he best known for?

The fields of study he is best known for:

  • Electrical engineering
  • Semiconductor
  • Integrated circuit

His primary areas of study are Optoelectronics, Layer, Capacitor, Electrical engineering and Electronic engineering. His work deals with themes such as Transistor and Substrate, which intersect with Optoelectronics. Charles H. Dennison has included themes like Capacitance and Spark plug in his Layer study.

His work carried out in the field of Capacitor brings together such families of science as Dram, Bit line, Dielectric and Electrically conductive. In his research, Semiconductor memory and Field-effect transistor is intimately related to Node, which falls under the overarching field of Dielectric. The Electronic engineering study combines topics in areas such as Composite material and Chemical-mechanical planarization.

His most cited work include:

  • Method of forming a bit line over capacitor array of memory cells (281 citations)
  • Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing (192 citations)
  • Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography (186 citations)

What are the main themes of his work throughout his whole career to date?

His main research concerns Optoelectronics, Layer, Electrical engineering, Capacitor and Electronic engineering. His research in Optoelectronics intersects with topics in Field-effect transistor and Transistor. Charles H. Dennison combines subjects such as Electrical conductor and Wafer with his study of Layer.

His Capacitor research is multidisciplinary, incorporating elements of Dram, Node, Bit line and Memory cell. His Electronic engineering study combines topics in areas such as Semiconductor device, Capacitance, Chemical-mechanical planarization, Dopant and Integrated circuit. His Etching study integrates concerns from other disciplines, such as Trench and Nitride.

He most often published in these fields:

  • Optoelectronics (75.65%)
  • Layer (44.04%)
  • Electrical engineering (36.27%)

What were the highlights of his more recent work (between 1998-2018)?

  • Optoelectronics (75.65%)
  • Layer (44.04%)
  • Electrical conductor (20.73%)

In recent papers he was focusing on the following fields of study:

Charles H. Dennison spends much of his time researching Optoelectronics, Layer, Electrical conductor, Electrical engineering and Transistor. His Optoelectronics study frequently involves adjacent topics like Field-effect transistor. His Layer research includes themes of Node, Electronic engineering and Doping.

His Electrical conductor research incorporates themes from Substrate, Spark plug and Thin-film transistor. His Capacitor study in the realm of Electrical engineering interacts with subjects such as Impurity. His Transistor research is multidisciplinary, relying on both Silicon on insulator and Insulator.

Between 1998 and 2018, his most popular works were:

  • Silicon on insulator DRAM process utilizing both fully and partially depleted devices (68 citations)
  • Graded LDD implant process for sub-half-micron MOS devices (60 citations)
  • Method of storing a temperature threshold in an integrated circuit, method of modifying operation of dynamic random access memory in response to temperature, programmable temperature sensing circuit and memory integrated circuit (45 citations)

In his most recent research, the most cited papers focused on:

  • Electrical engineering
  • Semiconductor
  • Integrated circuit

The scientist’s investigation covers issues in Optoelectronics, Dynamic random-access memory, Integrated circuit, Computer hardware and Electrical engineering. Charles H. Dennison is interested in Silicon on insulator, which is a field of Optoelectronics. His study brings together the fields of Electronic engineering and Integrated circuit.

In his study, Electrical conductor is strongly linked to Semiconductor device, which falls under the umbrella field of Electronic engineering. In his study, Transistor, CMOS and PMOS logic is inextricably linked to Substrate, which falls within the broad field of Electrical engineering. His studies deal with areas such as Bit line, Stress, Buffer and Dopant as well as Capacitor.

Best Publications

  • Method of forming a bit line over capacitor array of memory cells

    Charles H. Dennison

  • Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing

    Charles H. Dennison;Michael A. Walker

  • Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography

    Tyler A. Lowrey;Randal W. Chance;D. Mark Durcan;Ruojia Lee

  • Method of forming a bit line over capacitor array of memory cells and an array of bit line over capacitor array of memory cells

    Mark Jost;Charles Dennison

  • Reduced mask CMOS process for fabricating stacked capacitor multi-megabit dynamic random access memories utilizing single etch stop layer for contacts

    Charles H. Dennison

  • Semiconductor processing methods of forming stacked capacitors

    Charles H. Dennison;Michael A. Walker

  • Method for forming enhanced capacitance stacked capacitor structures using hemi-spherical grain polysilicon

    Charles H. Dennison;Randhir P. S. Thakur

  • MULTIPIN LAMINATED CAPACITOR AND ITS MANUFACTURE

    Dennison Charles H

  • Method for formation of a stacked capacitor

    Yauh-Ching Liu;Pierre Fazan;Hiang Chan;Howard E. Rhodes

  • Tapered via, structures made therewith, and methods of producing same

    Charles H. Dennison

  • Method for fabrication of close-tolerance lines and sharp emission tips on a semiconductor wafer

    Charles H. Dennison

  • Semiconductor processing method of forming complementary N-type doped and P-type doped active regions within a semiconductor substrate

    Mark Helm;Charles Dennison

  • Method for an integrated circuit contact

    Charles H Dennison;Trung T. Doan

  • Fully planarized thin film transistor (TFT) and process to fabricate same

    Charles H. Dennison;Monte Manning

  • Silicon on insulator DRAM process utilizing both fully and partially depleted devices

    Charles H. Dennison;John K. Zahurak

  • Fabrication of complementary n-channel and p-channel circuits (ICs) useful in the manufacture of dynamic random access memories (drams)

    Charles H. Dennison;Tyler A. Lowrey

  • Method for making electrical contact with an active area through sub-micron contact openings and a semiconductor device

    Charles H. Dennison;Guy T. Blalock

  • Integrated circuitry comprising halo regions and LDD regions

    Charles H. Dennison;Mark Helm

  • Spacer isolation method for minimizing parasitic sidewall capacitance and creating fully recessed field oxide regions

    Charles H. Dennison;Fernando Gonzalez

  • Method for increasing capacitive surface area of a conductive material in semiconductor processing and stacked memory cell capacitor

    Yauh-Ching Liu;Pierre C. Fazan;Hiang C. Chan;Charles H. Dennison

Frequent Co-Authors

Pierre C. Fazan
Pierre C. Fazan Micron (United States)
Howard E. Rhodes
Howard E. Rhodes Micron (United States)
Brent Keeth
Brent Keeth Micron (United States)
Tyler A. Lowrey
Tyler A. Lowrey Independent Scientist / Consultant, US
Fernando Gonzalez
Fernando Gonzalez Micron (United States)
Randhir P. S. Thakur
Randhir P. S. Thakur Tata Consultancy Services Venture
Troy A. Manning
Troy A. Manning Micron (United States)
Gurtej S. Sandhu
Gurtej S. Sandhu Micron (United States)

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