The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Christopher M. Rouleau sits on this spectrum.
This scientist: 236 publications — 42nd percentile
42% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 1,163 publications or more.
The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Christopher M. Rouleau sits on this spectrum.
This scientist: 63 D-Index — 53rd percentile
53% of scientists in this discipline score the same or lower.
The last bar groups every scientist with 165 D-Index or more.
Christopher M. Rouleau is affiliated with Oak Ridge National Laboratory in the United States. Their research primarily focuses on the field of Materials Science, with 72 publications attributed to this broad discipline. Within Materials Science, their work concentrates on several subfields including Materials Chemistry, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics and Optics, and Nuclear and High Energy Physics.
The scientist's work covers several main topics, such as 2D Materials and Applications, MXene and MAX Phase Materials, Electronic and Structural Properties of Oxides, Chalcogenide Semiconductor Thin Films, Quantum Dots Synthesis and Properties, Machine Learning in Materials Science, and Graphene Research and Applications.
Frequent publication venues for this researcher include:
Frequent co-authors in their work are:
Notable recent papers by Christopher M. Rouleau include:
Ho Nyung Lee;Hans M. Christen;Matthew F. Chisholm;Christopher M. Rouleau
Douglas H. Lowndes;D. B. Geohegan;A. A. Puretzky;D. P. Norton
R. M. Park;M. B. Troffer;C. M. Rouleau;J. M. DePuydt
Akinola D. Oyedele;Shize Yang;Liangbo Liang;Alexander A. Puretzky
Igor Kosacki;Christopher M. Rouleau;Paul F. Becher;James Bentley
Tongming Su;Zachary D Hood;Zachary D Hood;Michael Naguib;Lei Bai;Lei Bai
Sanjib Das;Bin Yang;Gong Gu;Pooran C. Joshi
Kai Wang;Bing Huang;Bing Huang;Mengkun Tian;Frank Ceballos
Xufan Li;Ming Wei Lin;Alexander A. Puretzky;Juan C. Idrobo
Xufan Li;Ming-Wei Lin;Junhao Lin;Bing Huang
Bin Yang;Ondrej Dyck;Jonathan Poplawsky;Jong Keum
Ming Wei Lin;Houlong L. Zhuang;Jiaqiang Yan;Jiaqiang Yan;Thomas Zac Ward
Masoud Mahjouri-Samani;Ming-Wei Lin;Kai Wang;Andrew R. Lupini
Yu-Chuan Lin;Chenze Liu;Yiling Yu;Eva Zarkadoula
Tongming Su;Tongming Su;Zachary D. Hood;Zachary D. Hood;Michael Naguib;Lei Bai;Lei Bai
Ming Shao;Jong Keum;Jihua Chen;Youjun He
Mengkun Tian;Masoud Mahjouri-Samani;Gyula Eres;Ritesh Sachan
Kelsey A. Stoerzinger;Reshma R. Rao;Xiao Renshaw Wang;Wesley T. Hong
Liang Qiao;Haiyan Xiao;Harry M Meyer Iii;Jianing Sun
Xiao Bai;Karren Leslie More;Christopher M Rouleau;Afsaneh Rabiei
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