World's Best Scientists 2026 revealed!

D-Index & Metrics

Engineering and Technology

D-Index
40
Citations
6390
World Ranking
7327
National Ranking
2002

Lars W. Liebmann publication distribution in Engineering and Technology in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Lars W. Liebmann sits on this spectrum.

38–47 publications: 20 scientists 48–57 publications: 35 scientists 58–67 publications: 96 scientists 68–77 publications: 135 scientists 78–87 publications: 190 scientists 88–97 publications: 259 scientists 98–107 publications: 283 scientists 108–117 publications: 369 scientists 118–127 publications: 341 scientists 128–137 publications: 386 scientists 138–147 publications: 372 scientists 148–157 publications: 457 scientists 158–167 publications: 415 scientists 168–177 publications: 407 scientists 178–187 publications: 421 scientists 188–197 publications: 378 scientists 198–207 publications: 403 scientists 208–217 publications: 317 scientists 218–227 publications: 346 scientists 228–237 publications: 321 scientists 238–247 publications: 260 scientists 248–257 publications: 280 scientists 258–267 publications: 240 scientists 268–277 publications: 214 scientists 278–287 publications: 242 scientists 288–297 publications: 203 scientists 298–307 publications: 166 scientists 308–317 publications: 154 scientists 318–327 publications: 175 scientists 328–337 publications: 159 scientists 338–347 publications: 99 scientists 348–357 publications: 131 scientists 358–367 publications: 106 scientists 368–377 publications: 118 scientists 378–387 publications: 97 scientists 388–397 publications: 108 scientists 398–407 publications: 82 scientists 408–417 publications: 71 scientists 418–427 publications: 64 scientists 428–437 publications: 55 scientists 438–447 publications: 54 scientists 448–457 publications: 60 scientists 458–467 publications: 47 scientists 468–477 publications: 40 scientists 478–487 publications: 30 scientists 488–497 publications: 29 scientists 498–507 publications: 38 scientists 508–517 publications: 40 scientists 518–527 publications: 32 scientists 528–537 publications: 23 scientists 538–547 publications: 28 scientists 548–557 publications: 23 scientists 558–567 publications: 19 scientists 568–577 publications: 16 scientists 578–587 publications: 17 scientists 588–597 publications: 18 scientists 598–607 publications: 22 scientists 608–617 publications: 15 scientists 618–627 publications: 9 scientists 628–637 publications: 11 scientists 638–647 publications: 21 scientists 648–657 publications: 12 scientists 658–667 publications: 9 scientists 668–677 publications: 11 scientists 678–687 publications: 9 scientists 688–697 publications: 6 scientists 698–707 publications: 14 scientists 708–717 publications: 7 scientists 718–727 publications: 8 scientists 728–737 publications: 10 scientists 738–747 publications: 9 scientists 748–757 publications: 5 scientists 758–767 publications: 5 scientists 768–777 publications: 11 scientists 778–787 publications: 7 scientists 788–797 publications: 2 scientists 798–803 publications: 4 scientists 804+ publications: 100 scientists
38 publications 804+

This scientist: 150 publications — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 804 publications or more.

Lars W. Liebmann D-index placement in Engineering and Technology in 2026

The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Lars W. Liebmann sits on this spectrum.

30 D-Index: 59 scientists 31 D-Index: 114 scientists 32 D-Index: 129 scientists 33 D-Index: 189 scientists 34 D-Index: 200 scientists 35 D-Index: 262 scientists 36 D-Index: 311 scientists 37 D-Index: 312 scientists 38 D-Index: 350 scientists 39 D-Index: 385 scientists 40 D-Index: 348 scientists 41 D-Index: 362 scientists 42 D-Index: 426 scientists 43 D-Index: 380 scientists 44 D-Index: 310 scientists 45 D-Index: 341 scientists 46 D-Index: 301 scientists 47 D-Index: 306 scientists 48 D-Index: 271 scientists 49 D-Index: 246 scientists 50 D-Index: 210 scientists 51 D-Index: 253 scientists 52 D-Index: 213 scientists 53 D-Index: 221 scientists 54 D-Index: 195 scientists 55 D-Index: 186 scientists 56 D-Index: 170 scientists 57 D-Index: 167 scientists 58 D-Index: 166 scientists 59 D-Index: 144 scientists 60 D-Index: 152 scientists 61 D-Index: 141 scientists 62 D-Index: 138 scientists 63 D-Index: 131 scientists 64 D-Index: 118 scientists 65 D-Index: 114 scientists 66 D-Index: 119 scientists 67 D-Index: 95 scientists 68 D-Index: 87 scientists 69 D-Index: 77 scientists 70 D-Index: 89 scientists 71 D-Index: 69 scientists 72 D-Index: 54 scientists 73 D-Index: 46 scientists 74 D-Index: 55 scientists 75 D-Index: 54 scientists 76 D-Index: 49 scientists 77 D-Index: 53 scientists 78 D-Index: 46 scientists 79 D-Index: 28 scientists 80 D-Index: 39 scientists 81 D-Index: 36 scientists 82 D-Index: 24 scientists 83 D-Index: 26 scientists 84 D-Index: 36 scientists 85 D-Index: 18 scientists 86 D-Index: 25 scientists 87 D-Index: 19 scientists 88 D-Index: 26 scientists 89 D-Index: 27 scientists 90 D-Index: 23 scientists 91 D-Index: 15 scientists 92 D-Index: 12 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 13 scientists 97 D-Index: 13 scientists 98 D-Index: 9 scientists 99 D-Index: 7 scientists 100 D-Index: 7 scientists 101 D-Index: 8 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 9 scientists 105 D-Index: 6 scientists 106 D-Index: 9 scientists 107+ D-Index: 99 scientists
30 D-Index 107+

This scientist: 40 D-Index — 27th percentile

27% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 107 D-Index or more.

Research.com Recognitions

  • 2009 - SPIE Fellow

Overview

Lars W. Liebmann is affiliated with Intel in the United States and specializes in the field of engineering, with a particular focus on electrical and electronic engineering. Their research encompasses areas related to semiconductor technology and integrated circuits.

The scientist's work primarily revolves around several core topics, including:

  • 3D IC and TSV technologies
  • Advancements in Semiconductor Devices and Circuit Design
  • Semiconductor materials and devices

Liebmann's recent publication includes the paper titled CFET Design Options, Challenges, and Opportunities for 3D Integration, published in 2021 at the 2021 IEEE International Electron Devices Meeting (IEDM). This paper has accrued 25 citations to date.

Frequent coauthors collaborating with Liebmann include:

  • Jeffrey Smith
  • D. Chanemougame
  • Paul Gutwin

Liebmann's academic contributions have appeared notably in the 2021 IEEE International Electron Devices Meeting (IEDM), evidenced by their publication record.

In 2009, Lars W. Liebmann was recognized as a SPIE Fellow, reflecting a professional acknowledgment within the optics and photonics community.

Best Publications

  • Layout impact of resolution enhancement techniques: impediment or opportunity?

    Lars W. Liebmann

  • Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions

    Lars W. Liebmann;Scott Mansfield;Alfred K. Wong

  • Optical proximity correction method

    Edward Bass John;Wolfgang Riibuman Lars;Thomas Seiyer Robert;ジョン・エドワード・バース、ジュニア

  • Closed-loop design for manufacturability process

    Ioana C Graur;Geng Han;Scott M Mansfield;Lars W Liebmann

  • Optimizing style options for subresolution assist features

    Lars W. Liebmann;James A. Bruce;William Chu;Michael Cross

  • TCAD development for lithography resolution enhancement

    L. W. Liebmann;S. M. Mansfield;A. K. Wong;M. A. Lavin

  • Lithographic comparison of assist feature design strategies

    Scott M. Mansfield;Lars W. Liebmann;Antoinette F. Molless;Alfred K. K. Wong

  • High-performance circuit design for the RET-enabled 65-nm technology node

    Lars W. Liebmann;Arnold E. Barish;Zachary Baum;Henry A. Bonges

  • A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

    R. Xie;P. Montanini;K. Akarvardar;N. Tripathi

  • Scaling Challenges for Advanced CMOS Devices

    Ajey P. Jacob;Ruilong Xie;Min Gyu Sung;Lars Liebmann

  • Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings

    T. Jhaveri;V. Rovner;L. Liebmann;L. Pileggi

  • Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith

    Lars W. Liebmann;Ioana C. Graur;Young O. Kim;Mark A. Lavin

  • Geometric autogeneration of "hard" phase-shift designs for VLSI

    Lars W. Liebmann;Mark A. Lavin;Pia N. Sanda

  • Electrically-driven optical proximity correction to compensate for non-optical effects

    Kanak B. Agarwal;Shayak Banerjee;Praveen Elakkumanan;Lars W. Liebmann

  • Phase shifted design verification routine

    Gerald Galan;Ioana C. Graur;Lars W. Liebmann

  • Optimized phase shift design migration

    Fook-Luen Heng;Lars W. Liebmann

  • Integrating DfM components into a cohesive design-to-silicon solution (Invited Paper)

    Lars Liebmann;Dan Maynard;Kevin McCullen;Nakgeuon Seong

  • METHOD FOR CORRECTING PHASE SHIFT MASK AND PHASE SHIFT MASK SYSTEM

    Lars W Liebmann;Bern J Lynn;Mark O Nathar

  • Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

    Richard A. Ferguson;Alfred K. K. Wong;Timothy A. Brunner;Lars W. Liebmann

  • A 10nm platform technology for low power and high performance application featuring FINFET devices with multi workfunction gate stack on bulk and SOI

    K. I. Seo;B. Haran;D. Gupta;D. Guo

  • Continuous scale optical proximity correction by mask maker dose modulation

    Lars Wolfgang Liebmann;Ronald Michael Martino;J. Tracy Weed

  • Binary OPC for assist feature layout optimization

    Lars W. Liebmann;Richard A. Ferguson;Allen H. Gabor;Mark A. Lavin

  • Placement and optimization of process dummy cells

    Xu Ouyang;Geng Han;Lars W. Liebmann

Frequent Co-Authors

Larry Pileggi
Larry Pileggi Carnegie Mellon University
David Z. Pan
David Z. Pan The University of Texas at Austin
Michael Orshansky
Michael Orshansky The University of Texas at Austin
Puneet Gupta
Puneet Gupta University of California, Los Angeles
Bei Yu
Bei Yu Chinese University of Hong Kong
Vamsi K. Paruchuri
Vamsi K. Paruchuri IBM (United States)
Dureseti Chidambarrao
Dureseti Chidambarrao IBM (United States)
Ruilong Xie
Ruilong Xie IBM (United States)
Matthew E. Colburn
Matthew E. Colburn Facebook (United States)
James H. Stathis
James H. Stathis IBM (United States)

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