World's Best Scientists 2026 revealed!
Yuji Awano

Yuji Awano

D-Index & Metrics

Electronics and Electrical Engineering

D-Index
32
Citations
3695
World Ranking
6396
National Ranking
276

Overview

Yuji Awano is affiliated with Keio University in Japan. The academic profile available does not list specific details regarding their recent publications or research papers.

No information is provided about frequent co-authors, indicating limited publicly available collaboration data or an independent research approach.

Details about recurring publication venues are not included, suggesting either a broad dissemination of work across various platforms or limited publication records accessible at this time.

There is no data on book publications by Yuji Awano, which may imply a focus primarily on journal articles or other forms of academic output.

The profile does not specify main fields, subfields, or primary topics of study, leaving the particular areas of expertise or research interest undocumented.

No records of awards have been noted, providing no indication of formal recognitions or honors in their academic career thus far.

Yuji Awano is currently alive, with no information suggesting otherwise.

Best Publications

  • Integrated circuit device and method of producing the same

    Yuji Awano

  • Short-channel effects in subquarter-micrometer-gate HEMTs: simulation and experiment

    Y. Awano;M. Kosugi;K. Kosemura;T. Mimura

  • Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects

    Mizuhisa Nihei;Akiko Kawabata;Daiyu Kondo;Masahiro Horibe

  • Simultaneous formation of multiwall carbon nanotubes and their end-bonded ohmic contacts to Ti electrodes for future ULSI interconnects

    Mizuhisa Nihei;Masahiro Horibe;Akio Kawabata;Yuji Awano

  • Self-organization of novel carbon composite structure: Graphene multi-layers combined perpendicularly with aligned carbon nanotubes

    Daiyu Kondo;Shintaro Sato;Yuji Awano

  • Low-resistance multi-walled carbon nanotube vias with parallel channel conduction of inner shells [IC interconnect applications]

    M. Nihei;D. Kondo;A. Kawabata;S. Sato

  • Low temperature grown carbon nanotube interconnects using inner shells by chemical mechanical polishing

    Daisuke Yokoyama;Takayuki Iwasaki;Tsuyoshi Yoshida;Hiroshi Kawarada

  • Complementary semiconductor device

    Yuji Awano

  • Carbon nanotubes for VLSI: Interconnect and transistor applications

    Y. Awano;S. Sato;M. Nihei;T. Sakai

  • Carbon Nanotubes for VLSI: Interconnect and Transistor Applications

    Yuji Awano;Shintaro Sato;Mizuhisa Nihei;Tadashi Sakai

  • Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes

    Masahiro Horibe;Mizuhisa Nihei;Daiyu Kondo;Akio Kawabata

  • Growth of diameter-controlled carbon nanotubes using monodisperse nickel nanoparticles obtained with a differential mobility analyzer

    Shintaro Sato;Akio Kawabata;Mizuhisa Nihei;Yuji Awano

  • Graphene for VLSI: FET and interconnect applications

    Yuji Awano

  • Novel approach to fabricating carbon nanotube via interconnects using size-controlled catalyst nanoparticles

    S. Sato;M. Nihei;A. Mimura;A. Kawabata

  • Single-Electron Transistor with Ultra-High Coulomb Energy of 5000 K Using Position Controlled Grown Carbon Nanotube as Channel

    Kazuhiko Matsumoto;Seizo Kinoshita;Yoshitaka Gotoh;Kousuke Kurachi

  • Monte Carlo simulation of AlGaAs/GaAs heterojunction bipolar transistors

    K. Tomizawa;Y. Awano;N. Hashizume

  • Electrical Properties of Carbon Nanotubes Grown at a Low Temperature for Use as Interconnects

    Daisuke Yokoyama;Takayuki Iwasaki;Kentaro Ishimaru;Shintaro Sato

  • Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer

    Mizuhisa Nihei;Akio Kawabata;Yuji Awano

  • Carbon nanotube via interconnect technologies : size-classified catalyst nanoparticles and low-resistance ohmic contact formation

    Y. Awano;S. Sato;D. Kondo;M. Ohfuti

  • Carbon nanotube vias for future LSI interconnects

    M. Nihei;M. Horibe;A. Kawabata;Y. Awano

  • Method of manufacturing carbon cylindrical structures and biopolymer detection device

    Yuji Awano;Akio Kawabata;Shozo Fujita

  • Synthesis of a closely packed carbon nanotube forest by a multi-step growth method using plasma-based chemical vapor deposition

    Yuichi Yamazaki;Masayuki Katagiri;Naoshi Sakuma;Mariko Suzuki

  • Carbon nanotube bumps for LSI interconnect

    I. Soga;D. Kondo;Y. Yamaguchi;T. Iwai

Frequent Co-Authors

Naoki Yokoyama
Naoki Yokoyama Apple (United States)
Hisanori Shinohara
Hisanori Shinohara Nagoya University
Takashi Mimura
Takashi Mimura Fujitsu (Japan)
Toshiya Okazaki
Toshiya Okazaki National Institute of Advanced Industrial Science and Technology
Hiroshi Kawarada
Hiroshi Kawarada Waseda University
Yoshiaki Nakata
Yoshiaki Nakata University of Tokyo
Takashi Sekiguchi
Takashi Sekiguchi University of Tsukuba
Kazuhiko Matsumoto
Kazuhiko Matsumoto Kyoto University
Takashi Mizutani
Takashi Mizutani Nagoya University
Yutaka Ohno
Yutaka Ohno Nagoya University

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