2016 - IEEE Fellow For contributions to micro and nano manufacturing technology
Jürgen Brugger mainly focuses on Nanotechnology, Optoelectronics, Cantilever, Wafer and Microelectromechanical systems. He performs multidisciplinary study in the fields of Nanotechnology and Stencil via his papers. His biological study spans a wide range of topics, including Conductive atomic force microscopy, Thin film, Capacitive sensing, Atomic force acoustic microscopy and Analytical chemistry.
Jürgen Brugger has included themes like Kelvin probe force microscope, Surface micromachining, Bandwidth and Deflection in his Cantilever study. His Wafer study integrates concerns from other disciplines, such as Silicon nitride, Lithography, Magnetometer, Lever and Plasma etching. His Microelectromechanical systems study combines topics from a wide range of disciplines, such as Nanogenerator, Photoresist, Contact electrification and Substrate.
Jürgen Brugger mainly investigates Nanotechnology, Optoelectronics, Lithography, Cantilever and Stencil. In his research on the topic of Nanotechnology, Ion implantation is strongly related with Silicon. In his study, Optics is inextricably linked to Etching, which falls within the broad field of Optoelectronics.
The concepts of his Lithography study are interwoven with issues in Shadow mask, Photoresist and Photolithography. He has researched Cantilever in several fields, including Surface micromachining, Piezoresistive effect and Microfabrication. His work deals with themes such as Reactive-ion etching and Focused ion beam, which intersect with Wafer.
His primary areas of investigation include Nanotechnology, Optoelectronics, Polymer, Plasmon and Nanoscopic scale. The study incorporates disciplines such as Nanolithography and Inkjet printing in addition to Nanotechnology. In his works, Jürgen Brugger undertakes multidisciplinary study on Optoelectronics and Stencil.
His studies in Polymer integrate themes in fields like Ceramic, Triboelectric effect, Carbon nanotube, Cantilever and Microstructure. As part of the same scientific family, Jürgen Brugger usually focuses on Stencil lithography, concentrating on Lithography and intersecting with Silicon. His research investigates the connection between Resist and topics such as Etching that intersect with issues in Optics.
Nanotechnology, Nanoscopic scale, Stencil lithography, Fluorescence correlation spectroscopy and Nanolithography are his primary areas of study. His Nanotechnology research integrates issues from Silicon and Lithography. His Lithography research is multidisciplinary, relying on both Planar and Physical vapor deposition.
His research on Fluorescence correlation spectroscopy also deals with topics like
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High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
Hubert Lorenz;M. Despont;N. Fahrni;J. Brugger.
Sensors and Actuators A-physical (1998)
Sequential position readout from arrays of micromechanical cantilever sensors
H. P. Lang;R. Berger;C. Andreoli;J. Brugger.
Applied Physics Letters (1998)
Scanning force microscopy in the dynamic mode using microfabricated capacitive sensors
N. Blanc;J. Brugger;N. F. de Rooij;U. Dürig.
Journal of Vacuum Science & Technology B (1996)
Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods
Roli Lüthi;Reto R. Schlittler;Jürgen Brugger;Peter Vettiger.
Applied Physics Letters (1999)
Nanodispenser for attoliter volume deposition using atomic force microscopy probes modified by focused-ion-beam milling
A. Meister;M. Liley;J. Brugger;R. Pugin.
Applied Physics Letters (2004)
Submicrometer Hall devices fabricated by focused electron-beam-induced deposition
G Boero;I Utke;T Bret;Niels Quack.
Applied Physics Letters (2005)
Fabrication and functionalization of nanochannels by electron-beam-induced silicon oxide deposition.
Christophe Danelon;Christian Santschi;Jürgen Brugger;Horst Vogel.
Metallic Nanowires by Full Wafer Stencil Lithography
O. Vazquez-Mena;G. Villanueva;V. Savu;K. Sidler.
Nano Letters (2008)
Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning
G. M. Kim;M. A. F. van den Boogaart;J. Brugger.
Microelectronic Engineering (2003)
Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
J. Brugger;G. Beljakovic;M. Despont;N. F. de Rooij.
Microelectronic Engineering (1997)
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