Lars W. Liebmann

Research.com Recognitions

• 2009 - SPIE Fellow

Overview

Best Publications

• Layout impact of resolution enhancement techniques: impediment or opportunity?

  Lars W. Liebmann

  389
  Citations

• Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions

  Lars W. Liebmann;Scott Mansfield;Alfred K. Wong

  316
  Citations

• Optical proximity correction method

  Edward Bass John;Wolfgang Riibuman Lars;Thomas Seiyer Robert;ジョン・エドワード・バース、ジュニア

  295
  Citations

• Closed-loop design for manufacturability process

  Ioana C Graur;Geng Han;Scott M Mansfield;Lars W Liebmann

  278
  Citations

• Optimizing style options for subresolution assist features

  Lars W. Liebmann;James A. Bruce;William Chu;Michael Cross

  227
  Citations

• TCAD development for lithography resolution enhancement

  L. W. Liebmann;S. M. Mansfield;A. K. Wong;M. A. Lavin

  218
  Citations

• Lithographic comparison of assist feature design strategies

  Scott M. Mansfield;Lars W. Liebmann;Antoinette F. Molless;Alfred K. K. Wong

  217
  Citations

• High-performance circuit design for the RET-enabled 65-nm technology node

  Lars W. Liebmann;Arnold E. Barish;Zachary Baum;Henry A. Bonges

  196
  Citations

• A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

  R. Xie;P. Montanini;K. Akarvardar;N. Tripathi

  162
  Citations

• Scaling Challenges for Advanced CMOS Devices

  Ajey P. Jacob;Ruilong Xie;Min Gyu Sung;Lars Liebmann

  140
  Citations

• Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings

  T. Jhaveri;V. Rovner;L. Liebmann;L. Pileggi

  140
  Citations

• Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith

  Lars W. Liebmann;Ioana C. Graur;Young O. Kim;Mark A. Lavin

  138
  Citations

• Geometric autogeneration of "hard" phase-shift designs for VLSI

  Lars W. Liebmann;Mark A. Lavin;Pia N. Sanda

  134
  Citations

• Electrically-driven optical proximity correction to compensate for non-optical effects

  Kanak B. Agarwal;Shayak Banerjee;Praveen Elakkumanan;Lars W. Liebmann

  129
  Citations

• Phase shifted design verification routine

  Gerald Galan;Ioana C. Graur;Lars W. Liebmann

  123
  Citations

• Optimized phase shift design migration

  Fook-Luen Heng;Lars W. Liebmann

  119
  Citations

• Integrating DfM components into a cohesive design-to-silicon solution (Invited Paper)

  Lars Liebmann;Dan Maynard;Kevin McCullen;Nakgeuon Seong

  118
  Citations

• METHOD FOR CORRECTING PHASE SHIFT MASK AND PHASE SHIFT MASK SYSTEM

  Lars W Liebmann;Bern J Lynn;Mark O Nathar

  107
  Citations

• Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

  Richard A. Ferguson;Alfred K. K. Wong;Timothy A. Brunner;Lars W. Liebmann

  104
  Citations

• A 10nm platform technology for low power and high performance application featuring FINFET devices with multi workfunction gate stack on bulk and SOI

  K. I. Seo;B. Haran;D. Gupta;D. Guo

  102
  Citations

• Continuous scale optical proximity correction by mask maker dose modulation

  Lars Wolfgang Liebmann;Ronald Michael Martino;J. Tracy Weed

  98
  Citations

• Binary OPC for assist feature layout optimization

  Lars W. Liebmann;Richard A. Ferguson;Allen H. Gabor;Mark A. Lavin

  92
  Citations

• Placement and optimization of process dummy cells

  Xu Ouyang;Geng Han;Lars W. Liebmann

  88
  Citations