World's Best Scientists 2026 revealed!

D-Index & Metrics

Materials Science

D-Index
58
Citations
11760
World Ranking
7711
National Ranking
323

Kookrin Char publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Kookrin Char sits on this spectrum.

50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50 publications 1,163+

This scientist: 313 publications — 63rd percentile

63% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

Kookrin Char D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Kookrin Char sits on this spectrum.

40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40 D-Index 165+

This scientist: 58 D-Index — 41st percentile

41% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

Research.com Recognitions

  • 2018 - Fellow of American Physical Society (APS) Citation For sustained and groundbreaking research in advancing both synthesis and understanding of perovskite oxide epitaxial films and devices, including cupratebased Josephson junctions, tunable titanate dielectrics, and highmobility stannate semiconductors

Overview

Kookrin Char is affiliated with Seoul National University in South Korea. Their research spans multiple fields focused primarily on materials science and engineering, with a significant focus on materials chemistry and electrical and electronic engineering.

Their work covers several subfields, including electronic, optical and magnetic materials, biomedical engineering, and condensed matter physics. The main topics of their research include:

  • Electronic and Structural Properties of Oxides
  • Semiconductor materials and devices
  • Magnetic and transport properties of perovskites and related materials
  • ZnO doping and properties
  • Ferroelectric and Negative Capacitance Devices
  • Advanced X-ray and CT Imaging
  • Ferroelectric and Piezoelectric Materials

The frequent publication venues for Kookrin Char's research are varied, reflecting a focus on applied physics and materials science, including:

  • Applied Physics Letters
  • Advanced Electronic Materials
  • ACS Applied Electronic Materials
  • Physical Review Applied
  • Advanced Materials Interfaces

Some of the recent papers authored or co-authored by Kookrin Char include:

  • "Thin film transistors based on ultra-wide bandgap spinel ZnGa2O4" (2020), published in Applied Physics Letters
  • "High-Mobility Field-Effect Transistor Using 2-Dimensional Electron Gas at the LaScO3/BaSnO3 Interface" (2021), published in ACS Applied Electronic Materials
  • "Deep-UV Transparent Conducting Oxide La-Doped SrSnO3 with a High Figure of Merit" (2022), published in ACS Applied Electronic Materials
  • "High- k perovskite gate oxide for modulation beyond 1014 cm−2" (2022), published in Science Advances
  • "Melt Growth and Physical Properties of Bulk LaInO3 Single Crystals" (2021), published in physica status solidi (a)

Kookrin Char collaborates frequently with several researchers, including:

  • Hyeongmin Cho
  • Juhan Kim
  • Bongju Kim
  • Jaehyeok Lee
  • Seonghyeon Kim

Their recognized contributions in the field include receiving the Fellow of the American Physical Society (APS) award in 2018, cited for research on perovskite oxide epitaxial films and devices, cuprate-based Josephson junctions, tunable titanate dielectrics, and high-mobility stannate semiconductors.

Best Publications

  • Synthesis and Magnetic Studies of Uniform Iron Nanorods and Nanospheres

    Sang-Jae Park;Seungsoo Kim;Suyoun Lee;Zheong G. Khim

  • Upper critical field, fluctuation conductivity, and dimensionality of YBa2Cu3O7-x.

    B. Oh;K. Char;A. D. Kent;M. Naito

  • High Mobility in a Stable Transparent Perovskite Oxide

    Hyung Joon Kim;Useong Kim;Hoon Min Kim;Tai Hoon Kim

  • Bi‐epitaxial grain boundary junctions in YBa2Cu3O7

    K. Char;M. S. Colclough;S. M. Garrison;N. Newman

  • Physical properties of transparent perovskite oxides (Ba,La)SnO 3 with high electrical mobility at room temperature

    Hyung Joon Kim;Useong Kim;Tai Hoon Kim;Jiyeon Kim

  • Local, nonvolatile electronic writing of epitaxial Pb(Zr0.52Ti0.48)O3/SrRuO3 heterostructures

    C. H. Ahn;T. Tybell;T. Tybell;L. Antognazza;L. Antognazza;K. Char;K. Char

  • Critical thickness of ultrathin ferroelectric BaTiO3 films

    Y. S. Kim;D. H. Kim;J. D. Kim;Y. J. Chang

  • Flux focusing effects in planar thin‐film grain‐boundary Josephson junctions

    Peter A. Rosenthal;M. R. Beasley;K. Char;M. S. Colclough

  • Ordered-defect structure in epitaxial YBa2Cu3O7-x thin films.

    A. F. Marshall;R. W. Barton;K. Char;A. Kapitulnik

  • Monolithic 77 K dc SQUID magnetometer

    L. P. Lee;K. Char;M. S. Colclough;G. Zaharchuk

  • High carrier mobility in transparent Ba1−xLaxSnO3 crystals with a wide band gap

    X. Luo;Y. S. Oh;A. Sirenko;P. Gao

  • High Tc superconductor‐normal‐superconductor Josephson junctions using CaRuO3 as the metallic barrier

    K. Char;M. S. Colclough;T. H. Geballe;K. E. Myers

  • Properties of interface-engineered high Tc Josephson junctions

    Unknown

  • Reactive magnetron sputtering of thin‐film superconductor YBa2Cu3O7−x

    K. Char;A. D. Kent;A. Kapitulnik;M. R. Beasley

  • Extension of the bi‐epitaxial Josephson junction process to various substrates

    K. Char;M. S. Colclough;L. P. Lee;G. Zaharchuk

  • Study of interface resistances in epitaxial YBa2Cu3O7−x/barrier/YBa2Cu3O7−x junctions

    K. Char;L. Antognazza;T. H. Geballe

  • Properties of Y-Ba-Cu-O thin films with ordered defect structure: Y2Ba4Cu8O20-x.

    K. Char;Mark Lee;R. W. Barton;A. F. Marshall

  • Growth of high Tc superconducting thin films using molecular beam epitaxy techniques

    C. Webb;S. L. Weng;James N Eckstein;N. Missert

  • Optical measurements on oriented thin YBa 2 Cu 3 O 7-δ films: Lack of evidence for excitonic superconductivity

    I. Bozovic;I. Bozovic;D. Kirillov;D. Kirillov;A. Kapitulnik;A. Kapitulnik;K. Char;K. Char

  • Thermal boundary resistance for YBa2Cu3O7−δ films

    M. Nahum;S. Verghese;P. L. Richards;K. Char

  • Perpendicular magnetic anisotropy and strong magneto‐optic properties of SrRuO3 epitaxial films

    L. Klein;J. S. Dodge;T. H. Geballe;A. Kapitulnik

Frequent Co-Authors

T. H. Geballe
T. H. Geballe Stanford University
M. R. Beasley
M. R. Beasley Stanford University
Aharon Kapitulnik
Aharon Kapitulnik Stanford University
Nathan Newman
Nathan Newman Arizona State University
Luke P. Lee
Luke P. Lee University of California, Berkeley
Chong H. Ahn
Chong H. Ahn University of Cincinnati
John Clarke
John Clarke University of California, Berkeley
Jean-Marc Triscone
Jean-Marc Triscone University of Geneva
David K. Fork
David K. Fork Palo Alto Research Center
James S. Harris
James S. Harris Stanford University

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