The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Nicholas X. Fang sits on this spectrum.
This scientist: 368 publications — 73rd percentile
73% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Nicholas X. Fang sits on this spectrum.
This scientist: 78 D-Index — 77th percentile
77% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Nicholas X. Fang is affiliated with the University of Hong Kong in China. Their research spans multiple fields with a primary focus on Engineering and Materials Science. Within these areas, they have significant contributions to several subfields, including Biomedical Engineering, Mechanical Engineering, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, and Automotive Engineering.
Their research topics cover a broad range of advanced technological and scientific issues. Notable areas of study include Acoustic Wave Phenomena Research, Metamaterials and Metasurfaces Applications, Additive Manufacturing and 3D Printing Technologies, Advanced Sensor and Energy Harvesting Materials, Advanced Materials and Mechanics, Underwater Acoustics Research, and Surface Modification and Superhydrophobicity.
Among frequent collaborators are the following coauthors:
Frequent publication venues for their work include:
Some recent papers by Nicholas X. Fang are:
Nicholas X. Fang was recognized as an OSA Fellow in 2021 for fundamental and practical innovations in plasmonic, acoustic, graphene-based, and topological metamaterials.
Nicholas Fang;Hyesog Lee;Cheng Sun;Xiang Zhang
Xiaoyu Zheng;Howon Lee;Todd H. Weisgraber;Maxim Shusteff
Nicholas Fang;Dongjuan Xi;Jianyi Xu;Muralidhar Ambati
T. J. Yen;T. J. Yen;T. J. Yen;W. J. Padilla;W. J. Padilla;W. J. Padilla;N. Fang;N. Fang;N. Fang;D. C. Vier;D. C. Vier;D. C. Vier
Tony Low;Andrey Chaves;Joshua D. Caldwell;Anshuman Kumar;Anshuman Kumar
Qi Ge;Amir Hosein Sakhaei;Howon Lee;Conner K. Dunn
Shu Zhang;Chunguang Xia;Nicholas Fang
C. Sun;N. Fang;D.M. Wu;X. Zhang
Yanxia Cui;Kin Hung Fung;Kin Hung Fung;Jun Xu;Jun Xu;Hyungjin Ma
Yanxia Cui;Kin Hung Fung;Jun Xu;Hyungjin Ma
Tony Low;Andrey Chaves;Joshua D. Caldwell;Anshuman Kumar
James Utama Surjadi;Libo Gao;Huifeng Du;Xiang Li
Xiaoyu Zheng;William Smith;Julie Jackson;Bryan Moran
Shu Zhang;Leilei Yin;Nicholas Fang
Qiming Wang;Julie A. Jackson;Qi Ge;Qi Ge;Jonathan B. Hopkins
Nicholas Fang;Xiang Zhang
Brian J. Roxworthy;Kaspar D. Ko;Anil Kumar;Kin Hung Fung
Logeeswaran Vj;Nobuhiko P. Kobayashi;M. Saif Islam;Wei Wu
Qi Ge;Zhiqin Li;Zhaolong Wang;Kavin Kowsari
Xin-Hao Li;Chang Liu;Chang Liu;Shien-Ping Feng;Nicholas Xuanlai Fang
Anshuman Kumar;Tony Low;Kin Hung Fung;Phaedon Avouris
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