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D-Index & Metrics

Materials Science

D-Index
97
Citations
33514
World Ranking
1218
National Ranking
379

Lei Liao publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Lei Liao sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 312 publications — 62nd percentile

62% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Lei Liao D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Lei Liao sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 97 D-Index — 91st percentile

91% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Overview

Lei Liao is a researcher affiliated with Hunan University in China. Their work primarily focuses on engineering and materials science, contributing extensively to the fields of materials chemistry and electrical and electronic engineering.

The scientist's research spans various subfields including biomedical engineering, atomic and molecular physics and optics, as well as electronic, optical, and magnetic materials. This multidisciplinary approach supports investigations into a wide range of material properties and device applications.

Lei Liao's recent publications illustrate their active engagement in advanced materials research. Notable papers include:

  • Efficient strain modulation of 2D materials via polymer encapsulation (2020, Nature Communications)
  • Van der Waals epitaxial growth of air-stable CrSe2 nanosheets with thickness-tunable magnetic order (2021, Nature Materials)
  • Recent Progress on Electrical and Optical Manipulations of Perovskite Photodetectors (2021, Advanced Science)
  • Doping-free complementary WSe2 circuit via van der Waals metal integration (2020, Nature Communications)
  • Transferred van der Waals metal electrodes for sub-1-nm MoS2 vertical transistors (2021, Nature Electronics)

The researcher frequently publishes in journals such as the SSRN Electronic Journal, Nano Letters, Nature Communications, arXiv (Cornell University), and IEEE Electron Device Letters.

Lei Liao collaborates regularly with several coauthors, including:

  • Xingqiang Liu
  • Yuan Liu
  • Xuming Zou
  • Guoli Li
  • Quanyang Tao

The scientist's work largely covers topics related to:

  • 2D materials and applications
  • Graphene research and applications
  • Perovskite materials and applications
  • Nanowire synthesis and applications
  • MXene and MAX phase materials
  • Advanced memory and neural computing
  • Conducting polymers and applications

Best Publications

  • Approaching the Schottky-Mott limit in van der Waals metal-semiconductor junctions.

    Yuan Liu;Yuan Liu;Jian Guo;Enbo Zhu;Lei Liao

  • High-speed graphene transistors with a self-aligned nanowire gate

    Lei Liao;Yung Chen Lin;Mingqiang Bao;Rui Cheng

  • Two-dimensional antimonene single crystals grown by van der Waals epitaxy.

    Jianping Ji;Xiufeng Song;Jizi Liu;Zhong Yan

  • New Porous Crystals of Extended Metal-Catecholates

    Mohamad Hmadeh;Zheng Lu;Zheng Liu;Felipe Gandara

  • Covalent Organic Frameworks with High Charge Carrier Mobility

    Shun Wan;Felipe Gándara;Atsushi Asano;Hiroyasu Furukawa

  • Ultrasensitive and Broadband MoS2 Photodetector Driven by Ferroelectrics

    Xudong Wang;Xudong Wang;Peng Wang;Jianlu Wang;Weida Hu

  • Graphene: An Emerging Electronic Material

    Nathan O. Weiss;Hailong Zhou;Lei Liao;Yuan Liu

  • Plasmon resonance enhanced multicolour photodetection by graphene

    Yuan Liu;Rui Cheng;Lei Liao;Hailong Zhou

  • High Mobility MoS2 Transistor with Low Schottky Barrier Contact by Using Atomic Thick h-BN as a Tunneling Layer

    Jingli Wang;Qian Yao;Chun Wei Huang;Xuming Zou

  • Metal-Ion-Modified Black Phosphorus with Enhanced Stability and Transistor Performance.

    Zhinan Guo;Zhinan Guo;Si Chen;Zhongzheng Wang;Zhongzheng Wang;Zhenyu Yang

  • Size Dependence of Gas Sensitivity of ZnO Nanorods

    L. Liao;H. B. Lu;J. C. Li;H. He

  • Multifunctional CuO nanowire devices: P-type field effect transistors and CO gas sensors

    Lei Liao;Zhou Zhang;Bin Yan;Zhe Zheng

  • Surface Plasmon‐Enhanced Photodetection in Few Layer MoS2 Phototransistors with Au Nanostructure Arrays

    Jinshui Miao;Weida Hu;Youliang Jing;Wenjin Luo

  • Monolayer atomic crystal molecular superlattices

    Chen Wang;Qiyuan He;Udayabagya Halim;Yuanyue Liu

  • Ultrafast growth of single-crystal graphene assisted by a continuous oxygen supply

    Xiaozhi Xu;Zhihong Zhang;Lu Qiu;Jianing Zhuang

  • Direct growth of SnO2nanorod array electrodes for lithium-ion batteries

    Jinping Liu;Yuanyuan Li;Xintang Huang;Xintang Huang;Ruimin Ding

  • Efficient strain modulation of 2D materials via polymer encapsulation.

    Zhiwei Li;Yawei Lv;Liwang Ren;Jia Li

  • Recent Advances in Optoelectronic Devices Based on 2D Materials and Their Heterostructures

    Jinbing Cheng;Chunlan Wang;Xuming Zou;Lei Liao;Lei Liao

  • Interface Engineering for High‐Performance Top‐Gated MoS2 Field‐Effect Transistors

    Xuming Zou;Jingli Wang;Chung Hua Chiu;Yun Wu

  • Millimeter-Size Single-Crystal Graphene by Suppressing Evaporative Loss of Cu During Low Pressure Chemical Vapor Deposition

    Shanshan Chen;Hengxing Ji;Harry Chou;Qiongyu Li

  • High-frequency self-aligned graphene transistors with transferred gate stacks.

    Rui Cheng;Jingwei Bai;Lei Liao;Hailong Zhou

Frequent Co-Authors

Xiangfeng Duan
Xiangfeng Duan University of California, Los Angeles
Weida Hu
Weida Hu Chinese Academy of Sciences
Xiangheng Xiao
Xiangheng Xiao Wuhan University
Changzhong Jiang
Changzhong Jiang Hunan University
Yi Cui
Yi Cui Stanford University
Xiaoshuang Chen
Xiaoshuang Chen Chinese Academy of Sciences
Johnny C. Ho
Johnny C. Ho City University of Hong Kong
Zhongfan Liu
Zhongfan Liu Peking University
Hailin Peng
Hailin Peng Peking University
Zhiyong Fan
Zhiyong Fan Hong Kong University of Science and Technology

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