The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Jeffrey L. Blackburn sits on this spectrum.
This scientist: 258 publications — 49th percentile
49% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Jeffrey L. Blackburn sits on this spectrum.
This scientist: 61 D-Index — 48th percentile
48% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Jeffrey L. Blackburn is affiliated with the National Renewable Energy Laboratory in the United States. Their research primarily spans materials science and engineering, with a substantial focus on materials chemistry and electrical and electronic engineering. Their scholarly work also includes contributions in polymers and plastics, renewable energy, sustainability and the environment, and organic chemistry.
The scientist's research encompasses several main topics including perovskite materials and applications, 2D materials and applications, carbon nanotubes in composites, molecular junctions and nanostructures, conducting polymers and applications, advanced thermoelectric materials and devices, and organic electronics and photovoltaics.
Jeffrey L. Blackburn has published extensively in various scientific venues. Frequent publication outlets include ECS Meeting Abstracts, ACS Nano, Energy & Environmental Science, arXiv (Cornell University), and Nanoscale.
Recent notable papers include:
Frequent collaborators include Andrew J. Ferguson, Joseph M. Luther, Zhaodong Li, Ji Hao, and Matthew C. Beard.
Jeffrey L. Blackburn;Andrew J. Ferguson;Chungyeon Cho;Jaime C. Grunlan
Chunmei Ban;Zhuangchun Wu;Dane T. Gillaspie;Le Chen
Robert C. Tenent;Teresa M. Barnes;Jeremy D. Bergeson;Andrew J. Ferguson
Shuo Diao;Jeffrey L. Blackburn;Guosong Hong;Alexander L. Antaris
Matteo Massetti;Fei Jiao;Fei Jiao;Andrew J. Ferguson;Dan Zhao
Jeffrey L. Blackburn;Teresa M. Barnes;Matthew C. Beard;Yong-Hyun Kim
Azure D. Avery;Ben H. Zhou;Jounghee Lee;Eui Sup Lee
Xiaowei He;Nicolai F. Hartmann;Xuedan Ma;Younghee Kim
Alex Zevalkink;David M. Smiadak;Jeff L. Blackburn;Andrew J. Ferguson
Shuo Diao;Guosong Hong;Alexander L. Antaris;Jeffrey L. Blackburn
Eric E. Benson;Hanyu Zhang;Samuel A. Schuman;Sanjini U. Nanayakkara
Kevin S Mistry;Brian A Larsen;Jeffrey L Blackburn
David P. Nenon;Jeffrey A. Christians;Lance M. Wheeler;Jeffrey L. Blackburn
Bradley A. MacLeod;Noah J. Stanton;Isaac E. Gould;Devin Wesenberg
Jeffrey A. Fagan;Erik H. Hároz;Rachelle Ihly;Hui Gui
Teresa M. Barnes;Matthew O. Reese;Jeremy D. Bergeson;Brian A. Larsen
Teresa M. Barnes;Jeremy D. Bergeson;Robert C. Tenent;Brian A. Larsen
Teresa M. Barnes;Jeffrey L. Blackburn;Jao van de Lagemaat;Timothy J. Coutts
Lance M. Wheeler;David T. Moore;Rachelle Ihly;Noah J. Stanton
Rachelle Ihly;Anne-Marie Dowgiallo;Mengjin Yang;Philip Schulz
Xiaowei He;Han Htoon;Stephen K. Doorn
Jeffrey L. Blackburn;Teresa Barnes;Robert Tenent;Jeremy Bergeson
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