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Mamoru Miyawaki

Mamoru Miyawaki

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
35
Citations
4244
World Ranking
5642
National Ranking
239

Overview

Mamoru Miyawaki is affiliated with Canon in Japan. Their professional focus is connected to this primary affiliation, indicating a career embedded within a major corporation known for imaging and optical products.

Information about recent papers, co-authors, publication venues, book publications, fields of study, subfields, and specific research topics related to Mamoru Miyawaki is not available.

There are no records of awards or distinctions attributed to Miyawaki up to this point.

Best Publications

  • Electron emission device

    Takeo Tsukamoto;Mamoru Miyawaki;Tetsuya Kaneko;Akira Suzuki

  • Method of manufacturing a semiconductor memory device for use with image pickup

    Mamoru Miyawaki;Akira Ishizaki;Genzo Momma;Hiroshi Yuzurihara

  • Solid-state image pickup device having a plurality of photoelectric conversion elements on a common substrate

    Hayao Oozu;Mamoru Miyawaki;Akira Ishizaki;Shigetoshi Sugawa

  • Process for manufacturing a semiconductor device by applying a non-single-crystalline material on a sidewall inside of an opening portion for growing a single-crystalline semiconductor body

    Hiroshi Yuzurihara;Mamoru Miyawaki;Akira Ishizaki;Genzo Momma

  • Silicon-on-insulator CMOS device and a liquid crystal display with controlled base insulator thickness

    Shunsuke Inoue;Toru Koizuki;Mamoru Miyawaki;Shigetoshi Sugawa

  • Semiconductor device, and operating device, signal converter, and signal processing system using the semiconductor device

    Shunsuke Inoue;Mamoru Miyawaki;Tetsunobu Kochi

  • Liquid crystal image display unit and method for fabricating semiconductor optical member

    Takao Yonehara;Mamoru Miyawaki;Akira Ishizaki;Junichi Hoshi

  • Projection display device and application system of same

    Mamoru Miyawaki

  • SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    Kikuchi Shin;Miyawaki Mamoru;Monma Genzo;Ohzu Hayao

  • Semiconductor wafer, and process for production thereof

    Mamoru Miyawaki

  • Display device having a silicon substrate, a locos film formed on the substrate, a tensile stress film formed on the locos film, and TFTs formed on the tensile stress film

    Takanori Watanabe;Mamoru Miyawaki;Shunsuke Inoue;Tetsunobu Kochi

  • Photoelectric conversion apparatus with reresh voltage

    Mahito Shinohara;Shigetoshi Sugawa;Seiji Hashimoto;Mamoru Miyawaki

  • Image display device and method for displaying an image on the basis of a plurality of image signals

    Yukihiko Sakashita;Mamoru Miyawaki

  • Method for manufacturing semiconductor substrate

    Shunsuke Inoue;Mamoru Miyawaki;Yoshihiko Fukumoto

  • LCD having a shading layer exhibiting a different reflection characteristic from reflection electrodes

    Mamoru Miyawaki;Saburo Sugawara

  • Method of manufacturing a surrounding gate type MOFSET

    Shin Kikuchi;Mamoru Miyawaki;Genzo Monma;Hayao Ohzu

  • Method for preparing a semiconductor substrate using porous silicon

    Kiyofumi Sakaguchi;Takao Yonehara;Mamoru Miyawaki

  • Method of driving image display apparatus

    Katsuhito Sakurai;Mamoru Miyawaki;Akira Ishizaki

  • Method of making a semiconductor device

    Shunsuke Inoue;Mamoru Miyawaki;Tetsunobu Kohchi

  • Size-dependent permittivity and intrinsic optical anisotropy of nanometric gold thin films: a density functional theory study.

    Slimane Laref;Jiangrong Cao;Abu Asaduzzaman;Keith Runge

Frequent Co-Authors

Shigetoshi Sugawa
Shigetoshi Sugawa Tohoku University
Tadahiro Ohmi
Tadahiro Ohmi Tohoku University

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