The chart shows the distribution of publications by all Research.com ranked scientists in the field of Engineering and Technology in 2026. The highlighted bar marks where Christopher M. Spadaccini sits on this spectrum.
This scientist: 136 publications — 21st percentile
21% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 804 publications or more.
The chart shows the D-index (discipline H-index) distribution of Engineering and Technology scientists ranked by Research.com in 2026. The highlighted bar marks where Christopher M. Spadaccini sits on this spectrum.
This scientist: 47 D-Index — 52nd percentile
52% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 107 D-Index or more.
Christopher M. Spadaccini is affiliated with Lawrence Livermore National Laboratory in the United States. Their research work spans across the field of engineering with a particular focus on several subfields including biomedical engineering, automotive engineering, electrical and electronic engineering, mechanical engineering, and electronic, optical, and magnetic materials.
The main topics covered in their research include additive manufacturing and 3D printing technologies, acoustic wave phenomena research, advanced battery technologies research, metamaterials and metasurfaces applications, additive manufacturing materials and processes, bone tissue engineering materials, and microfluidic and bio-sensing technologies.
The scientist has published extensively in journals and venues such as:
Recent papers authored or coauthored by Christopher M. Spadaccini include:
Frequent collaborators working alongside Christopher M. Spadaccini include Maxim Shusteff, Eric B. Duoss, Cheng Zhu, Xiaoxing Xia, and Julie Mancini. These coauthors have contributed to multiple research outputs, often in the areas aligned with additive manufacturing technologies and materials science.
Xiaoyu Zheng;Howon Lee;Todd H. Weisgraber;Maxim Shusteff
Cheng Zhu;T. Yong-Jin Han;Eric B. Duoss;Alexandra M. Golobic
Brett E. Kelly;Brett E. Kelly;Indrasen Bhattacharya;Hossein Heidari;Maxim Shusteff
Xiaoyu Zheng;William Smith;Julie Jackson;Bryan Moran
Cheng Zhu;Tianyu Liu;Fang Qian;T. Yong-Jin Han
Qiming Wang;Julie A. Jackson;Qi Ge;Qi Ge;Jonathan B. Hopkins
Bin Yao;Swetha Chandrasekaran;Jing Zhang;Wang Xiao
Matthew E. Suss;Matthew E. Suss;Theodore F. Baumann;William L. Bourcier;Christopher M. Spadaccini
Cheng Zhu;Tianyu Liu;Fang Qian;Wen Chen
A. Mehra;Xin Zhang;A.A. Ayon;I.A. Waitz
Eric B. Duoss;Todd H. Weisgraber;Keith Hearon;Cheng Zhu
Maxim Shusteff;Maxim Shusteff;Allison E. M. Browar;Allison E. M. Browar;Brett E. Kelly;Brett E. Kelly;Johannes Henriksson;Johannes Henriksson
Unknown
Xiaoyu Zheng;Joshua Deotte;Matthew P. Alonso;Matthew P. Alonso;George R. Farquar
Wen Chen;Wen Chen;Thomas Voisin;Yin Zhang;Jean-Baptiste Florien
Bin Yao;Swetha Chandrasekaran;Haozhe Zhang;Annie Ma
C. M. Spadaccini;A. Mehra;J. Lee;X. Zhang
John J. Vericella;John J. Vericella;Sarah E. Baker;Joshuah K. Stolaroff;Eric B. Duoss
Julie A. Jackson;Julie A. Jackson;Mark C. Messner;Nikola A. Dudukovic;William L. Smith
Fang Qian;Pui Ching Lan;Megan C. Freyman;Wen Chen
Ryan M. Hensleigh;Huachen Cui;James S. Oakdale;Jianchao C. Ye
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