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IEEE

International VLSI Symposium on Technology, Systems and Applications (VLSI-TSA)

Location: Hsinchu , Taiwan

Conference dates: 4/17/2023 - 4/20/2023

Research H-index
7

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 35 40 58 5
Electronics and Electrical Engineering 291 73 99 6
Engineering and Technology 374 13 15 2

Call for Papers

The scope of papers (TSA domain) requested in 2023 International VLSI Symposium on Technology, Systems and Applicationsincludes the following fields :

l Front-end CMOS and foundry technology

l Standalone memory: DRAM, FLASH, emerging memory technology

l Ultra-low power CMOS and embedded memory

l Advanced process modules: e.g. gate stack, junction, strain/channel engineering, low-R contact, low-C pacer/ILD, interconnect technology, ALE and selective deposition, etc.

l Nano-patterning: multiple patterning, directed self-Assembly, EUV, etc.

l Power and analog IC device and technology

l Advanced CMOS process and devices: Ge, SiGe, III-V, FinFET, GAAFET, low-dimensional materials and devices, 2D and nanowire devices

l BEOL compatible devices for 3D integration

l Material, process and device modeling

l Reliability physics, characterization and measurements

l Advanced packaging and 2.5D/3D Integration

l TFT and organic electronics

l MEMS, imagers and sensors

l Power and analog IC devices and technology

l Photonics and beyond CMOS technology

l RF & THz process, device and integration technology

l Energy harvesting technology

l Wearable and loE enabling technologies

l Quantum phenomena and information technologies

l Neuromorphic devices and materials for brain-inspired computing

l Device/circuit technologies for AI deep learning applications

l Advanced manufacturing technology, metrology and yield

Overview

This ranking presents a comprehensive assessment of scientific conferences within the field of Engineering and Technology. Developed by Research.com, a leading platform in scientific research analytics since 2014, this list leverages trusted data to highlight venues recognized for their significant scientific contributions. The ranking reflects a meticulous selection process carried out by experts in the discipline, ensuring that only the most influential and impactful conferences are featured.

The position of each conference in this ranking is determined through a unique bibliometric score devised by Research.com. This score is calculated based on two main factors: the estimated h-index and the number of leading scientists who have participated in the conference over the three most recent years. This methodology ensures a balanced consideration of both scientific impact and the presence of eminent researchers, providing an objective measure of a conference’s standing in the scientific community.

The Impact Score values included in this ranking were collected as of 2024-11-27, capturing the most current information available. The ranking process was exhaustive, involving the examination of more than 2,262 conferences. These were shortlisted following a detailed and rigorous analysis of 26,934 scientific documents published in the last three years by 9,385 leading and well-respected researchers in the field of Engineering and Technology. This comprehensive approach guarantees the depth, reliability, and validity of the resulting conference rankings.

For additional details regarding the specific methodology used to compute the ranking scores, readers are encouraged to consult our Methodology Page.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at International Symposium on VLSI Technology, Systems, and Applications (based on the number of publications) are:

  • Paul Kirsch (19 papers) absent at the last edition,
  • Yee-Chia Yeo (16 papers) absent at the last edition,
  • R. Jammy (14 papers) absent at the last edition,
  • Ming-Jinn Tsai (11 papers) published 3 papers at the last edition, 1 more than at the previous edition,
  • Pin Su (11 papers) published 4 papers at the last edition the same number as at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at International Symposium on VLSI Technology, Systems, and Applications (based on the number of publications) are:

  • National Chiao Tung University (27 papers) published 7 papers at the last edition the same number as at the previous edition,
  • SEMATECH (25 papers) published 1 paper at the last edition, 11 less than at the previous edition,
  • Industrial Technology Research Institute (21 papers) published 7 papers at the last edition, 2 more than at the previous edition,
  • IBM (20 papers) published 1 paper at the last edition, 3 less than at the previous edition,
  • National University of Singapore (16 papers) absent at the last edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2015 edition, 7.94% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 37.93% were posted by at least one author from the top 10 institutions publishing at the conference. Another 20.69% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 25.86% of all publications and 15.52% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

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