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D-Index & Metrics

Discipline name D-Index World Ranking Current World Ranking National Ranking Current National Ranking Publications Citations
Materials Science 63 6160 5960 1573 1471 236 14539

Christopher M. Rouleau publications per year

The chart shows the history of publications by Christopher M. Rouleau between 1990 and 2026, highlighting the no. of papers published in each year and offering an overview of the publication velocity of this scholar. Christopher M. Rouleau published across 37 years, from 1990 to 2026, averaging 7.1 papers a year. Output peaked at 22 publications in 2017. 14 of the 261 publications appeared in the last two years.

No. of publications
5 10 15 20
Bar chart. Horizontal axis: year, 1990 to 2026. Vertical axis: number of publications, 0 to 22. Peak 22 publications in 2017. 1990: 2 publications 1991: 0 publications 1992: 1 publication 1993: 4 publications 1994: 1 publication 1995: 6 publications 1996: 1 publication 1997: 1 publication 1998: 5 publications 1999: 3 publications 2000: 3 publications 2001: 5 publications 2002: 5 publications 2003: 5 publications 2004: 4 publications 2005: 10 publications 2006: 9 publications 2007: 4 publications 2008: 8 publications 2009: 3 publications 2010: 8 publications 2011: 11 publications 2012: 7 publications 2013: 7 publications 2014: 15 publications 2015: 11 publications 2016: 19 publications 2017: 22 publications 2018: 14 publications 2019: 14 publications 2020: 11 publications 2021: 9 publications 2022: 4 publications 2023: 8 publications 2024: 7 publications 2025: 11 publications 2026: 3 publications
1990 2026

261 publications in total across all disciplines

View publications per year as a table
Christopher M. Rouleau: publications per year, 1990 to 2026
Year Publications
1990 2
1991 0
1992 1
1993 4
1994 1
1995 6
1996 1
1997 1
1998 5
1999 3
2000 3
2001 5
2002 5
2003 5
2004 4
2005 10
2006 9
2007 4
2008 8
2009 3
2010 8
2011 11
2012 7
2013 7
2014 15
2015 11
2016 19
2017 22
2018 14
2019 14
2020 11
2021 9
2022 4
2023 8
2024 7
2025 11
2026 3
Total 261
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Christopher M. Rouleau publication distribution in Materials Science in 2026

The chart shows the distribution of publications by all Research.com ranked scientists in the field of Materials Science in 2026. The highlighted bar marks where Christopher M. Rouleau sits on this spectrum.

No. of scientists
200 400 600 800
Bar chart with 57 bars. Horizontal axis: publications, 50–69 to 1,163+. Vertical axis: number of scientists, 0 to 891. Most scientists, 891, have 190–209 publications. The last bar groups every scientist with 1,163 publications or more. The highlighted bar, 230–249 publications, is where this scientist sits. 50–69 publications: 28 scientists 70–89 publications: 152 scientists 90–109 publications: 356 scientists 110–129 publications: 487 scientists 130–149 publications: 723 scientists 150–169 publications: 835 scientists 170–189 publications: 850 scientists 190–209 publications: 891 scientists 210–229 publications: 862 scientists 230–249 publications: 766 scientists 250–269 publications: 726 scientists 270–289 publications: 665 scientists 290–309 publications: 593 scientists 310–329 publications: 537 scientists 330–349 publications: 477 scientists 350–369 publications: 440 scientists 370–389 publications: 356 scientists 390–409 publications: 321 scientists 410–429 publications: 256 scientists 430–449 publications: 246 scientists 450–469 publications: 216 scientists 470–489 publications: 212 scientists 490–509 publications: 174 scientists 510–529 publications: 194 scientists 530–549 publications: 162 scientists 550–569 publications: 131 scientists 570–589 publications: 111 scientists 590–609 publications: 103 scientists 610–629 publications: 99 scientists 630–649 publications: 77 scientists 650–669 publications: 92 scientists 670–689 publications: 56 scientists 690–709 publications: 53 scientists 710–729 publications: 53 scientists 730–749 publications: 38 scientists 750–769 publications: 52 scientists 770–789 publications: 43 scientists 790–809 publications: 38 scientists 810–829 publications: 34 scientists 830–849 publications: 25 scientists 850–869 publications: 18 scientists 870–889 publications: 20 scientists 890–909 publications: 24 scientists 910–929 publications: 27 scientists 930–949 publications: 20 scientists 950–969 publications: 17 scientists 970–989 publications: 10 scientists 990–1,009 publications: 16 scientists 1,010–1,029 publications: 13 scientists 1,030–1,049 publications: 12 scientists 1,050–1,069 publications: 9 scientists 1,070–1,089 publications: 8 scientists 1,090–1,109 publications: 7 scientists 1,110–1,129 publications: 9 scientists 1,130–1,149 publications: 2 scientists 1,150–1,162 publications: 5 scientists 1,163+ publications: 100 scientists
50–69 publications 1,163+

This scientist: 236 publications — 42nd percentile

42% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 1,163 publications or more.

View publications distribution as a table
Number of Materials Science scientists by publication count, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
Publications Scientists This scientist
50–69 28
70–89 152
90–109 356
110–129 487
130–149 723
150–169 835
170–189 850
190–209 891
210–229 862
230–249 766 236
250–269 726
270–289 665
290–309 593
310–329 537
330–349 477
350–369 440
370–389 356
390–409 321
410–429 256
430–449 246
450–469 216
470–489 212
490–509 174
510–529 194
530–549 162
550–569 131
570–589 111
590–609 103
610–629 99
630–649 77
650–669 92
670–689 56
690–709 53
710–729 53
730–749 38
750–769 52
770–789 43
790–809 38
810–829 34
830–849 25
850–869 18
870–889 20
890–909 24
910–929 27
930–949 20
950–969 17
970–989 10
990–1,009 16
1,010–1,029 13
1,030–1,049 12
1,050–1,069 9
1,070–1,089 8
1,090–1,109 7
1,110–1,129 9
1,130–1,149 2
1,150–1,162 5
1,163+ 100
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Christopher M. Rouleau D-index placement in Materials Science in 2026

The chart shows the D-index (discipline H-index) distribution of Materials Science scientists ranked by Research.com in 2026. The highlighted bar marks where Christopher M. Rouleau sits on this spectrum.

No. of scientists
200 400 600
Bar chart with 64 bars. Horizontal axis: D-Index, 40–41 to 165+. Vertical axis: number of scientists, 0 to 667. Most scientists, 667, have 52–53 D-Index. The last bar groups every scientist with 165 D-Index or more. The highlighted bar, 62–63 D-Index, is where this scientist sits. 40–41 D-Index: 211 scientists 42–43 D-Index: 450 scientists 44–45 D-Index: 612 scientists 46–47 D-Index: 612 scientists 48–49 D-Index: 598 scientists 50–51 D-Index: 657 scientists 52–53 D-Index: 667 scientists 54–55 D-Index: 621 scientists 56–57 D-Index: 597 scientists 58–59 D-Index: 610 scientists 60–61 D-Index: 587 scientists 62–63 D-Index: 606 scientists 64–65 D-Index: 533 scientists 66–67 D-Index: 490 scientists 68–69 D-Index: 469 scientists 70–71 D-Index: 378 scientists 72–73 D-Index: 421 scientists 74–75 D-Index: 359 scientists 76–77 D-Index: 323 scientists 78–79 D-Index: 299 scientists 80–81 D-Index: 230 scientists 82–83 D-Index: 210 scientists 84–85 D-Index: 195 scientists 86–87 D-Index: 203 scientists 88–89 D-Index: 175 scientists 90–91 D-Index: 175 scientists 92–93 D-Index: 142 scientists 94–95 D-Index: 121 scientists 96–97 D-Index: 117 scientists 98–99 D-Index: 107 scientists 100–101 D-Index: 88 scientists 102–103 D-Index: 85 scientists 104–105 D-Index: 68 scientists 106–107 D-Index: 62 scientists 108–109 D-Index: 57 scientists 110–111 D-Index: 45 scientists 112–113 D-Index: 49 scientists 114–115 D-Index: 50 scientists 116–117 D-Index: 34 scientists 118–119 D-Index: 38 scientists 120–121 D-Index: 37 scientists 122–123 D-Index: 29 scientists 124–125 D-Index: 28 scientists 126–127 D-Index: 24 scientists 128–129 D-Index: 33 scientists 130–131 D-Index: 28 scientists 132–133 D-Index: 21 scientists 134–135 D-Index: 20 scientists 136–137 D-Index: 23 scientists 138–139 D-Index: 17 scientists 140–141 D-Index: 12 scientists 142–143 D-Index: 17 scientists 144–145 D-Index: 21 scientists 146–147 D-Index: 13 scientists 148–149 D-Index: 11 scientists 150–151 D-Index: 14 scientists 152–153 D-Index: 13 scientists 154–155 D-Index: 9 scientists 156–157 D-Index: 10 scientists 158–159 D-Index: 7 scientists 160–161 D-Index: 4 scientists 162–163 D-Index: 4 scientists 164 D-Index: 3 scientists 165+ D-Index: 98 scientists
40–41 D-Index 165+

This scientist: 63 D-Index — 53rd percentile

53% of scientists in this discipline score the same or lower.

The last bar groups every scientist with 165 D-Index or more.

View D-Index distribution as a table
Number of Materials Science scientists by D-index, Research.com 2026 ranking edition. Based on 12,847 ranked scientists.
D-Index Scientists This scientist
40–41 211
42–43 450
44–45 612
46–47 612
48–49 598
50–51 657
52–53 667
54–55 621
56–57 597
58–59 610
60–61 587
62–63 606 63
64–65 533
66–67 490
68–69 469
70–71 378
72–73 421
74–75 359
76–77 323
78–79 299
80–81 230
82–83 210
84–85 195
86–87 203
88–89 175
90–91 175
92–93 142
94–95 121
96–97 117
98–99 107
100–101 88
102–103 85
104–105 68
106–107 62
108–109 57
110–111 45
112–113 49
114–115 50
116–117 34
118–119 38
120–121 37
122–123 29
124–125 28
126–127 24
128–129 33
130–131 28
132–133 21
134–135 20
136–137 23
138–139 17
140–141 12
142–143 17
144–145 21
146–147 13
148–149 11
150–151 14
152–153 13
154–155 9
156–157 10
158–159 7
160–161 4
162–163 4
164 3
165+ 98
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Overview

Christopher M. Rouleau is affiliated with Oak Ridge National Laboratory in the United States. Their research primarily focuses on the field of Materials Science, with 72 publications attributed to this broad discipline. Within Materials Science, their work concentrates on several subfields including Materials Chemistry, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics and Optics, and Nuclear and High Energy Physics.

The scientist's work covers several main topics, such as 2D Materials and Applications, MXene and MAX Phase Materials, Electronic and Structural Properties of Oxides, Chalcogenide Semiconductor Thin Films, Quantum Dots Synthesis and Properties, Machine Learning in Materials Science, and Graphene Research and Applications.

Frequent publication venues for this researcher include:

  • ACS Nano
  • arXiv (Cornell University)
  • Advanced Materials
  • Small Methods
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Frequent co-authors in their work are:

  • Alexander A. Puretzky
  • Kai Xiao
  • David B. Geohegan
  • Yiling Yu
  • Gerd Duscher

Notable recent papers by Christopher M. Rouleau include:

  • Low Energy Implantation into Transition-Metal Dichalcogenide Monolayers to Form Janus Structures, 2020, ACS Nano
  • Two-Dimensional Palladium Diselenide with Strong In-Plane Optical Anisotropy and High Mobility Grown by Chemical Vapor Deposition, 2020, Advanced Materials
  • Intrinsic Defects in MoS2 Grown by Pulsed Laser Deposition: From Monolayers to Bilayers, 2021, ACS Nano
  • Real-Time Diagnostics of 2D Crystal Transformations by Pulsed Laser Deposition: Controlled Synthesis of Janus WSSe Monolayers and Alloys, 2023, ACS Nano
  • Stabilized Synthesis of 2D Verbeekite: Monoclinic PdSe2 Crystals with High Mobility and In-Plane Optical and Electrical Anisotropy, 2022, ACS Nano

Best Publications

  • Strong polarization enhancement in asymmetric three-component ferroelectric superlattices

    Ho Nyung Lee;Hans M. Christen;Matthew F. Chisholm;Christopher M. Rouleau

  • Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition

    Douglas H. Lowndes;D. B. Geohegan;A. A. Puretzky;D. P. Norton

  • p-type ZnSe by nitrogen atom beam doping during molecular beam epitaxial growth

    R. M. Park;M. B. Troffer;C. M. Rouleau;J. M. DePuydt

  • PdSe2: Pentagonal Two-Dimensional Layers with High Air Stability for Electronics.

    Akinola D. Oyedele;Shize Yang;Liangbo Liang;Alexander A. Puretzky

  • Nanoscale effects on the ionic conductivity in highly textured YSZ thin films

    Igor Kosacki;Christopher M. Rouleau;Paul F. Becher;James Bentley

  • 2D/2D heterojunction of Ti 3 C 2 /g-C 3 N 4 nanosheets for enhanced photocatalytic hydrogen evolution.

    Tongming Su;Zachary D Hood;Zachary D Hood;Michael Naguib;Lei Bai;Lei Bai

  • High-Performance Flexible Perovskite Solar Cells by Using a Combination of Ultrasonic Spray-Coating and Low Thermal Budget Photonic Curing

    Sanjib Das;Bin Yang;Gong Gu;Pooran C. Joshi

  • Interlayer Coupling in Twisted WSe2/WS2 Bilayer Heterostructures Revealed by Optical Spectroscopy

    Kai Wang;Bing Huang;Bing Huang;Mengkun Tian;Frank Ceballos

  • Controlled Vapor Phase Growth of Single Crystalline, Two-Dimensional GaSe Crystals with High Photoresponse

    Xufan Li;Ming Wei Lin;Alexander A. Puretzky;Juan C. Idrobo

  • Two-dimensional GaSe/MoSe2 misfit bilayer heterojunctions by van der Waals epitaxy

    Xufan Li;Ming-Wei Lin;Junhao Lin;Bing Huang

  • Perovskite Solar Cells with Near 100% Internal Quantum Efficiency Based on Large Single Crystalline Grains and Vertical Bulk Heterojunctions

    Bin Yang;Ondrej Dyck;Jonathan Poplawsky;Jong Keum

  • Ultrathin nanosheets of CrSiTe3: a semiconducting two-dimensional ferromagnetic material

    Ming Wei Lin;Houlong L. Zhuang;Jiaqiang Yan;Jiaqiang Yan;Thomas Zac Ward

  • Patterned arrays of lateral heterojunctions within monolayer two-dimensional semiconductors.

    Masoud Mahjouri-Samani;Ming-Wei Lin;Kai Wang;Andrew R. Lupini

  • Low Energy Implantation into Transition-Metal Dichalcogenide Monolayers to Form Janus Structures

    Yu-Chuan Lin;Chenze Liu;Yiling Yu;Eva Zarkadoula

  • Monolayer Ti3C2Tx as an Effective Co-catalyst for Enhanced Photocatalytic Hydrogen Production over TiO2

    Tongming Su;Tongming Su;Zachary D. Hood;Zachary D. Hood;Michael Naguib;Lei Bai;Lei Bai

  • The isotopic effects of deuteration on optoelectronic properties of conducting polymers

    Ming Shao;Jong Keum;Jihua Chen;Youjun He

  • Structure and Formation Mechanism of Black TiO2 Nanoparticles

    Mengkun Tian;Masoud Mahjouri-Samani;Gyula Eres;Ritesh Sachan

  • The Role of Ru Redox in pH-Dependent Oxygen Evolution on Rutile Ruthenium Dioxide Surfaces

    Kelsey A. Stoerzinger;Reshma R. Rao;Xiao Renshaw Wang;Wesley T. Hong

  • Nature of the band gap and origin of the electro-/photo-activity of Co3O4

    Liang Qiao;Haiyan Xiao;Harry M Meyer Iii;Jianing Sun

  • Functionally graded hydroxyapatite coatings doped with antibacterial components.

    Xiao Bai;Karren Leslie More;Christopher M Rouleau;Afsaneh Rabiei

Frequent Co-Authors

David B. Geohegan
David B. Geohegan Oak Ridge National Laboratory
Alexander A. Puretzky
Alexander A. Puretzky Oak Ridge National Laboratory
Kai Xiao
Kai Xiao Oak Ridge National Laboratory
Gyula Eres
Gyula Eres Oak Ridge National Laboratory
Gerd Duscher
Gerd Duscher University of Tennessee at Knoxville
Ilia N. Ivanov
Ilia N. Ivanov Oak Ridge National Laboratory
Mina Yoon
Mina Yoon Oak Ridge National Laboratory
Hans M. Christen
Hans M. Christen Oak Ridge National Laboratory
Matthew F. Chisholm
Matthew F. Chisholm Oak Ridge National Laboratory
Karren L. More
Karren L. More Oak Ridge National Laboratory

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