What is he best known for?
The fields of study he is best known for:
- Nanotechnology
- Optics
- Semiconductor
Jürgen Brugger mainly focuses on Nanotechnology, Optoelectronics, Cantilever, Wafer and Microelectromechanical systems.
He performs multidisciplinary study in the fields of Nanotechnology and Stencil via his papers.
His biological study spans a wide range of topics, including Conductive atomic force microscopy, Thin film, Capacitive sensing, Atomic force acoustic microscopy and Analytical chemistry.
Jürgen Brugger has included themes like Kelvin probe force microscope, Surface micromachining, Bandwidth and Deflection in his Cantilever study.
His Wafer study integrates concerns from other disciplines, such as Silicon nitride, Lithography, Magnetometer, Lever and Plasma etching.
His Microelectromechanical systems study combines topics from a wide range of disciplines, such as Nanogenerator, Photoresist, Contact electrification and Substrate.
His most cited work include:
- High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS (512 citations)
- Sequential position readout from arrays of micromechanical cantilever sensors (145 citations)
- Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods (106 citations)
What are the main themes of his work throughout his whole career to date?
Jürgen Brugger mainly investigates Nanotechnology, Optoelectronics, Lithography, Cantilever and Stencil.
In his research on the topic of Nanotechnology, Ion implantation is strongly related with Silicon.
In his study, Optics is inextricably linked to Etching, which falls within the broad field of Optoelectronics.
The concepts of his Lithography study are interwoven with issues in Shadow mask, Photoresist and Photolithography.
He has researched Cantilever in several fields, including Surface micromachining, Piezoresistive effect and Microfabrication.
His work deals with themes such as Reactive-ion etching and Focused ion beam, which intersect with Wafer.
He most often published in these fields:
- Nanotechnology (61.52%)
- Optoelectronics (27.55%)
- Lithography (18.29%)
What were the highlights of his more recent work (between 2012-2020)?
- Nanotechnology (61.52%)
- Optoelectronics (27.55%)
- Polymer (9.26%)
In recent papers he was focusing on the following fields of study:
His primary areas of investigation include Nanotechnology, Optoelectronics, Polymer, Plasmon and Nanoscopic scale.
The study incorporates disciplines such as Nanolithography and Inkjet printing in addition to Nanotechnology.
In his works, Jürgen Brugger undertakes multidisciplinary study on Optoelectronics and Stencil.
His studies in Polymer integrate themes in fields like Ceramic, Triboelectric effect, Carbon nanotube, Cantilever and Microstructure.
As part of the same scientific family, Jürgen Brugger usually focuses on Stencil lithography, concentrating on Lithography and intersecting with Silicon.
His research investigates the connection between Resist and topics such as Etching that intersect with issues in Optics.
Between 2012 and 2020, his most popular works were:
- A silk-fibroin-based transparent triboelectric generator suitable for autonomous sensor network (82 citations)
- Penciling a triboelectric nanogenerator on paper for autonomous power MEMS applications (68 citations)
- Harnessing the damping properties of materials for high-speed atomic force microscopy. (58 citations)
In his most recent research, the most cited papers focused on:
- Nanotechnology
- Electrical engineering
- Semiconductor
Nanotechnology, Nanoscopic scale, Stencil lithography, Fluorescence correlation spectroscopy and Nanolithography are his primary areas of study.
His Nanotechnology research integrates issues from Silicon and Lithography.
His Lithography research is multidisciplinary, relying on both Planar and Physical vapor deposition.
His research on Fluorescence correlation spectroscopy also deals with topics like
- Sphingomyelin together with Nanophotonics,
- Lipid raft which connect with Plasmon.
His work carried out in the field of Dry etching brings together such families of science as Shadow mask, Thermal scanning probe lithography, Plasma etching and Resist.
His Electron-beam lithography study which covers Near and far field that intersects with Optoelectronics.
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