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Materials Science
UK
2022

D-Index & Metrics

Materials Science

D-Index
83
Citations
22615
World Ranking
2398
National Ranking
105

Stephan Hofmann publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Stephan Hofmann sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 364 publications — 72nd percentile

72% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Stephan Hofmann D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Stephan Hofmann sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 83 D-Index — 82nd percentile

82% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2022 - Research.com Materials Science in United Kingdom Leader Award

Overview

Stephan Hofmann is affiliated with the University of Cambridge in the United Kingdom. Their research spans multiple areas within engineering and materials science, with a significant focus on materials chemistry and electrical and electronic engineering.

Their main fields of study include:

  • Engineering
  • Materials Science

Subfields frequently explored by Hofmann consist of:

  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Biomedical Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Their work addresses various scientific topics such as:

  • Graphene research and applications
  • 2D Materials and Applications
  • Semiconductor materials and devices
  • Metamaterials and Metasurfaces Applications
  • Quantum Dots Synthesis And Properties
  • Terahertz technology and applications
  • Plasmonic and Surface Plasmon Research

Stephan Hofmann has contributed extensively to numerous publications. Recent papers include:

  • "Piezoelectric Materials for Energy Harvesting and Sensing Applications: Roadmap for Future Smart Materials" (2021, Advanced Science)
  • "A foundation model for atomistic materials chemistry" (2023, arXiv (Cornell University))
  • "High carrier mobility along the [111] orientation in Cu2O photoelectrodes" (2024, Nature)
  • "Surface Electron-Hole Rich Species Active in the Electrocatalytic Water Oxidation" (2021, Journal of the American Chemical Society)
  • "Rational Passivation of Sulfur Vacancy Defects in Two-Dimensional Transition Metal Dichalcogenides" (2021, ACS Nano)

Their frequent publication venues are:

  • arXiv (Cornell University)
  • ACS Nano
  • Nature
  • Applied Physics Letters
  • Nano Letters

Collaboration is a notable aspect of Hofmann's work, with frequent co-authors including:

  • Oliver J. Burton
  • Jack Alexander-Webber
  • Harvey E. Beere
  • D. A. Ritchie
  • Riccardo Degl'Innocenti

Best Publications

  • Flexible Electronics: The Next Ubiquitous Platform

    A. Nathan;A. Ahnood;M. T. Cole;Sungsik Lee

  • In situ Observations of Catalyst Dynamics during Surface-Bound Carbon Nanotube Nucleation

    Stephan Hofmann;Renu Sharma;Caterina Ducati;Gaohui Du

  • Surface diffusion: the low activation energy path for nanotube growth.

    S. Hofmann;G. Csányi;A. C. Ferrari;M. C. Payne

  • Piezoelectric Materials for Energy Harvesting and Sensing Applications: Roadmap for Future Smart Materials

    Susmriti Das Mahapatra;Preetam Chandan Mohapatra;Adrianus Indrat Aria;Graham Christie

  • Carbon Nanotubes and Related Nanomaterials: Critical Advances and Challenges for Synthesis toward Mainstream Commercial Applications

    Rahul Rao;Cary L. Pint;Ahmad E. Islam;Robert S. Weatherup

  • Single-nanowire spectrometers

    Zongyin Yang;Thomas Albrow-Owen;Hanxiao Cui;Jack Allen Alexander-Webber

  • Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition

    S. Hofmann;C. Ducati;J. Robertson;B. Kleinsorge

  • Revealing lithium-silicide phase transformations in nano-structured silicon-based lithium ion batteries via in situ NMR spectroscopy.

    Ken Ogata;E Salager;CJ Kerr;AE Fraser

  • Raman spectroscopy of silicon nanowires

    S. Piscanec;M. Cantoro;A. C. Ferrari;J. A. Zapien

  • Interface dynamics and crystal phase switching in GaAs nanowires

    Daniel Jacobsson;Federico Panciera;Jerry Tersoff;Mark C. Reuter

  • Catalytic chemical vapor deposition of single-wall carbon nanotubes at low temperatures.

    Mirco Cantoro;Stephan Hofmann;Simone Pisana;Vittorio Scardaci

  • Gold-catalyzed growth of silicon nanowires by plasma enhanced chemical vapor deposition

    S. Hofmann;C. Ducati;R. J. Neill;S. Piscanec

  • Ledge-flow-controlled catalyst interface dynamics during Si nanowire growth

    Stephan Hofmann;Renu Sharma;Christoph T. Wirth;Felipe Cervantes-Sodi

  • In situ characterization of alloy catalysts for low-temperature graphene growth.

    Robert S. Weatherup;Bernhard C. Bayer;Raoul Blume;Caterina Ducati

  • In-situ X-ray Photoelectron Spectroscopy Study of Catalyst−Support Interactions and Growth of Carbon Nanotube Forests

    Cecilia Mattevi;Christoph Tobias Wirth;Stephan Hofmann;Raoul Blume

  • Observing Graphene Grow: Catalyst-Graphene Interactions during Scalable Graphene Growth on Polycrystalline Copper

    Piran R. Kidambi;Bernhard C. Bayer;Raoul Blume;Zhu-Jun Wang

  • Nanoscale Zirconia as a Nonmetallic Catalyst for Graphitization of Carbon and Growth of Single- and Multiwall Carbon Nanotubes

    Stephen A. Steiner;Theodore F. Baumann;Bernhard C. Bayer;Raoul Blume

  • Metal Oxide Induced Charge Transfer Doping and Band Alignment of Graphene Electrodes for Efficient Organic Light Emitting Diodes

    Jens Meyer;Piran R. Kidambi;Bernhard C. Bayer;Christ Weijtens

  • In Situ Observations during Chemical Vapor Deposition of Hexagonal Boron Nitride on Polycrystalline Copper

    Piran R. Kidambi;Raoul Blume;Jens Kling;Jakob Birkedal Wagner

  • The Phase of Iron Catalyst Nanoparticles during Carbon Nanotube Growth

    Christoph T. Wirth;Bernhard C. Bayer;Andrew D. Gamalski;Santiago Esconjauregui

  • Low temperature growth of carbon nanotubes by plasma-enhanced chemical vapour deposition

    S Hofmann;C Ducati;J Robertson;B Kleinsorge

  • Data for: Single-nanowire spectrometers

    Zongyin Yang;Tom Albrow-Owen;Hanxiao Cui;Jack Allen Alexander-Webber

  • Flexible Electronics: The Next Ubiquitous Platform This paper reviews thin-film materials and technologies for flexible electronics and considers future applications in healthcare, the automotive industry, human-machine interfaces, mobile devices, and other environments.

    Arokia Nathan;Arman Ahnood;Matthew T. Cole;Sungsik Lee

Frequent Co-Authors

John Robertson
John Robertson University of Cambridge
Caterina Ducati
Caterina Ducati University of Cambridge
Robert S. Weatherup
Robert S. Weatherup University of Oxford
David A. Ritchie
David A. Ritchie University of Cambridge
Andrea C. Ferrari
Andrea C. Ferrari University of Cambridge
Raoul Blume
Raoul Blume Max Planck Society
J. Axel Zeitler
J. Axel Zeitler University of Cambridge
Jeremy J. Baumberg
Jeremy J. Baumberg University of Cambridge
William I. Milne
William I. Milne University of Cambridge
Axel Knop-Gericke
Axel Knop-Gericke Max Planck Society

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