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IEEE

International Memory Workshop (IMW)

Location: Monterey , United States

Conference dates: 5/21/2023 - 5/24/2023

Research H-index
12

Ranking & Metrics

Discipline name Position Best Scientists Publications D-Index
Materials Science 22 21 25 7
Electronics and Electrical Engineering 140 48 80 10
Engineering and Technology 318 5 6 3

Call for Papers

Papers are solicited in all aspects of semiconductor memory technology (Flash, DRAM, SRAM, PCRAM, RRAM, MRAM, FRAM, embedded memories, system, and emerging memories), including but are not limited to:


Device Physics & Modeling
New Concepts & Disruptive Technologies

Cell Design & Novel Materials
Emerging Applications & Markets

Circuit Design, Algorithms & Error Management
SSD, Mobile & Automotive Applications

Quality & Reliability
In-Memory & Neuromorphic Computing

System Architecture
Memory-enabled Artificial Intelligence

Overview

The scientific conference ranking presented on this page offers a comprehensive evaluation of conferences in the field of Engineering and Technology. This authoritative ranking has been meticulously prepared by Research.com, one of the leading and most trusted platforms for science research across all major disciplines, including Engineering and Technology. Since 2014, Research.com has been recognized for providing reliable data on scientific contributions and achievements worldwide.

The ranking’s positions are determined using a unique bibliometric score devised by Research.com experts. This score is calculated through a rigorous methodology that incorporates the estimated h-index alongside the number of distinguished scientists who have participated in the conference during the preceding three years. This multidimensional approach ensures a holistic and impartial assessment of each conference’s scientific impact and reputation within the academic community.

Impact Score values for this ranking were gathered on 2024-11-27, ensuring an up-to-date reflection of recent scientific contributions and trends. The ranking process itself entailed the thorough examination of more than 2,262 conferences. These were carefully selected following an exhaustive review and rigorous analysis of over 26,934 scientific documents published in the last three years by 9,385 leading and respected scientists in Engineering and Technology. Such an extensive and detailed process underlines the credibility and depth of research behind this ranking.

For those interested in a deeper understanding of the bibliometric analysis and the specific procedures involved in assembling these rankings, a comprehensive outline is available. We encourage readers to consult our Methodology Page for further details on the computational methods and evaluation criteria employed.

Papers citation over time

A key indicator for each conference is its effectiveness in reaching other researchers with the papers published at that venue.

The chart below presents the interquartile range (first quartile 25%, median 50% and third quartile 75%) of the number of citations of articles over time.

The top authors publishing at International Memory Workshop (based on the number of publications) are:

  • Ken Takeuchi (21 papers) published 4 papers at the last edition, 1 more than at the previous edition,
  • L. Perniola (17 papers) absent at the last edition,
  • Malgorzata Jurczak (15 papers) published 1 paper at the last edition the same number as at the previous edition,
  • B. De Salvo (15 papers) absent at the last edition,
  • Dirk Wouters (13 papers) published 2 papers at the last edition, 1 more than at the previous edition.

The overall trend for top authors publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top authors.

Only papers with recognized affiliations are considered

The top affiliations publishing at International Memory Workshop (based on the number of publications) are:

  • Katholieke Universiteit Leuven (39 papers) published 4 papers at the last edition the same number as at the previous edition,
  • SK Hynix (22 papers) published 1 paper at the last edition,
  • Micron Technology (20 papers) published 2 papers at the last edition, 1 more than at the previous edition,
  • Samsung (18 papers) published 1 paper at the last edition, 1 less than at the previous edition,
  • IBM (15 papers) published 1 paper at the last edition, 3 less than at the previous edition.

The overall trend for top affiliations publishing at this conference is outlined below. The chart shows the number of publications at each edition of the conference for top affiliations.

Publication chance based on affiliation

The publication chance index shows the ratio of articles published by the best research institutions at the conference edition to all articles published within that conference. The best research institutions were selected based on the largest number of articles published during all editions of the conference.

The chart below presents the percentage ratio of articles from top institutions (based on their ranking of total papers).Top affiliations were grouped by their rank into the following tiers: top 1-10, top 11-20, top 21-50, and top 51+. Only articles with a recognized affiliation are considered.

During the most recent 2017 edition, 11.63% of publications had an unrecognized affiliation. Out of the publications with recognized affiliations, 44.74% were posted by at least one author from the top 10 institutions publishing at the conference. Another 23.68% included authors affiliated with research institutions from the top 11-20 affiliations. Institutions from the 21-50 range included 13.16% of all publications and 18.42% were from other institutions.

Returning Authors Index

A very common phenomenon observed among researchers publishing scientific articles is the intentional selection of conferences they have already attended in the past. In particular, it is worth analyzing the case when the authors participate in the same conference from year to year.

The Returning Authors Index presented below illustrates the ratio of authors who participated in both a given as well as the previous edition of the conference in relation to all participants in a given year.

Returning Institution Index

The graph below shows the Returning Institution Index, illustrating the ratio of institutions that participated in both a given and the previous edition of the conference in relation to all affiliations present in a given year.

The experience to innovation index

Our experience to innovation index was created to show a cross-section of the experience level of authors publishing at a conference. The index includes the authors publishing at the last edition of a conference, grouped by total number of publications throughout their academic career (P) and the total number of citations of these publications ever received (C).

The group intervals were selected empirically to best show the diversity of the authors' experiences, their labels were selected as a convenience, not as judgment. The authors were divided into the following groups:

  • Novice - P < 5 or C < 25 (the number of publications less than 5 or the number of citations less than 25),
  • Competent - P < 10 or C < 100 (the number of publications less than 10 or the number of citations less than 100),
  • Experienced - P < 25 or C < 625 (the number of publications less than 25 or the number of citations less than 625),
  • Master - P < 50 or C < 2500 (the number of publications less than 50 or the number of citations less than 2500),
  • Star - P ≥ 50 and C ≥ 2500 (both the number of publications greater than 50 and the number of citations greater than 2500).

The chart below illustrates experience levels of first authors in cases of publications with multiple authors.

Related Online Degrees & Career Pathways

For students pursuing Electronics and Electrical Engineering, exploring related online degrees can offer flexible learning options and broader career opportunities. Many universities now provide affordable programs, such as those listed among the cheapest online general studies degree programs. These paths are ideal for learners seeking accessible entry points into technical fields or complementary skills.

Flexibility is a key consideration for working professionals or individuals balancing commitments. Institutions with best online colleges with weekly start dates enable students to begin courses every week instead of traditional semesters. This structure helps maintain momentum and tailor study schedules to personal needs.

For those aiming to advance their education further, programs transitioning from eds to edd programs provide a pathway for leadership roles in academic and professional settings. These degrees complement engineering expertise with advanced educational leadership training.

Additionally, accelerated learning options like accelerated bachelor's degree programs allow motivated students to complete degrees faster, helping them enter the workforce or pursue graduate studies sooner. This fast-tracked approach is particularly beneficial in the fast-evolving fields of electronics and electrical engineering.

Best Scientists who published in this Conference

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