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Francesc Pérez-Murano

Francesc Pérez-Murano

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
36
Citations
6142
World Ranking
5313
National Ranking
96

Francesc Pérez-Murano publication distribution in Electronics and Electrical Engineering in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Electronics and Electrical Engineering in 2026. The highlighted bar marks where Francesc Pérez-Murano sits on this spectrum.

34–53 publications: 24 scientists 54–73 publications: 52 scientists 74–93 publications: 114 scientists 94–113 publications: 203 scientists 114–133 publications: 269 scientists 134–153 publications: 355 scientists 154–173 publications: 403 scientists 174–193 publications: 445 scientists 194–213 publications: 430 scientists 214–233 publications: 431 scientists 234–253 publications: 399 scientists 254–273 publications: 366 scientists 274–293 publications: 335 scientists 294–313 publications: 300 scientists 314–333 publications: 276 scientists 334–353 publications: 250 scientists 354–373 publications: 214 scientists 374–393 publications: 187 scientists 394–413 publications: 152 scientists 414–433 publications: 169 scientists 434–453 publications: 147 scientists 454–473 publications: 111 scientists 474–493 publications: 117 scientists 494–513 publications: 103 scientists 514–533 publications: 99 scientists 534–553 publications: 92 scientists 554–573 publications: 75 scientists 574–593 publications: 58 scientists 594–613 publications: 69 scientists 614–633 publications: 50 scientists 634–653 publications: 62 scientists 654–673 publications: 54 scientists 674–693 publications: 44 scientists 694–713 publications: 37 scientists 714–733 publications: 28 scientists 734–753 publications: 26 scientists 754–773 publications: 26 scientists 774–793 publications: 19 scientists 794–813 publications: 23 scientists 814–833 publications: 20 scientists 834–853 publications: 16 scientists 854–873 publications: 20 scientists 874–893 publications: 11 scientists 894–913 publications: 11 scientists 914–933 publications: 16 scientists 934–953 publications: 13 scientists 954–973 publications: 10 scientists 974–993 publications: 11 scientists 994–1,013 publications: 9 scientists 1,014–1,033 publications: 9 scientists 1,034–1,053 publications: 10 scientists 1,054–1,064 publications: 6 scientists 1,065+ publications: 99 scientists
34 publications 1,065+

This scientist: 272 publications — 51st percentile

51% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,065 publications or more.

Francesc Pérez-Murano D-index placement in Electronics and Electrical Engineering in 2026

The chart shows the D-index (discipline H-index) distribution of Electronics and Electrical Engineering scientists ranked by Research.com in 2026. The highlighted bar marks where Francesc Pérez-Murano sits on this spectrum.

30 D-Index: 178 scientists 31 D-Index: 257 scientists 32 D-Index: 263 scientists 33 D-Index: 262 scientists 34 D-Index: 244 scientists 35 D-Index: 236 scientists 36 D-Index: 211 scientists 37 D-Index: 220 scientists 38 D-Index: 214 scientists 39 D-Index: 214 scientists 40 D-Index: 205 scientists 41 D-Index: 187 scientists 42 D-Index: 194 scientists 43 D-Index: 201 scientists 44 D-Index: 155 scientists 45 D-Index: 189 scientists 46 D-Index: 148 scientists 47 D-Index: 160 scientists 48 D-Index: 134 scientists 49 D-Index: 130 scientists 50 D-Index: 141 scientists 51 D-Index: 156 scientists 52 D-Index: 108 scientists 53 D-Index: 130 scientists 54 D-Index: 112 scientists 55 D-Index: 97 scientists 56 D-Index: 111 scientists 57 D-Index: 102 scientists 58 D-Index: 108 scientists 59 D-Index: 120 scientists 60 D-Index: 103 scientists 61 D-Index: 93 scientists 62 D-Index: 92 scientists 63 D-Index: 74 scientists 64 D-Index: 77 scientists 65 D-Index: 73 scientists 66 D-Index: 64 scientists 67 D-Index: 69 scientists 68 D-Index: 60 scientists 69 D-Index: 39 scientists 70 D-Index: 57 scientists 71 D-Index: 59 scientists 72 D-Index: 46 scientists 73 D-Index: 49 scientists 74 D-Index: 38 scientists 75 D-Index: 35 scientists 76 D-Index: 32 scientists 77 D-Index: 35 scientists 78 D-Index: 31 scientists 79 D-Index: 22 scientists 80 D-Index: 34 scientists 81 D-Index: 31 scientists 82 D-Index: 34 scientists 83 D-Index: 23 scientists 84 D-Index: 18 scientists 85 D-Index: 30 scientists 86 D-Index: 19 scientists 87 D-Index: 19 scientists 88 D-Index: 20 scientists 89 D-Index: 8 scientists 90 D-Index: 17 scientists 91 D-Index: 7 scientists 92 D-Index: 14 scientists 93 D-Index: 9 scientists 94 D-Index: 15 scientists 95 D-Index: 10 scientists 96 D-Index: 12 scientists 97 D-Index: 10 scientists 98 D-Index: 10 scientists 99 D-Index: 12 scientists 100 D-Index: 16 scientists 101 D-Index: 5 scientists 102 D-Index: 7 scientists 103 D-Index: 7 scientists 104 D-Index: 8 scientists 105 D-Index: 9 scientists 106 D-Index: 13 scientists 107 D-Index: 4 scientists 108 D-Index: 5 scientists 109 D-Index: 10 scientists 110 D-Index: 8 scientists 111+ D-Index: 96 scientists
30 D-Index 111+

This scientist: 36 D-Index — 24th percentile

24% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 111 D-Index or more.

Overview

Francesc Pérez-Murano is affiliated with the Spanish National Research Council in Spain. Their research contributions span prominently in the fields of Engineering and Materials Science, with significant focus on Electrical and Electronic Engineering, Biomedical Engineering, and Materials Chemistry among other specialized areas.

Their subfields of study include:

  • Electrical and Electronic Engineering
  • Biomedical Engineering
  • Materials Chemistry
  • Atomic and Molecular Physics, and Optics
  • Surfaces, Coatings and Films

Main topics of their research activity cover:

  • Block Copolymer Self-Assembly
  • Nanowire Synthesis and Applications
  • Semiconductor materials and devices
  • Nanofabrication and Lithography Techniques
  • Advancements in Semiconductor Devices and Circuit Design
  • Ion-surface interactions and analysis
  • Electron and X-Ray Spectroscopy Techniques

Among recent publications authored or coauthored by Francesc Pérez-Murano are:

  • "Roadmap for focused ion beam technologies", 2023, Applied Physics Reviews
  • "Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices", 2020, Polymers
  • "Uncapped Gold Nanoparticles for the Metallization of Organic Monolayers", 2021, Advanced Materials Interfaces
  • "Thermal Imaging of Block Copolymers with Sub-10 nm Resolution", 2021, ACS Nano
  • "Multi-Frequency Resonance Behaviour of a Si Fractal NEMS Resonator", 2020, Nanomaterials

They frequently collaborate with several researchers, including:

  • Marta Fernández-Regúlez
  • Joan Bausells
  • Jordi Llobet
  • E. Amat
  • A. del Moral

Francesc Pérez-Murano regularly publishes in these venues:

  • Nanomaterials
  • Semiconductor Science and Technology
  • ACS Nano
  • ACS Applied Materials & Interfaces
  • Micro and Nano Engineering

Best Publications

  • Increasing the elastic modulus of graphene by controlled defect creation

    Guillermo López-Polín;Cristina Gómez-Navarro;Vincenzo Parente;Francisco Guinea

  • Local oxidation of silicon surfaces by dynamic force microscopy: Nanofabrication and water bridge formation

    Ricardo Garcı́a;Montserrat Calleja;Francesc Pérez-Murano

  • Mechanical detection of carbon nanotube resonator vibrations.

    D. Garcia-Sanchez;A. San Paulo;M. J. Esplandiu;F. Perez-Murano

  • Electromechanical model of a resonating nano-cantilever-based sensor for high-resolution and high-sensitivity mass detection

    G. Abadal;Zachary James Davis;Bjarne Helbo;X. Borrise

  • STM-Induced Hydrogen Desorption via a Hole Resonance

    Kurt Stokbro;C. Thirstrup;M. Sakurai;Ulrich Quaade

  • Dynamic range enhancement of nonlinear nanomechanical resonant cantilevers for highly sensitive NEMS gas/mass sensor applications

    N Kacem;J Arcamone;F Perez-Murano;S Hentz

  • Ultrasensitive mass sensor fully integrated with complementary metal-oxide-semiconductor circuitry

    Esko Sebastian Forsén;G. Abadal;S. Ghatnekar-Nilsson;J. Teva

  • Predictive model for scanned probe oxidation kinetics

    John A. Dagata;F Perez-murano;G Abadal;K Morimoto

  • Anisotropic growth of long isolated graphene ribbons on the C face of graphite-capped 6H-SiC

    Nicolas Camara;Jean-Roch Huntzinger;Gemma Rius;Antoine Tiberj

  • Nanometer‐scale oxidation of Si(100) surfaces by tapping mode atomic force microscopy

    F. Pérez‐Murano;G. Abadal;N. Barniol;X. Aymerich

  • Current, charge, and capacitance during scanning probe oxidation of silicon. I. Maximum charge density and lateral diffusion

    J. A. Dagata;F. Perez-Murano;C. Martin;H. Kuramochi

  • AFM lithography of aluminum for fabrication of nanomechanical systems

    Zachary James Davis;G. Abadal;Ole Hansen;X. Borisé

  • Voltage modulation scanned probe oxidation

    Francesc Pérez-Murano;Karen Birkelund;Kiyoshi Morimoto;John A. Dagata

  • Nanolithography on thin layers of PMMA using atomic force microscopy

    Cristina Martín;Gemma Rius;Xavier Borrisé;Francesc Pérez-Murano

  • Design, fabrication, and characterization of a submicroelectromechanical resonator with monolithically integrated CMOS readout circuit

    J. Verd;G. Abadal;J. Teva;M.V. Gaudo

  • Nanometre-scale Oxidation of Silicon Surfaces by Dynamic Force Microscopy: Reproducibility, Kinetics and Nanofabrication

    M Calleja;J Anguita;R Garcia;K Birkelund

  • Integrated CMOS-MEMS with on-chip readout electronics for high-frequency applications

    J. Verd;A. Uranga;J. Teva;J.L. Lopez

  • Full-wafer fabrication by nanostencil lithography of micro/nanomechanical mass sensors monolithically integrated with CMOS.

    J Arcamone;M A F van den Boogaart;F Serra-Graells;J Fraxedas

  • Monolithic mass sensor fabricated using a conventional technology with attogram resolution in air conditions

    J. Verd;A. Uranga;G. Abadal;J. Teva

  • Modification of HF‐treated silicon (100) surfaces by scanning tunneling microscopy in air under imaging conditions

    N. Barniol;F. Pérez‐Murano;X. Aymerich

  • Evaporation of femtoliter sessile droplets monitored with nanomechanical mass sensors.

    Julien Arcamone;Erik Dujardin;Gemma Rius;Francesc Pérez-Murano

  • Density variations in scanned probe oxidation

    K Morimoto;Francesc Pérez-Murano;J.A Dagata

Frequent Co-Authors

Anja Boisen
Anja Boisen Technical University of Denmark
Paul J. Low
Paul J. Low University of Western Australia
Jürgen Brugger
Jürgen Brugger École Polytechnique Fédérale de Lausanne
Hiroshi Yokoyama
Hiroshi Yokoyama Kent State University
Ole Hansen
Ole Hansen Technical University of Denmark
Tiberio A. Ezquerra
Tiberio A. Ezquerra Spanish National Research Council
Lars Montelius
Lars Montelius Lund University
Anders Kristensen
Anders Kristensen Technical University of Denmark
Richard J. Nichols
Richard J. Nichols University of Liverpool
Erik Dujardin
Erik Dujardin Centre d’Élaboration de Matériaux et d’Etudes Structurales

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